Abstract: A method for production of a substrate having a patterned optical coating on a curved surface is provided. The method includes applying a masking to a sub-area of the curved surface applying an optical coating using a vacuum deposition method, and removing the masking. A coated substrate, which can be produced in particular by the method described above, is also provided. The coated substrate includes a curved surface that is provided with at least one patterned optical coating. The at least one patterned optical coating is provided on at least one sub-area of the curved surface and is missing on at least one adjacent sub-area.

Abstract: In the case of CVD methods, comprising PECVD and PICVD methods, the aim of the invention is to improve the impurity-free and, as far as possible, temporally and quantitatively precise feeding of process gases for the targeted layer systems. To this end, the invention provides a coating system and a method for coating articles with alternating layers, in the case of which process gases are introduced in an alternating fashion into a gas mixing point and mixed with a further gas and led to the reaction chamber, in which the deposition is carried out by producing a plasma.

Abstract: A method and apparatus for coating substrates by means of plasma enhanced vapor deposition are provided, in which at least part of the surroundings of the substrate surface of a substrate to be coated is evacuated and a process gas with a starting substance for the coating is admitted, wherein the coating is deposited by a plasma being ignited by radiating in electromagnetic energy in the surroundings of the substrate surface filled with the process gas. The electromagnetic energy is radiated in by a multiplicity of pulse sequences, preferably microwave or radiofrequency pulses, with a multiplicity of pulses spaced apart temporally by first intermissions, wherein the electromagnetic energy radiated in is turned off in the intermissions, and wherein the intermissions between the pulse sequences are at least a factor of 3, preferably at least a factor of 5, longer than the first intermissions between the pulses within a pulse sequence.

Abstract: The invention relates to layer systems having at least one layer comprising titanium aluminum oxide. The layer comprising titanium aluminum oxide may be either a functional layer—with or without interruption by an intermediate layer which is optically inactive—or a functional layer formed from a metal oxide which is interrupted by an intermediate layer comprising titanium aluminum oxide. The layer systems are structurally and thermally stable at operating temperatures of over 600° C. The layer systems may either comprise only one functional layer or may be a multilayer system, preferably an alternating layer system composed of functional layers with high and low refractive indices.

Abstract: The invention provides a process for producing at least one optical filter layer segment on a substrate. The process includes applying a masking comprising a resist layer on a surface of the substrate, depositing an optical filter layer on the surface and the resist layer by vacuum deposition, and removing the resist layer with a portion of the optical filter layer thereon from the surface. The deposition of the optical filter layer, at least at times, takes place at a temperature of over 150° C., preferably in a range from over 150° C. up to and including 400° C.

Abstract: A method of producing substrates with functional layers which have high optical properties and/or a high surface smoothness, in particular a low turbidity and significantly lower roughness, is provided. The method includes a sputtering process for coating a substrate with at least one functional layer, the sputtering process being interrupted at least once by the application of an intermediate layer with a thickness of less than 20 nm.

Abstract: The invention relates to a discharge vessel of a quartz glass for discharge lamps with a diffusion barrier inner layer of silicon oxide, which as a single layer is applied and/or is generated on the inner surface as well as to a method for generating and/or applying such a diffusion barrier inner layer and to the use of such a discharge vessel.

Abstract: In order to provide a thermostable and highly effective barrier coating on a substrate, and to protect the substrate against the effect of harmful gas components even at high temperatures, the invention provides a coated substrate comprising a barrier coating having a multiplicity of consecutive individual layers respectively of a kind differing from or similar to a neighboring individual layer, the individual layers exhibiting a layer thickness of respectively at most 50 nanometers.

Abstract: The invention is based on the object of reducing the heating of substrates during plasma enhanced chemical vapor deposition. For this purpose, a method and an apparatus for coating substrates by means of plasma enhanced vapor deposition are provided, in which at least part of the surroundings of the substrate surface of a substrate to be coated is evacuated and a process gas with a starting substance for the coating is admitted, wherein the coating is deposited by a plasma being ignited by radiating in electromagnetic energy in the surroundings of the substrate surface filled with the process gas.

Abstract: The invention provides a process for producing a high-precision reflector and its coating. A reflector is produced from a solid material using a material-removing process and is coated with a cold-light mirror layer.

