Abstract: A microscope system for flexibly, efficiently and quickly inspecting patterns and defects on extreme ultraviolet (EUV) lithography photomasks. The system includes a stand-alone plasma-based EUV radiation source with an emission spectrum with a freestanding line emission in the spectral range from 12.5 nm to 14.5 nm has a relative bandwidth of ?/??>1000, means for the broadband spectral filtering ?/??<50 for selecting the dominant freestanding emission line, means for suppressing radiation with wavelengths outside of the EUV spectral region, zone plate optics for magnified imaging of the object with a resolution which corresponds to the width of an outermost zone of the zone plate, a numerical aperture corresponding to more than 1000 zones, and a EUV detector array for capturing the patterned object.

Abstract: A microscope system for flexibly, efficiently and quickly inspecting patterns and defects on extreme ultraviolet (EUV) lithography photomasks. The system includes a stand-alone plasma-based EUV radiation source with an emission spectrum with a freestanding line emission in the spectral range from 12.5 nm to 14.5 nm has a relative bandwidth of ?/??>1000, means for the broadband spectral filtering ?/??<50 for selecting the dominant freestanding emission line, means for suppressing radiation with wavelengths outside of the EUV spectral region, zone plate optics for magnified imaging of the object with a resolution which corresponds to the width of an outermost zone of the zone plate, a numerical aperture corresponding to more than 1000 zones, and a EUV detector array for capturing the patterned object.

Abstract: Spatial acquisition of measurement data over a cross section of a high-energy, high-intensity radiation beam bundle without impairment of measuring accuracy due to saturation or degradation of detectors occurs by imaging an entire cross section of the beam bundle on a shading element, the cross section being separated successively into partial beam bundles having reduced cross sections and reduced intensity through movement of at least one opening, whereby measurement values of the partial beam bundles passing the opening are associated temporally and spatially with positions of the opening.

Abstract: The invention is directed to methods and arrangements for spatial acquisition of measurement data over the cross section of a bundle of high-energy, high-intensity radiation. The object of finding a novel possibility for radiation measurement within the cross section of a beam bundle of high intensity which acquires highly spatially resolved measurement data without impairment of the measuring accuracy through saturation or degradation of the detectors is met according to the invention in that the entire cross section of the beam bundle is imaged on a shading element, the cross section is separated successively into partial beam bundles having reduced cross section and reduced intensity through movement of at least one opening, and measurement values of the partial beam bundles passing the opening are acquired so as to be associated temporally and spatially with the positions of the opening and are stored.

Abstract: A plasma radiation source is improved in such a way that the lifetime of the optics which is limited by the influence of debris is appreciably increased. A gas curtain through which the radiation proceeding from a source region in a vacuum chamber is emitted at a defined solid angle for debris suppression along an axis of the mean propagation direction of the radiation exits as a radially directed supersonic gas jet from a propulsion nozzle of a gas jet vacuum pump, which propulsion nozzle is arranged on the axis. The gas curtain is directed to an annular mixing nozzle that is arranged coaxial to the axis and is guided out of the vacuum chamber by a diffuser. This makes it possible to use source arrangements having an optimal conversion efficiency but extensive debris.

Abstract: The object of the invention is to provide a transmission filter for EUV radiation which has a sufficiently narrow transmission window to characterize EUV radiation in a narrowly defined spectral region. This object is met by providing a transmission layer system having at least one uranium-containing layer.

Abstract: The object of the invention is to provide a transmission filter for EUV radiation which has a sufficiently narrow transmission window to characterize EUV radiation in a narrowly defined spectral region. This object is met by providing a transmission layer system having at least one uranium-containing layer.

Abstract: A plasma radiation source is improved in such a way that the lifetime of the optics which is limited by the influence of debris is appreciably increased. A gas curtain through which the radiation proceeding from a source region in a vacuum chamber is emitted at a defined solid angle for debris suppression along an axis of the mean propagation direction of the radiation exits as a radially directed supersonic gas jet from a propulsion nozzle of a gas jet vacuum pump, which propulsion nozzle is arranged on the axis. The gas curtain is directed to an annular mixing nozzle that is arranged coaxial to the axis and is guided out of the vacuum chamber by a diffuser. This makes it possible to use source arrangements having an optimal conversion efficiency but extensive debris.

Abstract: In an arrangement for determining the spectral reflectivity of a measurement object, the object of the invention is to provide a simpler and more compact measuring arrangement, to eliminate the removal of elements from the beam path for detecting the reference beam, which was formally necessary, and to avoid complex translational and rotational movements. Different beam areas proceeding from the radiation source serve as measurement beam and reference beam which are directed simultaneously to different spectrally dispersing areas of at least one dispersive element and to different receiver areas of at least one receiver in a spectrograph. Preferred measurement objects are surfaces which reflect in a spectrally-dependent manner for radiation in the extreme ultraviolet range (EUV), but application of the arrangement is not limited to this spectral region.