Abstract: Systems and methods for optical lithography using photo-masks and accessory optical components are disclosed. In one embodiment, a system includes a photo-mask with a body element, one or more diffractive elements, and one or more functional-element-producing features. The diffractive elements can be disposed on or within at least a portion of the body element and can be configured to produce, upon illumination of the photo-mask, multiple beams to form a three-dimensional periodic-optical-intensity pattern in a photosensitive material. The functional-element-producing features can be disposed on or within at least a portion of the body element and can be configured to produce, upon illumination of the photo-mask, a corresponding functional element pattern as an increased optical intensity pattern or decreased optical intensity pattern within the three-dimensional periodic-optical-intensity pattern in the photosensitive material.

Abstract: An exemplary embodiment of the present invention provides an interference projection exposure system comprising a beam-providing subsystem and an objective lens subsystem that can provide a plurality of light beams which intersect and interfere at an image plane to produce a high spatial frequency periodic optical-intensity distribution. The interference projection system can further comprise a pattern mask that can alter the periodic optical-intensity distribution so as to incorporate functional elements within the periodic optical-intensity distribution. The beam providing subsystem can comprise a beam generating subsystem, a beam conditioning subsystem and a beam directing subsystem. Another exemplary embodiment of the present invention provides for a method of producing a high spatial frequency periodic optical-intensity distribution using a interference projection exposure system.

Abstract: Systems and methods for quantitative phase imaging are disclosed. In one embodiment, a method includes acquiring a through-focal series of defocused images of an object illuminated with a partially coherent light source; calculating a plurality of estimates of longitudinal intensity derivatives for respective fittings of the series of defocused images; recovering a phase estimate for each respective estimate of the longitudinal intensity derivative by solving a transport of intensity (TIE) equation; filtering the recovered phase estimates to produce component parts of an overall phase estimate; and forming an overall phase image by addition of the filtered phase estimates.

Abstract: An exemplary embodiment of the present invention provides a diffractive photo-mask comprising a body element, a plurality of interference/image-forming hologram gratings, and a zero-order beam blocking element. The plurality of interference/image-forming hologram gratings can be located on or in the body element. The plurality of interference/image-forming hologram gratings are configured to diffract a light beam to produce one or more functional elements surrounded by a high-spatial-frequency periodic optical-intensity distribution at a substrate plane when the light beam is incident upon the diffractive photo-mask.

Abstract: An exemplary embodiment of the present invention provides an interference projection exposure system comprising a beam-providing subsystem and an objective lens subsystem that can provide a plurality of light beams which intersect and interfere at an image plane to produce a high spatial frequency periodic optical-intensity distribution. The interference projection system can further comprise a pattern mask that can alter the periodic optical-intensity distribution so as to incorporate functional elements within the periodic optical-intensity distribution. The beam providing subsystem can comprise a beam generating subsystem, a beam conditioning subsystem and a beam directing subsystem. Another exemplary embodiment of the present invention provides for a method of producing a high spatial frequency periodic optical-intensity distribution using a interference projection exposure system.

Abstract: High-dielectric-constant (k) materials and electrical devices implementing the high-k materials are provided herein. According to some embodiments, an electrical device includes a substrate and a crystalline-oxide-containing composition. The crystalline-oxide-containing composition can be disposed on a surface of the substrate. Within the crystalline-oxide-containing composition, oxide anions can form at least one of a substantially linear orientation or a substantially planar orientation. A plurality of these substantially linear orientations of oxide anions or substantially planar orientations of oxide anions can be oriented substantially perpendicular or substantially normal to the surface of the substrate such that the oxide-containing composition has a dielectric constant greater than about 3.9 in a direction substantially normal to the surface of the substrate. Other embodiments are also claimed and described.

Abstract: Photo-masks for fabricating surface-relief grating diffractive devices and methods of fabricating surface-relief grating diffractive devices are described. The photo-mask can include refractive elements and/or diffractive elements contained in or on a body element. The photo-mask can be used to simultaneously produce multiple surface-relief grating diffractive devices in a recording material. The photo-mask enables the surface-relief grating diffractive devices to be produced in large quantities while significantly reducing the cost and labor required.

Abstract: Improved photo-masks for use in fabricating periodic structures are disclosed herein. Methods of making periodic structures, as well as the periodic structures fabricated therefrom, are also disclosed. The photo-mask can include a body element and one or more sets of diffractive elements and/or refractive elements disposed on the body element or within the body element. Each set of diffractive elements and/or refractive elements can be configured to produce four non-coplanar beams of light when a beam of light is passed through it. Each set of four non-coplanar beams of light can be used to interferometrically produce a specific periodic structure at a specific location within a photosensitive recording material.

Abstract: Optoelectronic probe cards, methods of fabrication, and methods of use, are disclosed. Briefly described, one exemplary embodiment includes an optoelectronic probe card adapted to test an electrical quality and an optical quality of an optoelectronic structure under test having electrical and optical components.

