Abstract: An aqueous dispersion including a partially fluorinated dispersant, an electrically conductive polymer and a film forming additive. The film forming additive includes a boiling temperature greater than about 85° C. (185° F.). In addition, the concentration of the film forming additive is less than the solubility limit of the additive in water. The dynamic surface tension of the dispersion including the film forming additive is less than about 60 dynes/cm at 100 ms surface age. A method for making an electrically conductive polymer film and devices including electrically conductive polymer film are also disclosed.

Abstract: The use of a poly(arylene ether) polymer as a passivation or gate dielectric layer in thin film transistors. This poly(arylene ether) polymer includes polymer repeat units of the following structure: —(O—Ar1—O—Ar2—O—)m—(—O—Ar3—O—Ar4—O)n— where Ar1, Ar2, Ar3, and Ar4 are identical or different aryl radicals, m is 0 to 1, n is 1?m, and at least one of the aryl radicals is grafted to the backbone of the polymer.

Abstract: An aqueous dispersion including a partially fluorinated dispersant, an electrically conductive polymer and a film forming additive. The film forming additive includes a boiling temperature greater than about 85° C. (185° F.). In addition, the concentration of the film forming additive is less than the solubility limit of the additive in water. The dynamic surface tension of the dispersion including the film forming additive is less than about 60 dynes/cm at 100 ms surface age. A method for making an electrically conductive polymer film and devices including electrically conductive polymer film are also disclosed.

Abstract: A process for preparing a photoimprinted film, a composition for forming a photoimprinted film and a photoimprinted film comprising a dielectric constant of less than about 3.5. The method includes providing a material film having a composition including at least one silica source capable of being sol-gel processed, at least one photoactive compound and at least one solvent; and water. The composition contains less than about 0.1% by weight of an added acid. A mold having mold features is provided. The mold is positioned in sufficient contact with the material film to allow the material to contact at least a portion of the mold features. The material film is then exposed to a radiation source and the film is cured to form a solidified material film. The mold is separated from the solidified material, wherein the material includes film features corresponding to the mold features.

Abstract: A method for making a rigid polyurethane foam by reacting a polyisocyanate and a polyol in the presence of a urethane catalyst, a blowing agent and a silicone surfactant characterized by employing a blowing agent comprising a C4 or C5 hydrocarbon, or mixtures thereof, with an average molecular weight of ?72 g/mole and a boiling point in the range of 27.8 to 50° C., and a silicone surfactant comprising a polyether-polysiloxane copolymer represented by the following formula: (CH3)3—Si—O—(Si(CH3)2—O)x—(Si(CH3)(R)O)y—Si(CH3)3 where R=(CH2)3—O—(—CH2—CH2—O)a—(CH2—CH(CH3)—O)b—R?, and where R? is H, (CH2)zCH3, or C(O)CH3; x+y+2 is 60–130; x/y is 5–14; z is 0–4; the total surfactant molecular weight, based on the formula, is 7000–30,000 g/mole, the wt % siloxane in the surfactant is 32–70 wt %, the blend average molecular weight (BAMW) of the polyether portion is 450–1000 g/mole, and the mole % of ethylene oxide in the polyether portion is 70–100 mole %.

Abstract: Disclosed herein is a fluorinated bridged carbocyclic compound that can be polymerized by itself or with at least one other ethylenically unsaturated monomer to provide a polymer. The polymer may be used, for example, within a sub-300 nm photoresist composition. Also disclosed is a method to make the bridged carbocyclic compound.

Abstract: Disclosed herein is an acrylic compound that can be polymerized by itself or with at least one other ethylenically unsaturated monomer to provide a polymer. The polymer may be used, for example, within a sub-200 nm photoresist composition. Also disclosed is a method to make the acrylic compound of the present invention from the raw material trifluoroacetone.

Abstract: Disclosed herein is an acrylic compound that can be polymerized by itself or with at least one other ethylenically unsaturated monomer to provide a polymer. The polymer may be used, for example, within a sub-200 nm photoresist composition. Also disclosed is a method to make the acrylic compound of the present invention from the raw material trifluoroacetone.

Abstract: Polyurethane prepolymer which can be converted into a final product by reaction with a curative or chain extending agent is made by reacting polyisocyanate with polyol in the presence of an amount of an aliphatic hydrocarbon which is a solvent for the polyisocyanate but a non-solvent for the prepolymer. In order to minimize the formation of unwanted oligomers the polyisocyanate is present in stoichiometric excess with respect to the polyol and the amount of hydrocarbon solvent present in the reaction mixture is limited so that a single liquid phase is present in the mixture during most of the synthesis. Solvent containing dissolved isocyanate is then removed from the prepolymer by liquid phase separation. A portion of the solvent can be distilled from this isocyanate solution for use in liquid--liquid extraction of residual isocyanate from the prepolymer, and the remaining solution of isocyanate in hydrocarbon solvent can be used in prepolymer synthesis.