Patents by Inventor Thomas N. Kennedy

Thomas N. Kennedy has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4272355
    Abstract: In the process of sputter deposition of targets on target electrodes, a gallium-indium eutectic alloy is employed to form a floating bond between the target material and the target electrode. Relatively high radio frequency (r.f.) power density is used to increase the deposition rate without cracking the target.
    Type: Grant
    Filed: February 26, 1980
    Date of Patent: June 9, 1981
    Assignee: International Business Machines Corporation
    Inventor: Thomas N. Kennedy
  • Patent number: 4219853
    Abstract: A method of making a thin film inductive head assembly, which has separate read and write transducers, comprises the steps of depositing the elemental layers of one thin film transducer on a substrate; sputter depositing on the transducer a thick transparent insulating layer; flat lapping the thick insulating layer; depositing the elemental layers of a second thin film transducer on the flat lapped insulating layer; and depositing a thick insulating overcoat on the second thin film transducer. The substrate is then configured as a slider element for flying in transducing relation over a record medium, such as a rotary magnetic disk. The resultant structure includes thin film read and write transducers with a thick transparent insulating layer therebetween, all deposited successively in layers on one surface of the substrate, and having a protective insulating overcoat.
    Type: Grant
    Filed: December 21, 1978
    Date of Patent: August 26, 1980
    Assignee: International Business Machines Corporation
    Inventors: Paul A. Albert, Thomas N. Kennedy
  • Patent number: 4183797
    Abstract: Method and apparatus for coating a thin film upon a substrate in a vacuum chamber using the sputter deposition technique on both sides of the substrate without rotation of the substrate. The substrate is held between two movable rams and is located between two targets equal to or larger in size than the substrate. The rams supply power and cooling to the substrate. A glow suppression ring circumscribes the periphery of the substrate. The cathodes of the sputtering system can be magnetically enhanced for concentration of the sputtering plasma.
    Type: Grant
    Filed: December 22, 1978
    Date of Patent: January 15, 1980
    Assignee: International Business Machines Corporation
    Inventors: Thomas N. Kennedy, William C. Lester, George W. McDonough, John D. Michaelsen
  • Patent number: 4130847
    Abstract: A slider element includes a thin film transducer deposited onto a slider along at least one of the rails forming the flying air bearing surface with a magnetic media. A portion of the end tips of the pole pieces and gap of the thin film inductive transducer and a portion of the slider rail adjacent to the transducer is etched by a sputter etching process. A layer of a passivation material such as chromium is sputter deposited into the etched portion such that the leading portion of the rail protects the passivation material from wear. The passivation material over the pole tips of the transducer prevents the corrosion of the iron-nickel alloy comprising the pole tips.
    Type: Grant
    Filed: March 31, 1977
    Date of Patent: December 19, 1978
    Assignee: International Business Machines Corporation
    Inventors: Nephi L. Head, Robert D. Hempstead, Thomas N. Kennedy, Fred Y. Lieu