Abstract: Dynamic radiation beam shaping methods and systems, comprising: providing a radiation source for delivering an input radiation beam; disposing a first optical element substantially adjacent to the radiation source; disposing a second optical element substantially adjacent to the first optical element; and moving one or more of the first optical element and the second optical element relative to one another such that either an output radiation beam has a variable predetermined shape or the output radiation beam maintains a predetermined shape when the input radiation beam is varied. Optionally, the first optical element and the second optical element each comprise a freeform shape and predetermined diffractive characteristics, refractive characteristics, reflective characteristics, hybrid characteristics, gradient index materials, metamaterials, metasurfaces, subwavelength structures, and/or plasmonics.

Abstract: Dynamic radiation beam shaping methods and systems, comprising: providing a radiation source for delivering an input radiation beam; disposing a first optical element substantially adjacent to the radiation source; disposing a second optical element substantially adjacent to the first optical element; and moving one or more of the first optical element and the second optical element relative to one another such that either an output radiation beam has a variable predetermined shape or the output radiation beam maintains a predetermined shape when the input radiation beam is varied. Optionally, the first optical element and the second optical element each comprise a freeform shape and predetermined diffractive characteristics, refractive characteristics, reflective characteristics, hybrid characteristics, gradient index materials, metamaterials, metasurfaces, subwavelength structures, and/or plasmonics.

Abstract: The invention includes a template useful for the fabrication of devices having one, two, or three dimensional geometries. The template can include at least a first patterned surface and a mask integrated into the template for creating an interference pattern when radiation is passed through the mask. The template can be useful in the production of shaped structures including one-, two-, or three-dimensionally shaped patterns, and further including at least one shaped surface.

Abstract: A passive optical element is transferred into a substrate already having features with a vertical dimension thereon. The features may be another passive optical element, an active optical element, a dichroic layer, a dielectric layer, alignment features, metal portions. A protective layer is provided over the feature during the transfer of the optical element. One or more of these processes may be performed on a wafer level.

Abstract: An optical coupler reduces differential mode delay in a fiber by reducing an amount of light incident on the fiber in a region in which the refractive index is not well controlled. This region of the fiber is typically in the center of the fiber The optical coupler directs light away from the this region and/or provides a high angle of incidence to any light on this region. A diffuser may be used to reduce sensitivity of the coupler to any fluctutations in the output of the light source. The optical coupler does not need to be offset from the center of the multi-mode coupler. A phase function of an azimuthal mode of the fiber may be imposed on the light beam so that a substantial null on axis is maintained even after propogation of the light beam beyond the depth of focus of the coupler. A diffractive element generating a beam which propogates in a spiral fashion along an axis allows the shape of the beam to be maintained for longer than a depth of focus of the diffractive element.

Abstract: A passive optical element is transferred into a substrate already having features with a vertical dimension thereon. The features may be another passive optical element, an active optical element, a dichroic layer, a dielectric layer, alignment features, metal portions. A protective layer is provided over the feature during the transfer of the optical element. One or more of these processes may be performed on a wafer level.

Abstract: An aspheric microlens, particularly a conic constant of the microlens, may be evaluated and this evaluation may be used to determine an optimal process for creating the aspheric microlens. Such evaluation may include a curve fitting or a numerical expression of the wavefront.

Abstract: Numerous features may be incorporated into a wavelength locker to reduce the noise inherent therein. These features may be used in any combination thereof. These features include avoiding the use of reflectors, using a diffractive splitter which outputs evanescent beams for diffractive orders greater than one, using anti-reflective coatings, using an opaque material with through holes for the light, and designing the wavelength locker to be used at a tilt.

Abstract: Gray scale masks used to create optical elements are formed. Desired gray scale patterns may be created by varying a transmission across a mask, e.g., by varying the thickness of a light absorbing layer. Such variations in thickness may be created using multiple binary masks. Desired gray scale patterns may also be created on a computer using available software and then imaged onto film or a glass film plate. Direct contact or proximity printing is then used to transfer the true gray scale pattern onto a photoresist layer. The photoresist layer is then etched, thereby forming the desired pattern therein. All portions of the desired pattern are simultaneously formed in the photoresist layer. The etched photoresist layer is then used to photolithographically fabricate either the optical element itself or a master element to be used in injection molding or other replication techniques. The gray scale mask itself may be used repeatedly to generate photoresist layers.

