Abstract: Apparatus and methods for removing particles from a surface of a semiconductor wafer or optical component using a carbon dioxide snow spray directed at the wafer or component while simultaneously irradiating the surface with a laser beam. The apparatus comprises a carbon dioxide jet spray cleaning system disposed within an environmental cleaning station of a processing system that processes the wafer or component. The processing system is a conveyorized system wherein a conveyor belt or web transports wafers or components from processing station to processing station. The cleaning station includes a recirculating blower system, a laminar flow screen, a high efficiency particulate air filter, and a ducting system for recirculating purified air or inert gas. The cleaning station contains a jet spray nozzle that produces a carbon dioxide snow spray. The jet spray nozzle is coupled by way of a manifold to a liquid carbon dioxide tank that supplies liquid carbon dioxide to the jet spray nozzle.

Abstract: In accordance with the teachings of the present invention, an apparatus and method for cleaning large glass plates each having first and second major surfaces is provided. The apparatus (10) includes an enclosure (14) which maintains a cleaning environment in which a glass plate (42) is decontaminated. An actuated support member (40) vertically translates the glass plate (42) into the enclosure (14) where it is supported with its first (46) and second (48) major surfaces substantially perpendicular to a ground plane defined by the floor space (12) occupied by the apparatus (10). A pair of opposing arrays of jet spray nozzles (62 and 64) coupled to a pressurized supply of liquid carbon dioxide (94) is provided for simultaneously directing carbon dioxide snow particles (96) in directions of the first and second major surfaces (46 and 48) of the glass plate (42), thereby removing contamination therefrom. The carbon dioxide snow particles (96) sublime within the cleaning environment of the enclosure (14).

Abstract: Apparatus for cleaning disks during processing. The apparatus is used with a disk processing system having a conveyor belt for transporting a disk carrier containing disks. The conveyor belt and the disk carrier have openings therein. A cleaning station is disposed above the conveyor belt and has an opening therein that isolates the cleaning station from the processing system. The cleaning station has a recirculating blower system, a laminar flow screen, a HEPA filter, and a ducting system for recirculating purified air or inert gas. A carbon dioxide jet spray cleaning system is provided that has a plurality of sets of jet spray nozzles disposed in the cleaning station that are coupled by way of manifolds to a liquid carbon dioxide tank that supplies liquid carbon dioxide to the nozzles.

Abstract: Detection apparatus for use with a carbon dioxide jet spray cleaning system that determines whether liquid carbon dioxide is flowing between a storage tank and a jet spray nozzle. The detection apparatus determines whether carbon dioxide snow is generated by the jet spray nozzle, which is produced by expansion of liquid carbon dioxide through the jet spray nozzle. The apparatus comprises a transfer tube coupled between the storage tank and the jet spray nozzle that has transparent input and output windows and which permits liquid carbon dioxide to flow from the storage tank to the jet spray nozzle. A light source produces light that is focused on a pinhole in an aperture stop. A collimating lens images collimated light on the input window of the transfer tube, and a light detector detects light that is refracted by liquid carbon dioxide in the transfer tube that exits through the output window and is incident thereon, and generates an output signal indicating light detection.