Abstract: In the case of CVD methods, comprising PECVD and PICVD methods, the aim of the invention is to improve the impurity-free and, as far as possible, temporally and quantitatively precise feeding of process gases for the targeted layer systems. To this end, the invention provides a coating system and a method for coating articles with alternating layers, in the case of which process gases are introduced in an alternating fashion into a gas mixing point and mixed with a further gas and led to the reaction chamber, in which the deposition is carried out by producing a plasma.

Abstract: In order to improve the energy balance of an HID lamp, the quartz burner, preferably the inside thereof, is coated with a UV reflecting layer system by alternatingly applying amorphous thin layers made at least of titanium oxide and silicon oxide having the respective general stoichiometry TiOy and SiOx by means of a plasma impulse chemical vapor deposition (PICVD) method at a high power density and increased substrate temperatures ranging from 100° to 400° C., using small growth rates ranging from 1 nm/sec to 100 nm/sec so as to form an interference layer system having a thickness of less than 1200 nm and a minimized UV-active defective spot rate ranging from 0.1 to 1 percent.

Abstract: The invention relates to a process for producing a high-precision reflector and its coating. A reflector is produced from a solid material using a material-removing process and is coated with a cold-light mirror layer.

Abstract: The invention relates to layer systems having at least one layer comprising titanium aluminum oxide. The layer comprising titanium aluminum oxide may be either a functional layer—with or without interruption by an intermediate layer which is optically inactive—or a functional layer formed from a metal oxide which is interrupted by an intermediate layer comprising titanium aluminum oxide. The layer systems are structurally and thermally stable at operating temperatures of over 600° C. The layer systems may either comprise only one functional layer or may be a multilayer system, preferably an alternating layer system composed of functional layers with high and low refractive indices.

Abstract: The invention provides a process for producing a high-precision reflector and its coating. A reflector is produced from a solid material using a material-removing process and is coated with a cold-light mirror layer.

Abstract: The reflector for a light of higher power has a base body made of glass or glass ceramic and a protective jacket provided on the outer surface of the base body. The base body is formed with a receptacle for a light source, especially a gas discharge lamp, and an interior mirror surface for reflecting light. The protective jacket includes a mat or is a mat-shaped body, i.e. a woven or knit textile fabric of natural or synthetic material. Preferably it is a glass-fiber-reinforced mat. In addition to preventing splinters from flying around, the protective jacket advantageously also provides temperature equalization throughout the reflector. It also helps to prevent scattered light. The protective mat or jacket may be attached to the base body with an adhesive, such as a water glass.

Abstract: A method for production of a substrate having a patterned optical coating on a curved surface is provided. The method includes applying a masking to a sub-area of the curved surface, applying an optical coating using a vacuum deposition method, and removing the masking. A coated substrate, which can be produced in particular by the method described above, is also provided. The coated substrate includes a curved surface that is provided with at least one patterned optical coating. The at least one patterned optical coating is provided on at least one sub-area of the curved surface and is missing on at least one adjacent sub-area.

Abstract: The invention provides a process for producing at least one optical filter layer segment on a substrate. The process includes applying a masking comprising a resist layer on a surface of the substrate, depositing an optical filter layer on the surface and the resist layer by vacuum deposition, and removing the resist layer with a portion of the optical filter layer thereon from the surface. The deposition of the optical filter layer, at least at times, takes place at a temperature of over 150° C., preferably in a range from over 150° C. up to and including 400° C.

Abstract: A container having an at least partly transparent hollow body and a decoration is provided. The decoration includes at least one interior lining of the hollow body so that reactions between ingredients of a product situated in the container and constituents of the decoration are prevented.

Abstract: In order to improve the energy balance of an HID lamp, the quartz burner, preferably the inside thereof, is coated with a UV reflecting layer system by alternatingly applying amorphous thin layers made at least of titanium oxide and silicon oxide having the respective general stoichiometry TiOy and SiOx by means of a plasma impulse chemical vapor deposition (PICVD) method at a high power density and increased substrate temperatures ranging from 100° to 400° C., using small growth rates ranging from 1 nm/sec to 100 nm/sec so as to form an interference layer system having a thickness of less than 1200 nm and a minimized UV-active defective spot rate ranging from 0.1 to 1 percent.