Abstract: A method and apparatus for exposing a layer of photoresist on a sheet includes positioning the sheet in a vacuum printing frame comprising a glass photographic printing plate carrying an opaque master pattern of metal or metal oxide on a central area of the printing plate. A light transmissive rubbery material is patterned in such a fashion as to overlie the opaque portions of the master pattern and provide a continuous path between the islands overlying the opaque master pattern. The rubbery material also extends in the peripheral area of the photographic printing plate and a plurality of mesas separated by channels are formed in this peripheral area. The channels have a width substantially greater than the path width formed between adjacent islands of rubbery material overlying the opaque portions of the pattern. The peripheral channels facilitate the evacuation of the plate and reduce evacuation time.

Abstract: A method for exposing a layer of photoresist on a sheet includes positioning the sheet in a vacuum printing frame comprising a glass plate carrying an opaque master pattern of metal or metal oxide. With the pattern opposite the coating, the frame is evacuated and the layer is exposed. The pattern has a substantially-uniform thickness in the range of about 0.5.+-.0.2 micrometer. To reduce the times for evacuating and devacuating the frame, the pattern side of the glass plate carries an array of light-transparent islands up to about 3.0-micrometer thick. An overcoating of wax on the islands is a further aid.

Abstract: A method for exposing a layer of photoresist on a sheet includes positioning the sheet in a vacuum printing frame comprising a glass plate carrying an opaque master pattern of metal or metal oxide. With the pattern opposite the coating, the frame is evacuated and the layer is exposed. The pattern has a substantially-uniform thickness in the range of about 0.5.+-.0.2 micrometer. To reduce the times for evacuating and devacuating the frame, the pattern side of the glass plate carries an array of light-transparent islands up to about 3.0-micrometer thick. An overcoating of wax on the islands is a further aid.

Abstract: A method for exposing a layer of photoresist on a sheet includes positioning the sheet in a vacuum printing frame comprising a glass plate carrying an opaque master pattern of metal or metal oxide. With the pattern opposite the coating, the frame is evacuated and the layer is exposed. The pattern has a substantially-uniform thickness in the range of about 0.5.+-.0.2 micrometer. To reduce the times for evacuating and devacuating the frame, the pattern side of the glass plate carries an array of light-transparent islands up to about 3.0-micrometer thick. An overcoating of wax on the islands is a further aid.