Abstract: A micro-fabricated device for controlling trapped ions includes a first substrate having a main surface. A structured first metal layer is disposed over the main surface of the first substrate. The structured first metal layer includes electrodes of at least one ion trapping zone configured to trap an ion in a space above the structured first metal layer. A dielectric element is fixedly attached to the first substrate. The dielectric element includes at least one short-pulse-laser direct written (SPLDW) waveguide configured to direct laser light towards an ion trapped in the at least one ion trapping zone.

Abstract: An optical system, for example in a microlithographic projection exposure apparatus, comprises a mirror and a temperature-regulating device. The mirror has an optical effective surface and a mirror substrate. A plurality of temperature-regulating zones are arranged in the mirror substrate. The temperature-regulating device is used to adjust the temperatures present in each of the temperature-regulating zones independently of one another. The temperature-regulating zones are arranged in at least two planes at different distances from the optical effective surface. The temperature-regulating zones in the at least two planes are configured as cooling channels through which, independently of one another, a cooling fluid at a variably adjustable cooling fluid temperature is able to flow. A method for operating such an optical system is provided.

Abstract: A method for measuring a surface shape of an optical element, wherein the optical element has a main body with a substrate and a reflective surface, and wherein at least one cooling channel for receiving a coolant is formed in the substrate, comprising: a) recording a cooling channel pressure, b) recording a measurement environment pressure, c) determining a pressure difference based on the cooling channel pressure and the measurement environment pressure, d) comparing the pressure difference with a predetermined target pressure difference, e) monitoring for a deviation between the pressure difference and the target pressure difference, wherein, if a deviation greater than a predetermined limit value is detected, the cooling channel pressure is adapted in such a way that the deviation becomes less than or equal to the predetermined limit value, and f) measuring the surface shape if the deviation is less than or equal to the predetermined limit value.

Abstract: Disclosed are an optical system, in particular for microlithography, and a method for operating an optical system. According to one disclosed aspect, the optical system includes at least one mirror (100, 500, 600) having an optical effective surface (101, 501, 601) and a mirror substrate (110, 510, 610), wherein at least one cooling channel (115, 515, 615) in which a cooling fluid is configured to flow is arranged in the mirror substrate, for dissipating heat that is generated in the mirror substrate due to absorption of electromagnetic radiation incident from a light source on the optical effective surface, and a unit (135, 535, 635) to adjust the temperature and/or the flow rate of the cooling fluid either dependent on a measured quantity that characterizes the thermal load in the mirror substrate or dependent on an estimated/expected thermal load in the mirror substrate for a given power of the light source.

Abstract: A micro-lithographic projection exposure system comprises an illumination unit and a projection lens with at least one element which is penetrated at least in regions by a temperature-control fluid line provided for conducting a temperature-control fluid for controlling the temperature of the element. The temperature-control fluid line is connected to a temperature-control fluid storage container. A temperature-control element for controlling the temperature of the temperature-control fluid is provided on or in the temperature-control fluid line. At least two of the elements are independently penetrated by a respective separate at least one of temperature-control fluid lines, or at least two different regions of the at least one element are penetrated independently by a respective separate at least one of the temperature-control fluid lines, or at least two of the elements are penetrated by the temperature-control fluid line. A corresponding method is provided.

Abstract: Burners having a fuel plenum in a base are disclosed. One disclosed example apparatus includes a base of a burner, the base comprising a fuel plenum and coupled to fuel nozzles, where at least one of the fuel nozzles is in fluid communication with the fuel plenum. The disclosed example apparatus also includes a burner head of the burner comprising nozzle passages in fluid communication with an airflow path, where the burner head defines a pilot combustion space that opens towards a flame tube of the burner, and is in fluid communication with the airflow path, and where each nozzle passage is to receive a fuel nozzle to provide fuel to entrain with air from the airflow path.

Abstract: Burners having a fuel plenum in a base are disclosed. One disclosed example apparatus includes a base of a burner, the base comprising a fuel plenum and coupled to fuel nozzles, where at least one of the fuel nozzles is in fluid communication with the fuel plenum. The disclosed example apparatus also includes a burner head of the burner comprising nozzle passages in fluid communication with an airflow path, where the burner head defines a pilot combustion space that opens towards a flame tube of the burner, and is in fluid communication with the airflow path, and where each nozzle passage is to receive a fuel nozzle to provide fuel to entrain with air from the airflow path.