Patents by Inventor Thomas L. Strahl

Thomas L. Strahl has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Thin film deposition apparatus and method
    Patent number: 4818561
    Abstract: Apparatus and method for the deposition of a thin metal film on a surface of a workpiece as the workpiece is positioned adjacent to a deposition source and as the workpiece and deposition source rotate relative to each other about a first axis. The workpiece can also be moved relative to the deposition source about a second axis as the workpiece and the deposition source rotate relative to each other about the first axis. The distance between the workpiece and the deposition source can be adjusted.
    Type: Grant
    Filed: May 6, 1987
    Date of Patent: April 4, 1989
    Assignee: Machine Technology, Inc.
    Inventor: Thomas L. Strahl
  • System and method for processing workpieces
    Patent number: 4717461
    Abstract: A method of processing a plurality of semiconductor wafers from a wafer cassette including a wafer transfer housing and one or more processing chambers. A wafer is removed from its cassette and transported through the transfer housing into one or more processing chambers for etching, deposition or other such operations. The processed wafer is replaced into its cassette after being transported back through the wafer transfer housing.
    Type: Grant
    Filed: September 15, 1986
    Date of Patent: January 5, 1988
    Assignee: Machine Technology, Inc.
    Inventors: Thomas L. Strahl, Lawrence T. Lamont, Jr., Carl T. Peterson, Hobart A. Brown, Lonnie W. McCormick, Roderick C. Mosely
  • Thin film deposition apparatus and method
    Patent number: 4664935
    Abstract: Apparatus and method for the deposition of a thin metal film on a surface of a workpiece as the workpiece is positioned adjacent to a deposition source and as the workpiece and deposition source rotate relative to each other about a first axis. The workpiece can also be moved relative to the deposition source about a second axis as the workpiece and the deposition source rotate relative to each other about the first axis. The distance between the workpiece and the deposition source can be adjusted.
    Type: Grant
    Filed: September 24, 1985
    Date of Patent: May 12, 1987
    Assignee: Machine Technology, Inc.
    Inventor: Thomas L. Strahl