Abstract: A method for testing an electrical device installed in an energy system includes: receiving an identifier and a test identification (testID) associated with the electrical device; validating the identifier and the testID; in response to determining that the electrical device is registered and communicating: setting and storing a polling rate and a posting rate of the electrical device, setting a first plurality of pre-conditions associated with a first test, and in response to determining that the first plurality of pre-conditions is met, performing the first test by: executing a first set of test commands associated with the first test, receiving responses to the first set of test commands of the electrical device, determining first test results based on the responses to the first set of test commands, storing the first test results, and determining whether the electrical device has passed the first test.

Abstract: A method and system for testing an electrical device in an energy system are provided. The method includes: selecting a test suite to run against the electrical device based on a type of the electrical device; in response to determining that an output power of the electrical device is greater than a preselected minimum threshold: determining that the electrical device is energized, and running the test suite; in response to determining that the electrical device has passed the test suite: attaching the electrical device to a designated service point in a topology structure, marking a state of the electrical device to active, and activating the electrical device in the energy system; and in response to determining that the electrical device has not passed the test suite: attaching the electrical device to a limited node in the topology structure, and limiting the electrical device to function within a default control limit.

Abstract: A method includes receiving data packets from a stream partition of a plurality of stream partitions, processing the data packets with a plurality of stream processors to generate multiple table entries, transmitting the multiple table entries in batches to a plurality of staging tables, the plurality of staging tables being provided for a respective one of the plurality of stream partitions, and receiving the batches at a target table communicatively coupled to the plurality of staging tables, the batches being transmitted from the plurality of staging tables. The plurality of staging tables are updated in first batches at a first frequency and the target table is updated in second batches at a second frequency, the second frequency being different than the first frequency.

Abstract: A method includes receiving data packets from a stream partition of a plurality of stream partitions, processing the data packets with a plurality of stream processors to generate multiple table entries, transmitting the multiple table entries in batches to a plurality of staging tables, the plurality of staging tables being provided for a respective one of the plurality of stream partitions, and receiving the batches at a target table communicatively coupled to the plurality of staging tables, the batches being transmitted from the plurality of staging tables. The plurality of staging tables are updated in first batches at a first frequency and the target table is updated in second batches at a second frequency, the second frequency being different than the first frequency.

Abstract: A system includes a stream partition manager configured to receive data packets input from a plurality of actors, the actors including virtual representations of physical devices, and partition the data packets into a number of stream partitions based at least in part on one or more criteria. The system further includes a plurality of stream processors communicatively coupled to the stream partition manager. Individual stream processors of the plurality of stream processors being configured to receive data packets from a stream partition of the number of stream partitions, process the data packets to generate multiple table entries, and transmit the multiple table entries in batches. The system further includes a target table communicatively coupled to the plurality of stream processors. The target table is configured to receive and store the batches received from the individual stream processors.

Abstract: A system includes a stream partition manager configured to receive data packets input from a plurality of actors, the actors including virtual representations of physical devices, and partition the data packets into a number of stream partitions based at least in part on one or more criteria. The system further includes a plurality of stream processors communicatively coupled to the stream partition manager. Individual stream processors of the plurality of stream processors being configured to receive data packets from a stream partition of the number of stream partitions, process the data packets to generate multiple table entries, and transmit the multiple table entries in batches. The system further includes a target table communicatively coupled to the plurality of stream processors. The target table is configured to receive and store the batches received from the individual stream processors.

Abstract: The present invention is directed to an upper chamber design of a plasma CVD chamber which provides more uniform conditions for forming thin CVD films on a substrate. Embodiments of the invention improve temperature control of the upper chamber and improve particle performance by reducing or minimizing the temperature fluctuations on the dome between the deposition and non-deposition cycles. In accordance with an aspect of the present invention, an apparatus for processing semiconductor substrates comprises a chamber defining a plasma processing region therein. The chamber includes a bottom, a side wall, and a dome disposed on top of the side wall. The dome has a substantially flat dome top. A top RF coil is disposed above the dome top, and has an outer loop which is larger in size than the substrates to be processed in the chamber. A cold plate is disposed above the top RF coil, and is larger in size than the substrates to be processed in the chamber.

Abstract: The present invention is directed to an upper chamber design of a plasma CVD chamber which provides more uniform conditions for forming thin CVD films on a substrate. Embodiments of the invention improve temperature control of the upper chamber and improve particle performance by reducing or minimizing the temperature fluctuations on the dome between the deposition and non-deposition cycles. In accordance with an aspect of the present invention, an apparatus for processing semiconductor substrates comprises a chamber defining a plasma processing region therein. The chamber includes a bottom, a side wall, and a dome disposed on top of the side wall. The dome has a substantially flat dome top. A top RF coil is disposed above the dome top, and has an outer loop which is larger in size than the substrates to be processed in the chamber. A cold plate is disposed above the top RF coil, and is larger in size than the substrates to be processed in the chamber.

Abstract: The present invention provides exemplary antenna coil assemblies and substrate processing chambers using such assemblies. In one embodiment, an antenna coil assembly (100) for a substrate processing chamber includes an antenna coil (102) disposed in a frame (104). The frame includes a plurality of spaced apart tabs (120) around a periphery of the frame, with the coil coupled to the frame at the tabbed locations. At least one notch (122) is provided between each pair of adjacent tabs. The notches are adapted to facilitate thermal expansion and contraction of the frame at the notched locations to reduce stresses on the frame and coil connections.