Abstract: A method and apparatus for coating substrates by means of plasma enhanced vapor deposition are provided, in which at least part of the surroundings of the substrate surface of a substrate to be coated is evacuated and a process gas with a starting substance for the coating is admitted, wherein the coating is deposited by a plasma being ignited by radiating in electromagnetic energy in the surroundings of the substrate surface filled with the process gas. The electromagnetic energy is radiated in by a multiplicity of pulse sequences, preferably microwave or radiofrequency pulses, with a multiplicity of pulses spaced apart temporally by first intermissions, wherein the electromagnetic energy radiated in is turned off in the intermissions, and wherein the intermissions between the pulse sequences are at least a factor of 3, preferably at least a factor of 5, longer than the first intermissions between the pulses within a pulse sequence.

Abstract: The invention provides a method of producing reflectors from glass or glass ceramics comprising the steps of: molding a reflector being open to the outside and having a closed bottom in a mold at a temperature above the transformation temperature; placing the reflector in a recess of a holder; heating up the reflector in the area of its bottom; lifting the bottom of the reflector from below using a die; punching out at least one opening from the bottom by moving at least one plunger into at least one matching opening in the die.

Abstract: The invention provides a method of producing reflectors from glass or glass ceramics comprising the steps of: molding a reflector being open to the outside and having a closed bottom in a mold at a temperature above the transformation temperature; placing the reflector in a recess of a holder; heating up the reflector in the area of its bottom; lifting the bottom of the reflector from below using a die; punching out at least one opening from the bottom by moving at least one plunger into at least one matching opening in the die.

Abstract: The invention is based on the object of reducing the heating of substrates during plasma enhanced chemical vapor deposition. For this purpose, a method and an apparatus for coating substrates by means of plasma enhanced vapor deposition are provided, in which at least part of the surroundings of the substrate surface of a substrate to be coated is evacuated and a process gas with a starting substance for the coating is admitted, wherein the coating is deposited by a plasma being ignited by radiating in electromagnetic energy in the surroundings of the substrate surface filled with the process gas.