Abstract: A plasma etching source installable into at least one of multiple compartments of a sputter deposition tool. The plasma etching source includes a first mounting plate and at least one electrode plate coupled to the first mounting plate. A gas inlet is included in the first mounting plate of the plasma etching source.

Abstract: The embodiments disclose an apparatus including at least two carbon source deposition tools for emitting electrons, at least two reflective polarity rear button permanent magnets integrated into the carbon source deposition tools for reflecting emitted electrons, and at least two paired polarity Helmholtz coils integrated into the carbon source deposition tools for forming uniform parallel magnetic field lines for confining the emitted electrons to uniformly deposit carbon onto the surfaces of a two-sided media disk.

Abstract: Techniques for forking and merging of electronically presented content items, such as MMO and other video games, are described herein. In particular, a first content item session may be forked to generate a second (forked) content item session. The first and forked content item sessions may then continue to execute and evolve in separate directions from one another. In some examples, a user of the forked content item session may serve as an administrator of the forked content item session and may receive compensation in exchange for serving as an administrator. Additionally, one or more forked or other separate content item sessions may be merged together to form a merged content item session. In some examples, conflicts between merged content item sessions may be identified and resolved based, at least in part, on input from administrators.

Abstract: Methods and systems for feed-forward of multi-layer and multi-process information using XPS and XRF technolgies are disclosed. In an example, a method of thin film characterization includes measuring first XPS and XRF intensity signals for a sample having a first layer above a substrate. A thickness of the first layer is determined based on the first XPS and XRF intensity signals. The information for the first layer and for the substrate is combined to estimate an effective substrate. Second XPS and XRF intensity signals are measured for a sample having a second layer above the first layer above the substrate. The method also involves determining a thickness of the second layer based on the second XPS and XRF intensity signals, the thickness accounting for the effective substrate.

Abstract: The present invention encompasses compounds of the formula (I) wherein the groups R1, Cy and Y are defined herein, which are suitable for the treatment of diseases related to BTK, and processes for making these compounds, pharmaceutical preparations containing these compounds, and their methods of use.

Abstract: A chemical vapor deposition source that includes at least one plate to which first and second electrical connection posts are coupled. The chemical vapor deposition source also includes a filament having a first end and a second end. The first end of the filament is electrically connected to the first electrical connection post and the second end of the filament is electrically connected to the second electrical connection post. The chemical vapor deposition source further includes at least one filament holder electrically insulated from the at least one plate. The at least one filament holder holds a portion of the filament between the first end and the second end.

Abstract: The present invention encompasses compounds of the formula (I) wherein the groups R1, Cy and Y are defined herein, which are suitable for the treatment of diseases related to BTK, and processes for making these compounds, pharmaceutical preparations containing these compounds, and their methods of use.

Abstract: The present invention encompasses compounds of the formula (I) wherein the groups R1, Cy and Y are defined herein, which are suitable for the treatment of diseases related to BTK, and processes for making these compounds, pharmaceutical preparations containing these compounds, and their methods of use.

Abstract: Embodiments are directed towards enabling users to customize data collection and analysis. A collection computer may automatically detect and dynamically update each of a plurality of sensors that may be currently providing real-time data regarding at least one characteristic of a machine. At least one sensor may be selected for local storage of its corresponding real-time data at the collection computer. And at least one sensor may be selected for remote storage of its corresponding real-time data by a server computer. A template may be employed to remotely display at least one characteristic of the machine based on current real-time data provided by at least one of the sensors identified by the template. In response to the user selecting at least one sensor for remote display, the template may be modified to include the remote display of the at least one sensor's corresponding current real-time data.

Abstract: A sputtering apparatus includes a sputtering cathode and a target overlying the sputtering cathode. A shield overlies the target and forms an aperture configured to direct sputtering particles onto a substrate. The shield includes a lower shield portion overlying the target, a channel outlet overlying the lower shield portion, and an upper shield portion overlying the channel. In some embodiments the shield includes a first shield and a second shield. The first shield includes a front gas injection outlet. The second shield overlies the first shield and forms the aperture. In various embodiments, the second shield is operable to adjust plasma confinement between the first shield and the second shield.

