Patents by Inventor Thomas Michael Wieder

Thomas Michael Wieder has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Water-rich stripping and cleaning formulation and method for using same
    Patent number: 9201308
    Abstract: The present invention relates to water-rich formulations and the method using same, to remove bulk photoresists, post-etched and post-ashed residues, residues from Al back-end-of-the-line interconnect structures, as well as contaminations. The formulation comprises: hydroxylamine; corrosion inhibitor containing a mixture of alkyl dihydroxybenzene and hydroxyquinoline; an alkanolamine, a water-soluble solvent or the combination of the two; and at least 50% by weight of water.
    Type: Grant
    Filed: July 8, 2013
    Date of Patent: December 1, 2015
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Madhukar Bhaskara Rao, Gautam Banerjee, Thomas Michael Wieder, Yi-Chia Lee, Wen Dar Liu, Aiping Wu
  • WATER-RICH STRIPPING AND CLEANING FORMULATION AND METHOD FOR USING SAME
    Publication number: 20130296215
    Abstract: The present invention relates to water-rich formulations and the method using same, to remove bulk photoresists, post-etched and post-ashed residues, residues from Al back-end-of-the-line interconnect structures, as well as contaminations. The formulation comprises: hydroxylamine; corrosion inhibitor containing a mixture of alkyl dihydroxybenzene and hydroxyquinoline; an alkanolamine, a water-soluble solvent or the combination of the two; and at least 50% by weight of water.
    Type: Application
    Filed: July 8, 2013
    Publication date: November 7, 2013
    Inventors: Madhukar Bhaskara RAO, Gautam BANERJEE, Thomas Michael Wieder, Yi-Chia LEE, Wen Dar LIU, Aiping WU
  • Water-rich stripping and cleaning formulation and method for using same
    Patent number: 8518865
    Abstract: The present invention relates to water-rich formulations and the method using same, to remove bulk photoresists, post-etched and post-ashed residues, residues from Al back-end-of-the-line interconnect structures, as well as contaminations. The formulation comprises: hydroxylamine; corrosion inhibitor containing a mixture of alkyl dihydroxybenzene and hydroxyquinoline; an alkanolamine, a water-soluble solvent or the combination of the two; and at least 50% by weight of water.
    Type: Grant
    Filed: August 19, 2010
    Date of Patent: August 27, 2013
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Madhukar Bhaskara Rao, Gautam Banerjee, Thomas Michael Wieder, Yi-Chia Lee, Wen Dar Liu, Aiping Wu
  • Composition For Stripping And Cleaning And Use Thereof
    Publication number: 20110311921
    Abstract: A composition comprising one or more water soluble organic solvents comprising a glycol ether; water; a fluoride containing compound provided that if the fluoride containing compound is ammonium fluoride than no additional fluoride containing compound is added to the composition; optionally a quaternary ammonium compound; and optionally a corrosion inhibitor is disclosed herein that is capable of removing residues from an article such as photoresist and/or etching residue. Also disclosed herein is a method for removing residues from an article using the composition disclosed herein.
    Type: Application
    Filed: August 25, 2011
    Publication date: December 22, 2011
    Applicant: Air Products and Chemicals, Inc.
    Inventors: Matthew I. Egbe, Michael Walter Legenza, Thomas Michael Wieder, Jennifer May Rieker
  • Composition for stripping and cleaning and use thereof
    Patent number: 8030263
    Abstract: A composition comprising one or more water soluble organic solvents comprising a glycol ether; water; a fluoride containing compound provided that if the fluoride containing compound is ammonium fluoride than no additional fluoride containing compound is added to the composition; optionally a quaternary ammonium compound; and optionally a corrosion inhibitor is disclosed herein that is capable of removing residues from an article such as photoresist and/or etching residue. Also disclosed herein is a method for removing residues from an article using the composition disclosed herein.
    Type: Grant
    Filed: June 20, 2005
    Date of Patent: October 4, 2011
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Matthew I. Egbe, Michael Walter Legenza, Thomas Michael Wieder, Jennifer May Rieker
  • WATER-RICH STRIPPING AND CLEANING FORMULATION AND METHOD FOR USING SAME
    Publication number: 20110212866
    Abstract: The present invention relates to water-rich formulations and the method using same, to remove bulk photoresists, post-etched and post-ashed residues, residues from Al back-end-of-the-line interconnect structures, as well as contaminations. The formulation comprises: hydroxylamine; corrosion inhibitor containing a mixture of alkyl dihydroxybenzene and hydroxyquinoline; an alkanolamine, a water-soluble solvent or the combination of the two; and at least 50% by weight of water.
    Type: Application
    Filed: August 19, 2010
    Publication date: September 1, 2011
    Applicant: AIR PRODUCTS AND CHEMICALS, INC.
    Inventors: Madhukar Bhaskara Rao, Gautam Banerjee, Thomas Michael Wieder, Yi-Chia Lee, Wen Dar Liu, Aiping Wu