Abstract: A charged particle beam device, comprising a charged particle source configured to emit a charged particle beam; a movable stage comprising an assembly of aperture arrays having at least a first aperture array and a second aperture array, the movable stage is configured to align the assembly of aperture arrays with the charged particle beam, and at least one aperture array comprises a shielding tube coupled to the movable stage.

Abstract: A charged particle beam device, comprising a charged particle source configured to emit a charged particle beam; a movable stage comprising an assembly of aperture arrays having at least a first aperture array and a second aperture array, the movable stage is configured to align the assembly of aperture arrays with the charged particle beam, and at least one aperture array comprises a shielding tube coupled to the movable stage.

Abstract: A valve unit configured for a charged particle beam device having a beam path 2 is described. The valve unit includes a vacuum sealed valve housing 102 configured for a pressure difference between the inside of the valve housing and the outside of the valve housing, wherein the housing provides a beam path portion 103 for having a charged particle beam pass therethrough along the beam path, a valve positioning unit adapted for selectively providing a first movement of the valve housing such that the beam path portion is selectively moved into and out of the beam path, and at least one sealing element 122 configured for a second movement, wherein the second movement is different from the first movement.

Abstract: A valve unit configured for a charged particle beam device having a beam path 2 is described. The valve unit includes a vacuum sealed valve housing 102 configured for a pressure difference between the inside of the valve housing and the outside of the valve housing, wherein the housing provides a beam path portion 103 for having a charged particle beam pass therethrough along the beam path, a valve positioning unit adapted for selectively providing a first movement of the valve housing such that the beam path portion is selectively moved into and out of the beam path, and at least one sealing element 122 configured for a second movement, wherein the second movement is different from the first movement.

Abstract: A gas field ion source is described. The gas field ion source includes an emitter module. The emitter module includes an emitter holder, an emitter structure, a detachably connectable electrical connection assembly of the emitter module, and a detachably connectable gas supply connection assembly of the emitter module. The gas field ion source further includes a supply module, wherein the supply module includes an electrical conductor for providing voltage and/or current, a gas supply conduit, a thermal conductor, a detachably connectable electrical connection assembly of the supply module, and a detachably connectable gas supply connection assembly of the supply module. The emitter module and the supply module are detachably connectable by the detachably connectable connection assemblies of the emitter module and the detachably connectable connection assemblies of the supply module.

Abstract: A gas field ion source is described for a charged particle beam device having a charged particle beam column. The gas field ion source includes an emitter unit, a cooling unit, and a thermal conductivity unit for thermal conductivity from the cooling unit to the emitter unit, wherein the thermal conductivity unit is adapted for reduction of vibration transfer from the cooling unit to the emitter unit.

Abstract: A gas field ion source is described for a charged particle beam device having a charged particle beam column. The gas field ion source includes an emitter unit, a cooling unit, and a thermal conductivity unit for thermal conductivity from the cooling unit to the emitter unit, wherein the thermal conductivity unit is adapted for reduction of vibration transfer from the cooling unit to the emitter unit.

Abstract: A gas field ion source is described for a charged particle beam device having a charged particle beam column. The gas field ion source includes an emitter unit, a cooling unit, and a thermal conductivity unit for thermal conductivity from the cooling unit to the emitter unit, wherein the thermal conductivity unit is adapted for reduction of vibration transfer from the cooling unit to the emitter unit.

Abstract: A gas field ion source is described. The gas field ion source includes an emitter module. The emitter module includes an emitter holder, an emitter structure, a detachably connectable electrical connection assembly of the emitter module, and a detachably connectable gas supply connection assembly of the emitter module. The gas field ion source further includes a supply module, wherein the supply module includes an electrical conductor for providing voltage and/or current, a gas supply conduit, a thermal conductor, a detachably connectable electrical connection assembly of the supply module, and a detachably connectable gas supply connection assembly of the supply module. The emitter module and the supply module are detachably connectable by the detachably connectable connection assemblies of the emitter module and the detachably connectable connection assemblies of the supply module.

Abstract: The invention provides a charged particle beam device, an emitter module for emitting charged particle beams and a method of operation thereof. Thereby, a charged particle beam emitter (15) emitting charged particles along an optical axis (1) is realized. On the same carrier body (32), a cleaning emitter (16) for emitting charged particles approximately along the optical axis (1) is realized. Thus, an improved cleaning can be provided.

Abstract: An ion beam apparatus is provided, the ion beam apparatus comprising a movable ion source, a condenser lens, an aperture, and a scanning unit disposed between the condenser lens and the aperture, said scanning unit being adapted to scan an ion beam across the aperture. Furthermore, a method for aligning components of an ion beam apparatus is provided, comprising the steps of: producing an ion beam by means of an ion source, producing a first image of a beam cross section of the ion beam at a first voltage of a condenser lens, producing a second image of the beam cross section of the ion beam at a second voltage of the condenser lens, and positioning the ion source so that the centers of the first and second images coincide.

Abstract: We have developed a method and apparatus for cooling electromagnetic lens coils of the kind used in charged particle beams. The method and apparatus provide not only a symmetrical cooling effect around the optical axis of the charged particle beam, but also provide improved uniformity of heat transfer. This improved uniformity enables control over the optical axis of the charged particle beam within about 1 nm for high current charged particle beam columns, wherein the current ranges from about 100 nanoamps to about 1000 nanoamps. The use of a squat and wide electromagnetic lens coil in combination with an essentially flat modular cooling panel, which provides uniform cooling to the electromagnetic lens coil, not only enables control over the optical axis of the charged particle beam, but also provides mechanical stability for the charged particle beam column.

Abstract: The present invention provides a charged particle emission component (100) for providing a charged particle beam (17) to a chamber of a charged particle beam column. The device comprises a gun chamber for housing the charged particle emission component; an emitter (16) for emitting a beam of charged particles; at least one beam shaping element (109; 18; 108; 402); and a residual gas diffusion barrier (106; 206) directly subsequent the emitter.

Abstract: We have developed a method and apparatus for cooling electromagnetic lens coils of the kind used in charged particle beams. The method and apparatus provide not only a symmetrical cooling effect around the optical axis of the charged particle beam, but also provide improved uniformity of heat transfer. This improved uniformity enables control over the optical axis of the charged particle beam within about 1 nm for high current charged particle beam columns, wherein the current ranges from about 100 nanoamps to about 1000 nanoamps. The use of a squat and wide electromagnetic lens coil in combination with an essentially flat modular cooling panel, which provides uniform cooling to the electromagnetic lens coil, not only enables control over the optical axis of the charged particle beam, but also provides mechanical stability for the charged particle beam column.

Abstract: The invention provides a charged particle beam device, an emitter module for emitting charged particle beams and a method of operation thereof. Thereby, a charged particle beam emitter (15) emitting charged particles along an optical axis (1) is realized. On the same carrier body (32), a cleaning emitter (16) for emitting charged particles approximately along the optical axis (1) is realized. Thus, an improved cleaning can be provided.

Abstract: A deflection system (6) for a charged particle beam (2), in particular for rrangement in an objective lens for a charged particle beam device with a deflection means (60) for generating a magnetic field acting on the charged particle beam (2) and a shield (61) for avoiding eddy currents, which surrounds the deflection means and guides the formed outer magnetic field. The shield (61) consists, transversely to the direction of the charged particle beam (2), of at least one soft magnetic layer which is preferably formed as a strip material and rolled up to a cylinder together with an electrically insulating layer.