Abstract: A spill containment system for storage tanks, flow devices, and the like, and a containment system for spilled light non-aqueous phase liquid are provided. The spill containment system comprises a liner for receiving and containing liquid that spills, as well as a withdrawal tube that sealingly extends into the liner at a high point thereof. An alternative spill containment system comprises two liner portions, one about a storage tank and another about a flow device leading, for example, to a furnace. A withdrawal tube extends to a low point of the first liner portion. The containment system comprises a trench, filled for example with low capillarity medium, for at least partially surrounding an area where light non-aqueous phase liquid is stored or may migrate to. A liner is disposed over the top of the trench and along at least a portion of one side thereof. At least one withdrawal tube sealingly extends through the liner at a high point thereof and into the trench.

Abstract: A solvent purification system and method of reducing the contamination level thereof are provided. Contaminated solvent is directed under pressure across at least one cross-flow membrane unit, and the waste stream therefrom is conveyed through at least one membrane precipitator unit to precipitate out contaminant, or selectively precipitate out solutes.

Abstract: A spill containment system for storage tanks, flow devices, and the like, and a containment system for spilled light non-aqueous phase liquid are provided. The spill containment system comprises a liner for receiving and containing liquid that spills, as well as a withdrawal tube that sealingly extends into the liner at a high point thereof. The containment system comprises a trench, filled for example with low capillarity medium, for at least partially surrounding an area where light non-aqueous phase liquid is stored or may migrate to. A liner is disposed over the top of the trench and along at least a portion of one side thereof. At least one withdrawal tube sealingly extends through the liner at a high point thereof and into the trench.

Abstract: An information recording medium includes a substrate having first and second sides. A layer of photoresist is deposited on the first side of the substrate. This layer of photoresist has a selected thickness and defines an area of openings therein such that the first side of the substrate is exposed at the openings, the openings being distributed in a pattern indicative of selected stored information. A reflecting layer is deposited on the photoresist layer and on the first side of the substrate at the openings. Both the substrate and the layer of photoresist are adapted to transmit the reading beam such that a portion of the reading beam incident on the second side of the substrate is reflected out of the substrate by the reflecting layer, both in a first region comprising the openings and in a second region between the openings.

Abstract: An information recording medium includes a substrate having first and second sides. A layer of photoresist is deposited on the first side of the substrate. This layer of photoresist has a selected thickness and defines an area of openings therein such that the first side of the substrate is exposed at the openings, the openings being distributed in a pattern indicative of selected stored information. A reflecting layer is deposited on the photoresist layer and on the first side of the substrate at the openings. Both the substrate and the layer of photoresist are adapted to transmit the reading beam such that a portion of the reading beam incident on the second side of the substrate is reflected out of the substrate by the reflecting layer, both in a first region comprising the openings and in a second region between the openings.