Abstract: A semiconductor die includes: a semiconductor substrate; a power transistor formed in the semiconductor substrate; a current sense device formed in the semiconductor substrate and occupying less area of the semiconductor substrate than the power transistor; a first contact pad electrically connected to a first load terminal of the power transistor; a second contact pad electrically connected to a sense terminal of the current sense device, the second contact pad being dedicated to current sensing only; and a resistive and/or diodic connection between the sense terminal of the current sense device and the first load terminal of the power transistor. The resistive and/or diodic connection is designed solely for ESD (electrostatic discharge) protection of the current sense device, by providing an ESD discharge path to the first load terminal of the power transistor.

Abstract: A power semiconductor device is proposed. The power semiconductor device includes a semiconductor substrate having first and second main surfaces arranged opposite to each other. The semiconductor substrate includes an insulated gate bipolar transistor area (IGBT) area including an IGBT, and a diode area including a diode. The diode area includes a cathode region of a first conductivity type and an auxiliary region of a second conductivity type both adjoining to the second main surface of the semiconductor substrate. The cathode region adjoins to the auxiliary region along a first lateral direction. The IGBT area includes a collector region of the second conductivity type at the second main surface of the substrate. The collector region includes a first collector sub-region and a second collector sub-region adjoining to each other along the first lateral direction. The first collector sub-region has a larger maximum doping concentration than the second collector sub-region.

Abstract: A circuit carrier includes a dielectric isolation carrier, an upper metallization layer applied to the dielectric isolation carrier, and a dielectric coating. The upper metallization layer has a metallization section which has an underside facing the isolation carrier, a top side facing away from the isolation carrier, and a side surface closed in a ring-shaped fashion. The side surface laterally delimits the metallization section and extends continuously between the top side and the underside. The dielectric coating is on the side surface and the top side, and extends continuously from the side surface onto the top side.

Abstract: A circuit carrier includes a dielectric isolation carrier, an upper metallization layer applied to the dielectric isolation carrier, and a dielectric coating. The upper metallization layer has a metallization section which has an underside facing the isolation carrier, a top side facing away from the isolation carrier, and a side surface closed in a ring-shaped fashion. The side surface laterally delimits the metallization section and extends continuously between the top side and the underside. The dielectric coating is on the side surface and the top side, and extends continuously from the side surface onto the top side.

Abstract: A semiconductor module includes a multilayer substrate. The multilayer substrate includes a first metal layer and a first ceramic layer over the first metal layer. An edge of the first ceramic layer extends beyond an edge of the first metal layer. The multilayer substrate includes a second metal layer over the first ceramic layer and a second ceramic layer over the second metal layer. An edge of the second ceramic layer extends beyond an edge of the second metal layer. The multilayer substrate includes a third metal layer over the second ceramic layer.

Abstract: A semiconductor module includes a multilayer substrate. The multilayer substrate includes a first metal layer and a first ceramic layer over the first metal layer. An edge of the first ceramic layer extends beyond an edge of the first metal layer. The multilayer substrate includes a second metal layer over the first ceramic layer and a second ceramic layer over the second metal layer. An edge of the second ceramic layer extends beyond an edge of the second metal layer. The multilayer substrate includes a third metal layer over the second ceramic layer.