Abstract: The present invention encompasses compounds of the formula (I) wherein the groups R1, Cy and Y are defined herein, which are suitable for the treatment of diseases related to BTK, and processes for making these compounds, pharmaceutical preparations containing these compounds, and their methods of use.

Abstract: A method includes moving a sensor and an article at a first speed to position the sensor into a reference position relative to an article fixture. The sensor and the article are moved at a second speed as the sensor approaches the reference position. It is determined when the sensor is in the reference position, wherein the sensor is configured to be in the reference position when a contact is established between the sensor and a surface of the article fixture. The article is moved by a predetermined increment relative to the reference position to position the article in a target position in response to determining that the sensor is in the reference position.

Abstract: The present invention encompasses compounds of the formula (I) wherein the groups R1, Cy and Y are defined herein, which are suitable for the treatment of diseases related to BTK, and processes for making these compounds, pharmaceutical preparations containing these compounds, and their methods of use.

Abstract: Methods and systems for feed-forward of multi-layer and multi-process information using XPS and XRF technolgies are disclosed. In an example, a method of thin film characterization includes measuring first XPS and XRF intensity signals for a sample having a first layer above a substrate. A thickness of the first layer is determined based on the first XPS and XRF intensity signals. The information for the first layer and for the substrate is combined to estimate an effective substrate. Second XPS and XRF intensity signals are measured for a sample having a second layer above the first layer above the substrate. The method also involves determining a thickness of the second layer based on the second XPS and XRF intensity signals, the thickness accounting for the effective substrate.

Abstract: Provided herein is an apparatus including a loader configured to position a workpiece in a holding fixture. In some embodiments, the holding fixture includes an opening configured to removably receive the workpiece therein and hold the workpiece in a target position within the opening. The apparatus also includes position detecting means configured to translate a sensor to a predetermined location relative to the holding fixture and further configured to translate the workpiece by a predetermined increment relative to the predetermined location to position the workpiece in the target position.

Abstract: Embodiments are directed towards enabling users to customize data collection and analysis. A collection computer may automatically detect and dynamically update each of a plurality of sensors that may be currently providing real-time data regarding at least one characteristic of a machine. At least one sensor may be selected for local storage of its corresponding real-time data at the collection computer. And at least one sensor may be selected for remote storage of its corresponding real-time data by a server computer. A template may be employed to remotely display at least one characteristic of the machine based on current real-time data provided by at least one of the sensors identified by the template. In response to the user selecting at least one sensor for remote display, the template may be modified to include the remote display of the at least one sensor's corresponding current real-time data.

Abstract: Some electronic devices may not include hardware such as a gyroscope that is capable of providing precise orientation information. In some implementations, accelerometer data may be used to determine a content display adjustment (e.g., an adjustment to a first person perspective view in a game scene) by sampling accelerometer data over multiple time periods. For example, accelerometer data may be used to determine short term and longer term accelerometer sample values. The content display adjustment may be determined based at least in part on the accelerometer sample values and information associated with the content display adjustment may be communicated to a display.

Abstract: A plasma etching source installable into at least one of multiple compartments of a sputter deposition tool. The plasma etching source includes a first mounting plate and at least one electrode plate coupled to the first mounting plate. A gas inlet is included in the first mounting plate of the plasma etching source.

Abstract: Disclosed is a safety device that maintains a weapon inside a holster in a locked state without requiring the gun to be removed from the holster beforehand. In the embodiments, a single safety device can be used on a variety of holsters to lock the gun inside the holster, without requiring removal of the gun from the holster, therefore preventing children or other unauthorized individuals from accessing the gun and the gun's trigger.

Abstract: A chemical vapor deposition source that includes at least one plate to which first and second electrical connection posts are coupled. The chemical vapor deposition source also includes a filament having a first end and a second end. The first end of the filament is electrically connected to the first electrical connection post and the second end of the filament is electrically connected to the second electrical connection post. The chemical vapor deposition source further includes at least one filament holder electrically insulated from the at least one plate. The at least one filament holder holds a portion of the filament between the first end and the second end.