Abstract: An optical coupler reduces differential mode delay in a fiber by reducing an amount of light incident on the fiber in a region in which the refractive index is not well controlled. This region of the fiber is typically in the center of the fiber The optical coupler directs light away from the this region and/or provides a high angle of incidence to any light on this region. A diffuser may be used to reduce sensitivity of the coupler to any fluctutations in the output of the light source. The optical coupler does not need to be offset from the center of the multi-mode coupler. A phase function of an azimuthal mode of the fiber may be imposed on the light beam so that a substantial null on axis is maintained even after propogation of the light beam beyond the depth of focus of the coupler. A diffractive element generating a beam which propogates in a spiral fashion along an axis allows the shape of the beam to be maintained for longer than a depth of focus of the diffractive element.

Abstract: A passive optical element is transferred into a substrate already having features with a vertical dimension thereon. The features may be another passive optical element, an active optical element, a dichroic layer, a dielectric layer, alignment features, metal portions. A protective layer is provided over the feature during the transfer of the optical element. One or more of these processes may be performed on a wafer level.

Abstract: Numerous features may be incorporated into a wavelength locker to reduce the noise inherent therein. These features may be used in any combination thereof.

Abstract: An aspheric microlens, particularly a conic constant of the microlens, may be evaluated and this evaluation may be used to determine an optimal process for creating the aspheric microlens. Such evaluation may include a curve fitting or a numerical expression of the wavefront.

Abstract: Gray scale masks used to create optical elements are formed. Desired gray scale patterns may be created by varying a transmission across a mask, e.g., by varying the thickness of a light absorbing layer. Such variations in thickness may be created using multiple binary masks. Desired gray scale patterns may also be created on a computer using available software and then imaged onto film or a glass film plate. Direct contact or proximity printing is then used to transfer the true gray scale pattern onto a photoresist layer. The photoresist layer is then etched, thereby forming the desired pattern therein. All portions of the desired pattern are simultaneously formed in the photoresist layer. The etched photoresist layer is then used to photolithographically fabricate either the optical element itself or a master element to be used in injection molding or other replication techniques. The gray scale mask itself may be used repeatedly to generate photoresist layers.

Abstract: Gray scale masks used to create optical elements are formed. Desired gray scale patterns may be created by varying the thickness of a light absorbing layer. Such variations in thickness may be created using multiple binary masks. Desired gray scale patterns may also be created on a computer using available software and then imaged onto film or a glass film plate. Direct contact or proximity printing is then used to transfer the true gray scale pattern onto a photoresist layer. The photoresist layer is then etched, thereby forming the desired pattern therein. All portions of the desired pattern are simultaneously formed in the photoresist layer. The etched photoresist layer is then used to photolithographically fabricate either the optical element itself or a master element to be used in injection molding or other replication techniques. The gray scale mask itself may be used repeatedly to generate photoresist layers.

Abstract: Gray scale masks used to create optical elements are formed. Desired gray scale patterns may be created by varying the thickness of a light absorbing layer. Such variations in thickness may be created using multiple binary masks. Desired gray scale patterns may also be created on a computer using available software and then imaged onto film or a glass film plate. Direct contact or proximity printing is then used to transfer the true gray scale pattern onto photoresist. The photoresist is then etched, thereby forming the desired pattern therein. All portions of the desired pattern are simultaneously formed in the photoresist. The etched photoresist is then used to photolithographically fabricate either the optical element itself or a master element to be used in injection molding or other replication techniques. The gray scale mask itself may be used repeatedly to generate photoresists. The imaging is particularly useful for forming optical elements having a plurality of arrays of refractive elements.

Abstract: Optical structures are replicated in photoresist on a substrate using a stamp. The transfer of the pattern into the liquid photoresist and the provision on the substrate can be achieved using manual pressures. Various techniques may be used to remove air from the liquid photoresist. The stamp is removed once the liquid photoresist is fully solidified. These structures in solidified photoresist may serve as optical elements or may be accurately transferred into the substrate. The stamp may be for an entire wafer.