Patents by Inventor Thomas Osterheld

Thomas Osterheld has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20050186892
    Abstract: A platen for chemical mechanical polishing of a substrate includes a surface upon which a polishing pad can be placed, a support structure, and a controller. The surface has a first region and a second region and is operable to exert force against the polishing pad during polishing. The support structure is located beneath the second region and is operable to cause the second region to exert more force than the first region. The controller is operable to adjust the amount of force that is exerted by the second region.
    Type: Application
    Filed: January 5, 2005
    Publication date: August 25, 2005
    Inventors: Hung Chen, Steven Zuniga, Charles Garretson, Thomas Osterheld, Sen-Hou Ko, Mohsen Salek
  • Publication number: 20050153561
    Abstract: A substrate is chemical mechanical polished with a high-selectivity slurry until the stop layer is at least partially exposed, and then the substrate is polished with a low-selectivity slurry until the stop layer is completely exposed.
    Type: Application
    Filed: March 8, 2005
    Publication date: July 14, 2005
    Inventors: Raymond Jin, Shijian Li, Fred Redeker, Thomas Osterheld