Abstract: Improved photo-masks for use in fabricating photonic crystal devices are disclosed herein. Methods of making photonic crystal devices, as well as the photonic crystal devices fabricated therefrom, are also disclosed. The photo-mask can include a body element and one or more sets of diffractive elements and/or refractive elements disposed on the body element or within the body element. Each set of diffractive elements and/or refractive elements can be configured to produce four non-coplanar beams of light when a beam of light is passed through it. Each set of four non-coplanar beams of light can be used to interferometrically produce a specific photonic crystal structure at a specific location within a photosensitive recording material.

Abstract: Improved optical interconnect devices, structures, and methods of making and using the devices and structures are provided herein. The optical interconnect devices, which can be used to connect components or route signals in an integrated-circuit or circuits, generally include an optical element having a metamaterial with a negative index of refraction. The optical element is configured to receive an optical signal from a first component and transmit the optical signal to a second component. Each interconnect device or structure can be fabricated to have a small size and complex functionalities integrated therein. Other embodiments are also claimed and described.

Abstract: Improved photo-masks for use in fabricating periodic structures are disclosed herein. Methods of making periodic structures, as well as the periodic structures fabricated therefrom, are also disclosed. The photo-mask can include a body element and one or more sets of diffractive elements and/or refractive elements disposed on the body element or within the body element. Each set of diffractive elements and/or refractive elements can be configured to produce four non-coplanar beams of light when a beam of light is passed through it. Each set of four non-coplanar beams of light can be used to interferometrically produce a specific periodic structure at a specific location within a photosensitive recording material.

Abstract: Embodiments of the present disclosure provide systems and methods for constructing a profile of sample object. Briefly described, in architecture, one embodiment of the system, among others, can be implemented as follows. An interferometer device is used to collect interference images of a sample object at a sequence of angles around the sample object. Accordingly, a controller device rotates the sample object to enable acquisition of the interference images; and a projection generator produces projections of the sample object from the interference images at the sequence of angles. Further, a tomographic device constructs the profile of the optical device from the projections of the interference images. The profile is capable of characterizing small index variations of less than 1×10?4. Other systems and methods are also included.

Abstract: Systems and methods, including azimuthally asymmetric fiber gratings are disclosed.

Abstract: High-dielectric-constant (k) materials and electrical devices implementing the high-k materials are provided herein. According to some embodiments, an electrical device includes a substrate and a crystalline-oxide-containing composition. The crystalline-oxide-containing composition can be disposed on a surface of the substrate. Within the crystalline-oxide-containing composition, oxide anions can form at least one of a substantially linear orientation or a substantially planar orientation. A plurality of these substantially linear orientations of oxide anions or substantially planar orientations of oxide anions can be oriented substantially perpendicular or substantially normal to the surface of the substrate such that the oxide-containing composition has a dielectric constant greater than about 3.9 in a direction substantially normal to the surface of the substrate. Other embodiments are also claimed and described.

Abstract: Systems and methods of measuring birefringence or retardation are provided. For some embodiments, a system is provided, which comprises a polarizer, an analyzer, a first waveplate, and a second waveplate. The system is configured to obtain light intensity measurements by recursively rotating the second waveplate. The obtained light intensity measurements are retrieved, and a light transmission intensity curve is determined from the light intensity measurements.

Abstract: Some embodiments include a system having a polarizer and an analyzer to define a light transmission axis. Both the polarizer and the analyzer have a polarization transmission direction, which is substantially perpendicular to the light transmission axis. A first waveplate and a second waveplate are is interposed between the polarizer and the analyzer, such that both waveplates are located along the light transmission axis. Both waveplates have a slow axis, which is substantially perpendicular to the light transmission axis. The first waveplate is rotated about the light transmission axis, such that the slow axis of the first waveplate is at an angle with a polarization transmission direction of the polarizer. The analyzer is rotated about the light transmission axis until the light transmitted through the system is minimized. The first waveplate and the analyzer are recursively rotated until an extinction angle is determined.

Abstract: The present invention relates to a type of optical fiber grating having an azimuthal refractive-index perturbation. The optical fiber includes a fiber grating that has a plurality of grating elements formed therein. At least one of the grating elements has a spatially varying index of refraction that varies azimuthally about the centerline of the optical fiber. The fiber grating acts as a band-stop optical spectral filter. In addition, since fiber-cladding modes are weakly-guided modes, their power can be easily dissipated by scattering, bending, stretching, and/or rotating the optical fiber. Multiple configurations of these gratings within an optical fiber are given. Methodologies are given for the fabrication of these gratings. Devices are presented which can dynamically attenuate, tune, switch, or modulate the wavelength spectral characteristics of an optical signal.

Abstract: Some embodiments include a system having a polarizer and an analyzer.

Abstract: Systems and methods for back-of-die, through-wafer guided-wave optical clock distribution systems (networks) are disclosed. A representative back-of-die, through-wafer guided-wave optical clock distribution system includes an integrated circuit device with a first cladding layer disposed on the back-side of the integrated circuit device, and an core layer disposed on the first cladding layer. The core layer, the first cladding layer, or the second cladding layer can include, but is not limited to, vertical-to-horizontal input diffraction gratings, a horizontal-to-horizontal diffraction gratings, and horizontal-to-vertical output diffraction gratings.