Patents by Inventor Thomas Jeys

Thomas Jeys has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20080068605
    Abstract: Particle detection systems without knowledge of a location and velocity of a particle passing through a volume of space, are less efficient than if knowledge of the particle location is known. An embodiment of a particle position detection system capable of determining an exact location of a particle in a fluid stream is discussed. The detection system may employ a patterned illuminating beam, such that once a particle passes through the various portions of the patterned illuminating beam, a light scattering is produced. The light scattering defines a temporal profile that contains measurement information indicative of an exact particle location. However, knowledge of the exact particle location has several advantages. These advantages include correction of systematic particle measurement errors due to variability of the particle position within the sample volume, targeting of particles based on position, capture of particles based on position, reduced system energy consumption and reduced system complexity.
    Type: Application
    Filed: May 18, 2007
    Publication date: March 20, 2008
    Inventors: William Herzog, Antonio Sanchez-Rubio, Gregory Cappiello, Ronald Hoffeld, Shane Tysk, Vincenzo Daneu, Thomas Jeys
  • Publication number: 20080030716
    Abstract: Aerosol and hydrosol particle detection systems without knowledge of a location and velocity of a particle passing through a volume of space, are less efficient than if knowledge of the particle location is known. An embodiment of a particle position detection system capable of determining an exact location of a particle in a fluid stream is discussed. The detection system may employ a patterned illuminating beam, such that once a particle passes through the patterned illuminating beam, a light scattering is produced. The light scattering defines a temporal profile that contains measurement information indicative of an exact particle location. However, knowledge of the exact particle location has several advantages. These advantages include correction of systematic particle measurement errors due to variability of the particle position within the sample volume, targeting of particles based on position, capture of particles based on position, reduced system energy consumption and reduced system complexity.
    Type: Application
    Filed: May 18, 2007
    Publication date: February 7, 2008
    Inventors: Thomas Jeys, Antonio Sanchez-Rubio, Ronald Hoffeld, Jonathan Lin, Nicholas Judson, George Haldeman, Vincenzo Daneu