Patents by Inventor Thomas Ochs
Thomas Ochs has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230083793Abstract: The invention relates to an arrangement (I) of a palm rest (IO) and a manually actuatable operating element (20) for a vehicle. The palm rest (IO) is designed to adopt a first and a second position relative to the operating element (20), the palm rest (IO) being positioned, in the first position, such that it enables a hand (2) to be supported while the operating element (20) is being operated. To protect against damage and to enable the vehicle interior to be better used, the palm rest (IO) is positioned, in the second position, such that the palm rest (IO) at least partially projects over and/or covers the operating element (20).Type: ApplicationFiled: January 20, 2021Publication date: March 16, 2023Applicant: MAN Truck & Bus SEInventor: Thomas OCHS
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Patent number: 11519511Abstract: A fluidic device comprises a channel, a gate, and one or more additional elements. The channel is configured to transport a fluid from a source to a drain. The gate includes a chamber with an adjustable volume that affects fluid flow within the channel by displacing a wall of the channel toward an opposite wall of the channel based in part on fluid pressure within the chamber exceeding a threshold pressure. A high pressure state of the gate corresponds to a first chamber size and a first flow rate of the fluid. A low pressure state of the gate corresponds to a second chamber size that is smaller than the first chamber size and a second flow rate that is greater than the first flow rate. The additional elements are configured to reduce the threshold pressure past which the chamber decreases the cross-sectional area of the channel.Type: GrantFiled: November 19, 2021Date of Patent: December 6, 2022Assignee: Meta Platforms Technologies, LLCInventors: Sean Jason Keller, David R. Perek, Tristan Thomas Trutna, Garett Andrew Ochs, Nicholas Roy Corson, Raymond King, Jack Lindsay, Riccardo DeSalvo, Joseph Minh Tien, Matthew Robert Schwab
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Publication number: 20220383428Abstract: Systems and methods for use in identifying a set of candidate seeds for a target field based on a prediction model are provided. One example method includes accessing, by a computing device, data from a data server, the data including data representative of seeds harvested from at least one of a research growing space, a development growing space, and a field growing space; generating a yield delta prediction model, based on at least a portion of the accessed data; for each of a plurality of candidate seeds, automatically generating a probability of a yield delta for the candidate seed, relative to a target seed, exceeding a performance threshold, based on the generated model; identifying, by the computing device, a set of the candidate seeds, based on the probability of the respective candidate seed satisfying a defined threshold; and outputting, by the computing device, the identified set of seeds to a user.Type: ApplicationFiled: May 25, 2022Publication date: December 1, 2022Inventors: Jigyasa BHAGAT, James DELANEY, Thomas EICKHOFF, Gardar JOHANNESSON, Brian LUTZ, Nick OCHS, Harish SANGIREDDY, Yiwen XIANG
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Patent number: 11402903Abstract: A virtual reality system enables a user to interact with virtual objects. The system includes a fiducial ring, an imaging device and a console. The fiducial ring includes a ring body that includes a plurality of fiducial markers that each correspond to a different location on the ring body. An imaging device is configured to capture one or more images of the fiducial ring. The console receives the images that include an image of one or more fiducial markers. Based on the received images of the fiducial markers, the console determines a location on the fiducial ring that corresponds to the imaged fiducial marker. The console determines a position of the fiducial ring based on the determined location of the fiducial marker on the fiducial ring. The console provides content to a head mounted display (HMD) based on the determined position of the fiducial ring.Type: GrantFiled: May 25, 2021Date of Patent: August 2, 2022Assignee: Meta Platforms Technologies, LLCInventors: Sean Jason Keller, David R. Perek, Tristan Thomas Trutna, Garett Andrew Ochs, Nicholas Roy Corson, Raymond King
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Patent number: 7754908Abstract: The present invention relates to specific novel tungsten and molybdenum compounds to the use thereof for the deposition of tungsten- or molybdenum-containing layers by means of chemical vapour deposition, and to the tungsten- or molybdenum-containing layers produced by this process.Type: GrantFiled: January 4, 2007Date of Patent: July 13, 2010Assignee: H. C. Starck Clevios GmbHInventors: Knud Reuter, Jörg Sundermeyer, Alexei Merkoulov, Wolfgang Stolz, Kestin Volz, Michael Pokoj, Thomas Ochs
