Abstract: An X-ray optical element for and influencing of X-ray beam characteristics in two dimensions includes two reflective, curved elements arranged side-by-side to receive X-ray radiation from an X-ray beam source so that the radiation is directed onto both reflective elements and then reflected from one element onto the other element, wherein the two reflective elements are curved at different angles and have different focal lengths.

Abstract: An X-ray optical element for and influencing of X-ray beam characteristics in two dimensions includes two reflective, curved elements arranged side-by-side to receive X-ray radiation from an X-ray beam source so that the radiation is directed onto both reflective elements and then reflected from one element onto the other element, wherein the two reflective elements are curved at different angles and have different focal lengths.

Abstract: An X-ray optical system with an X-ray source, an element that focuses the X-rays and an element that reflects them. In order to generate parallel X-radiation with small beam cross-section and high photon density, the X-radiation of the X-ray source is directed with its focusing element to the convex, parabolic and reflecting surface of the reflecting element. The X-ray optical system is useful for X-ray analysis, e.g., in X-ray diffractometry, reflectometry and/or fluorescence analysis.

Abstract: The invention relates to a device for X-ray analytical applications such as X-ray diffractometry, reflectometry and/or fluorescence analysis. The aim of the invention is to monochromatize, focus and optionally transform the X-radiation of a focal spot of a point of an X radiation source into a parallel, high photon density radiation in a highly precise manner. Parallel X radiation having a point-shaped primary beam cross-section is thus directed at a concavely curved, parabolic reflecting element which is used to focus and monchromatize the X radiation by means of a gradient and multilayered system embodied on the reflecting element. At least one screen is arranged between the X radiation source and the reflecting element.

Abstract: The invention relates to a device for X-ray fluorescence analysis wherein X-radiation of an X-ray source is directed upon a sample arranged on a sample carrier, and the fluorescence radiation is measured by a detector. On that occasion, the detection sensitivity, in particular, with respect to the total reflection X-ray fluorescence (TXRF) is to be increased for the most different samples. In order to solve this problem the sample to be analysed is placed on a multi-layer system, or a fluidic sample flows over such a multi-layer system. The multi-layer system consists of at least two or several individual layers which are arranged in a periodically repeating manner. Adjacent individual layers consist of materials having a different x-ray optical refractive index wherein the period thickness d in the multi-layer system and the angle of incidence &thgr; of the X-radiation meet the BRAGG relationship at the used wavelength &lgr; of X-radiation.

Abstract: The invention relates to an X-ray optics arrangement having an X-ray source, one element focussing X-rays and one element reflecting X-rays for the generation of a parallel X-radiation having a small beam cross section of high photon flux density. To solve this problem the X-radiation of the X-ray source is directed with the focussing element upon the convex, parabolic and reflecting surface of the reflecting element, and allowed to be advantageously employed in the X-ray analysis, e.g. with the X-ray diffraction measurement, reflectometry and/or fluoro-chemical analysis.