Abstract: A hole cutter has a substantially cylindrical blade body defining a blade body circumference, a cutting edge formed on one end of the blade body, and an axially-elongated slot formed through the substantially cylindrical blade body. The axially-elongated slot is configured to receive chips flowing from the cutting edge within the interior of the blade body and (i) into the slot, and/or (ii) through the slot, to prevent the collection of such chips within the interior of the blade body and/or at an interface between the blade body and work piece. The axially-elongated slot defines a first end adjacent to the cutting edge, a second end axially spaced further from the cutting edge, and a slot area. The hole cutter further defines a total slot area to blade body circumference ratio within the range of about 0.1 to about 0.3 depending on the size of the hole cutter.

Abstract: A liquid immersion lithography apparatus includes a projection system, an opening from which liquid is supplied to a space under the projection system, the opening being connectable to a liquid source via a flow passage to supply the liquid to the space and the opening being connectable to a vacuum source via the flow passage, and a holding member by which a substrate is held, the holding member being movable below the projection system and the opening. The substrate held by the holding member is exposed through the liquid that is supplied from the opening and that covers only a portion of an upper surface of the substrate.

Abstract: An immersion lithography apparatus includes an optical assembly that projects a beam onto a substrate through an immersion liquid, a containment member surrounding a path of the beam, a stage holding the substrate, an isolator having a first actuator which limits vibrations of the optical assembly, and a support system having a second actuator to support the containment member and move it by the second actuator. The containment member includes a first supply opening via which water as the immersion liquid is released, a recovery opening via which the immersion liquid is recovered from a gap between the containment member and the substrate and/or the stage, and a second supply opening via which the water is released to the gap between the containment member and the substrate and/or the stage, the second supply opening being provided radially inward of the recovery opening.

Abstract: An immersion lithography apparatus includes (i) an optical assembly including an optical element, and configured to project a beam onto a substrate through an immersion liquid; (ii) a containment member that surrounds a path of the beam; and (iii) a stage on which the substrate is held, the substrate on the stage being moved below and spaced from a bottom surface of the containment member. The containment member includes: (1) a nozzle outlet via which water as the immersion liquid is released, (2) a recovery channel via which the immersion liquid is recovered from a gap between the containment member and the substrate and/or the stage, and (3) a fluid channel via which water is released to the gap between the containment member and the substrate and/or the stage, the fluid channel being provided radially inward of the recovery channel.

Abstract: A hole cutter has a cylindrical blade body including a cutting edge and one or more axially-elongated apertures formed within a side wall of the blade body. The axially-elongated aperture is configured to receive a lever, such as a screwdriver, therethrough. Each axially-elongated aperture includes a first fulcrum axially spaced adjacent to the cutting edge, a second fulcrum axially spaced further away from the cutting edge than the first fulcrum, and optionally a third fulcrum axially spaced between the first and second fulcrums. A lever, such as a screwdriver, can be inserted into the aperture and placed against each of the fulcrums to lever slugs out of the interior of the blade body.

Abstract: A lithographic projection apparatus includes a projection optics having a last element, by which an exposure light is projected onto an upper surface of a wafer through liquid covering a portion of the upper surface. The last element has a convex-shape incident surface, an exit surface from which the exposure light is emitted, and an outer surface arranged above the exit surface. The outer surface of the last element has a lower portion, and extends radially-outwardly and upwardly from the lower portion. The apparatus also includes a gap along the outer surface of the last element, the gap being defined between the outer surface of the last element and an opposing surface.

Abstract: An exposure apparatus exposes a substrate with light from an object through an optical assembly and liquid. The exposure apparatus includes a stage and a liquid supply system. The stage is movable relative to the optical assembly and holds the substrate so that the substrate faces the optical assembly across the liquid. The liquid supply system includes an outlet arranged so as to face a top surface of the substrate held by the stage and supplies the liquid from the outlet onto the top surface. The stage includes a support which supports an undersurface of the substrate, and a channel having a port. The port is arranged outside the support so as to recover the liquid supplied from the outlet and flowing outwardly from the top surface of the substrate supported by the support.

Abstract: A system for providing an adjusted image of a scene includes an optical assembly, a capturing system coupled to the optical assembly, and a control system. The optical assembly is adjustable to alternatively be focused on a first focal area and a second focal area that is different than the first focal area. The capturing system captures a first frame of the scene when the optical assembly is focused at the first focal area, and a second frame of the scene when the optical assembly is focused at the second focal area. The first frame includes a plurality of first pixels and the second frame includes a plurality of second pixels. The control system analyzes the first frame and the second frame and utilizes graph cuts techniques to assign a depth label to at least a portion of the first frame.

