Abstract: A device for phase microscopy is disclosed that comprises a spatial light modulator and a connecting means adapted to fix the spatial light modulator onto a phase microscope. The phase microscope comprises a light path comprising at least a sample area, a light device for lighting said sample area, and an imaging device for capturing a phase image of said sample area. The phase image is a 2D matrix of pixels. The spatial light modulator is positioned in the light path in a conjugated plane of the sample area. The device also comprises a command of the spatial light modulator connected to the imaging device and adapted to measure the phase shift of a plurality of pixels of the phase image and to command the spatial light modulator in order to subtract the measured phase shifts.

Abstract: Improved aberration correction in multipass electron microscopy is provided by having Fourier images of the sample (instead of real images) at the reflection planes of the resonator. The resulting ?1 magnification of the sample reimaging can be compensated by appropriate sample placement or by adding compensating elements to the resonator. This enables simultaneous correction of lowest order chromatic and spherical aberration from the electron objective lenses. If real images of the sample are at the reflection planes of the resonator instead, only the lowest order chromatic aberration can be corrected.

Abstract: Device for phase microscopy comprising: a spatial light modulator, a connecting means adapted to fix the spatial light modulator onto a phase microscope, said phase microscope comprising a light path comprising at least a sample area, a lighting device for lighting said sample area and an imaging device for capturing a phase image of said sample, said phase image being a 2D matrix of pixels, so that the spatial light modulator is positioned in the light path in a conjugated plane of the sample area and a command of the spatial light modulator connected to the imaging device and adapted to measure the phase shift of a plurality of pixels of the phase image and to command the spatial light modulator in order to subtract the measured phase shifts.

Abstract: Improved aberration correction in multipass electron microscopy is provided by having Fourier images of the sample (instead of real images) at the reflection planes of the resonator. The resulting ?1 magnification of the sample reimaging can be compensated by appropriate sample placement or by adding compensating elements to the resonator. This enables simultaneous correction of lowest order chromatic and spherical aberration from the electron objective lenses. If real images of the sample are at the reflection planes of the resonator instead, only the lowest order chromatic aberration can be corrected.

Abstract: A measurement system includes a focused light source, a first mirror, a plurality of first lenses, a second mirror, a plurality of second lenses and an imaging device. The first mirror is positioned on a first side of a sample and configured to receive light from the light source. The plurality of first lenses are positioned between the first mirror and the sample. The second mirror is positioned on a second side of the sample. The plurality of second lenses are positioned between the second mirror and the sample. The imaging device is positioned adjacent to the second mirror and configured to receive the light from the light source after the light propagates a number of propagations between the first mirror and the second mirror, and through the first lenses and the second lenses.