Abstract: A method of analyzing cells of a memory device is disclosed. Generally, a plurality of fail signatures is generated, wherein each fail signature is associated with a type of failure. Voltages according to a plurality of test patterns are applied to nodes of a cell of the memory device. Fail data of the cell for the plurality of patterns is then analyzed, and a fail signature of the cell is determined. A type of failure of the cell based upon the plurality of fail signatures is then determined. A system for analyzing cells of a memory device is also disclosed. The system generally includes a plurality of probes applying different voltages to a cell of the memory device. A control circuit varies the voltages applied to the cell, and compares the failures of the cell as the test voltage applied to the cell is varied to an artificial bit map. Finally, an output device generates an output indicating a type of failure of the cell.

Abstract: A method for classifying patterns of failcodes on a semiconductor wafer, in accordance with the present invention, includes determining failcodes for chips on the wafer and checking adjacent chips for each chip on the wafer having a failcode to determine a failcode pattern having a defined number of chips.

Abstract: A method of analyzing cells of a memory device is disclosed. The method generally comprises steps of establishing a plurality of fail signatures, wherein each fail signature is associated with a type of failure. Voltages according to a plurality of test patterns are applied to nodes of a cell of the memory device. Fail data of the cell for the plurality of patterns is then analyzed, and a fail signature of the cell is determined. A type of failure of the cell based upon the plurality of fail signatures is then determined. A system for analyzing cells of a memory device is also disclosed. The system preferably comprises a plurality of probes applying different voltages to a cell of the memory device. A control circuit varies the voltages applied to the cell, and compares the failures of the cell as the test voltage applied to the cell is varied to an artificial bit map. Finally, an output device generates an output indicating a type of failure of the cell.

Abstract: A method for providing a compressed bit fail map, in accordance with the invention includes the steps of testing a semiconductor device to determine failed devices and transferring failure information to display a compressed bit map by designating areas of the bit map for corresponding failure locations on the semiconductor device. Failure classification is provided by designating shapes and dimensions of fail areas in the designated areas of the bit map such that the fail area shapes and dimensions indicate a fail type.

Abstract: This method for detecting and classifying a scratch on a semiconductor wafer, in accordance with the invention, first defines a coordinate system on the wafer. The method creates a list of failed cells according to coordinates corresponding to the cell failures on the wafer. The number of failed cells, in total, is determined. Through calculating the standard deviation of the failed cells at a plurality of different angles, based on the list of failed cells and the total number of failed cells, a determination is made as to whether the wafer has a potential scratch. Plotting the standard deviations versus the number of failed cells and comparing that point to other known points determines the presence of a scratch. The steps of detecting and classifying scratches occurring on wafers may be performed by a computer.