Abstract: A lithographic projection apparatus includes a projection optics having a last element, by which an exposure light is projected onto an upper surface of a wafer through liquid covering a portion of the upper surface. The last element has a convex-shape incident surface, an exit surface from which the exposure light is emitted, and an outer surface arranged above the exit surface. The outer surface of the last element has a lower portion, and extends radially-outwardly and upwardly from the lower portion. The apparatus also includes a gap along the outer surface of the last element, the gap being defined between the outer surface of the last element and an opposing surface.

Abstract: An exposure apparatus exposes a substrate by radiating a light onto the substrate through an optical assembly and a liquid provided on the substrate. The exposure apparatus includes a stage assembly which is movable relative to the optical assembly, the stage assembly including a support which supports the substrate, a first subregion which substantially encircles the support, and a second subregion which substantially encircles the first subregion. The first subregion includes a first surface having a first characteristic and the second subregion includes a second surface having a second characteristic which is different from the first characteristic.

Abstract: A stage assembly that moves a device includes a stage that retains the device, a stage mover that moves the stage, a measurement system that provides a measurement signal that relates to the position or movement of the stage, and a control system that control the stage mover. The control system can use an estimator to estimate the position of the stage in the event the measurement signal is lost. Alternatively, the control system can be used to urge the stage against a base assembly when the measurement signal is lost to inhibit the movement of the stage.

Abstract: A lithographic projection apparatus includes a projection system having a last element, by which an exposure light is projected onto an upper surface of a wafer through liquid locally covering a portion of the upper surface of the wafer. The last element has a lower surface from which the exposure light is emitted. The last element also has an outer surface which extends upwardly from an edge portion of the lower surface. The apparatus also includes a space along the outer surface of the last element, to which the liquid is supplied from above the lower surface of the last element. The space is defined by the outer surface of the last element and a surface opposing the outer surface of the last element.

Abstract: A measurement assembly (12) for measuring a feature (14A) on a surface (16) includes a metrology system (18), a mover assembly (19), a pointer (22), and a control system (24). The metrology system (18) generates a measurement beam (26), and the mover assembly (19) selectively adjusts the direction of the measurement beam (26). The pointer (22) is handheld and generates a pointer beam (34) that can be selectively directed at the surface (16) to form a pointer spot (36) on the surface (16). Further, the control system (24) controls the mover assembly (19) to move the direction of the measurement beam (26) until the measurement beam (26) is approximately directed at the pointer spot (36).

Abstract: An immersion lithography apparatus includes (i) an optical assembly including an optical element, and configured to project a beam onto a substrate through an immersion liquid; (ii) a containment member that surrounds a path of the beam; and (iii) a stage on which the substrate is held, the substrate on the stage being moved below and spaced from a bottom surface of the containment member. The containment member includes: (1) a nozzle outlet via which water as the immersion liquid is released, (2) a recovery channel via which the immersion liquid is recovered from a gap between the containment member and the substrate and/or the stage, and (3) a fluid channel via which water is released to the gap between the containment member and the substrate and/or the stage, the fluid channel being provided radially inward of the recovery channel.

Abstract: A lithographic projection apparatus includes a projection system having a last element, by which an exposure light is projected onto an upper surface of a wafer through liquid locally covering a portion of the upper surface of the wafer. The last element has a lower surface from which the exposure light is emitted. The last element also has an outer surface which extends upwardly from an edge portion of the lower surface. The apparatus also includes a space along the outer surface of the last element, to which the liquid is supplied from above the lower surface of the last element. The space is defined by the outer surface of the last element and a surface opposing the outer surface of the last element.

Abstract: A liquid immersion lithography apparatus includes a projection system, an opening from which liquid is supplied to a space under the projection system, the opening being connectable to a liquid source via a flow passage to supply the liquid to the space and the opening being connectable to a vacuum source via the flow passage, and a holding member by which a substrate is held, the holding member being movable below the projection system and the opening. The substrate held by the holding member is exposed through the liquid that is supplied from the opening and that covers only a portion of an upper surface of the substrate.

Abstract: A lithographic projection apparatus that is arranged to project a pattern from a patterning device onto a substrate using a projection system has a liquid supply system arranged to supply a liquid to a space between the projection system and the substrate. The apparatus also includes a liquid collecting system that includes a liquid collection member having a permeable member through which a liquid is collected from a surface of an object opposite to the liquid collection member, wherein the permeable member has a plurality of passages that generate a capillary force.

Abstract: A lithographic projection apparatus includes a projection system having a last element from which an exposure light is projected onto a wafer through liquid in a space under the last element. A light incident surface of the last element has a convex shape. A liquid retaining member is disposed adjacent to a surface of the last element through which the exposure light does not pass. The liquid retaining member has an undersurface under which liquid is retained. A gap is formed between the liquid retaining member and the surface of the last element, the gap being in fluidic communication with the space. The liquid is retained between the last element and the undersurface of the liquid retaining member on one side and an upper surface of the wafer on the other side. The liquid locally covers a portion of the upper surface of the wafer.