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Patent number: 7442407Abstract: Tantalum and niobium compounds having the general formula (I) and their use for the chemical vapour deposition process are described: wherein M stands for Nb or Ta, R1 and R2 C1 to C12 alkyl, C5 to C12 cycloalkyl, C6 to C10 aryl radicals, 1-alkenyl, 2-alkenyl, 3-alkenyl, triorganosilyl radicals —SiR3, or amino radicals NR2 R3 is C1 to C8 alkyl, C5 to C10 cycloalkyl, C6 to C14 aryl radical, or SiR3 or NR2, R4 denotes Cl, Br, I, NIH—R5 where R5 is C1 to C8 alkyl, C5 to C10 cycloalkyl or C6 to C10 aryl radical, or O—R6 where R6=optionally substituted C1 to C11 alkyl, C5 to C10 cycloalkyl, C6 to C10 aryl radical, or —SiR3, or BH4, or an allyl radical, or an indenyl radical, or an benzyl radical, or an cyclopentadienyl radical, or —NIR—NR?R? (hydrazido(-1), wherein R, R? and R? have the aforementioned meaning of R, or CH2SiMe3, pseudohalide, or silylamide —N(SiMe3)2, and R7 and R8 are H, C1 to C12 alkyl, C5 to C12 cycloalkyl or C6 to C10 aryl radicals.Type: GrantFiled: July 7, 2006Date of Patent: October 28, 2008Assignee: H.C. Starck GmbHInventors: Knud Reuter, Jörg Sundermeyer, Alexei Merkoulov, Wolfgang Stolz, Kerstin Volz, Michael Pokoj, Thomas Ochs
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Publication number: 20080038466Abstract: The present invention relates to special, novel tantalum and niobium compounds, the use thereof for the deposition of tantalum- or niobium-containing layers by means of chemical vapour deposition and the tantalum- or niobium-containing layers produced by this process.Type: ApplicationFiled: August 9, 2007Publication date: February 14, 2008Applicant: H. C. Starck GmbHInventors: Knud Reuter, Stephan Kirchmeyer, Daniel Gaess, Michael Pokoj, Jorg Sundermeyer, Wolfgang Stolz, Thomas Ochs, Kerstin Volz
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Publication number: 20080016868Abstract: A method of reducing pollutants exhausted into the atmosphere from the combustion of fossil fuels. The disclosed process removes nitrogen from air for combustion, separates the solid combustion products from the gases and vapors and can capture the entire vapor/gas stream for sequestration leaving near-zero emissions. The invention produces up to three captured material streams. The first stream is contaminant-laden water containing SOx, residual NOx particulates and particulate-bound Hg and other trace contaminants. The second stream can be a low-volume flue gas stream containing N2 and O2 if CO2 purification is needed. The final product stream is a mixture comprising predominantly CO2 with smaller amounts of H2O, Ar, N2, O2, SOX, NOX, Hg, and other trace gases.Type: ApplicationFiled: May 24, 2007Publication date: January 24, 2008Inventors: Thomas Ochs, Cathy Summers, Steve Gerdemann, Danylo Oryschyn, Paul Turner, Brian Patrick
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Publication number: 20070160761Abstract: The present invention relates to specific novel tungsten and molybdenum compounds to the use thereof for the deposition of tungsten- or molybdenum-containing layers by means of chemical vapour deposition, and to the tungsten- or molybdenum-containing layers produced by this process.Type: ApplicationFiled: January 4, 2007Publication date: July 12, 2007Applicant: H.C. Starck GmbH & Co. KGInventors: Knud Reuter, Jorg Sundermeyer, Alexei Merkoulov, Wolfgang Stolz, Kestin Volz, Michael Pokoj, Thomas Ochs
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Publication number: 20070042213Abstract: Tantalum and niobium compounds having the general formula (I) and their use for the chemical vapour deposition process are described: wherein M stands for Nb or Ta, R1 and R2 mutually independently denote optionally substituted C1 to C12 alkyl, C5 to C12 cycloalkyl, C6 to C10 aryl radicals, 1-alkenyl, 2-alkenyl, 3-alkenyl, triorganosilyl radicals —SiR3, or amino radicals NR2 where R?C1 to C4 alkyl, R3 denotes an optionally substituted C1 to C8 alkyl, C5 to C10 cycloalkyl, C6 to C14 aryl radical, or SiR3 or NR2, R4 denotes halogen from the group comprising Cl, Br, I, or NH—R5 where R5?optionally substituted C1 to C8 alkyl, C5 to C10 cycloalkyl or C6 to C10 aryl radical, or O—R6 where R6=optionally substituted C1 to C11 alkyl, C5 to C10 cycloalkyl, C6 to C10 aryl radical, or —SiR3, or BH4, or an optionally substituted allyl radical, or an indenyl radical, or an optionally substituted benzyl radical, or an optionally substituted cyclopentadienyl radical, or —NR—NR?R? (hydrazido(?1), wherein R, R? and R? hType: ApplicationFiled: July 7, 2006Publication date: February 22, 2007Applicant: H.C. STARCKInventors: Knud Reuter, Jorg Sundermeyer, Alexei Merkoulov, Wolfgang Stolz, Kerstin Volz, Michael Pokoj, Thomas Ochs