Patents by Inventor Thomas Ostrom

Thomas Ostrom has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20170159504
    Abstract: A method for producing electrical energy is disclosed which uses a heat source, such as solar heat, geothermal heat, industrial waste heat or heat from power production processes, providing heat of 150° C. or below, further comprising an absorber system in which a working gas, primarily carbon dioxide CO2, is absorbed into an absorbent, typically an amine, further comprising a reactor which receives heat from said heat source and in which the absorbent-CO2 mixture is split into CO2 and absorbent, further comprising an expansion machine, an electricity generator and auxiliary equipment such as pumps, pipes and heat exchangers. The system according to the method allows the cost-efficient production of electrical energy and cooling using low value heat source.
    Type: Application
    Filed: August 12, 2016
    Publication date: June 8, 2017
    Applicant: ClimeOn AB
    Inventors: Thomas Ostrom, Joachim Karthauser
  • Patent number: 7411651
    Abstract: The present invention relates to alignment of a writing system and a workpiece. In particular, it relates to alignment to write a second layer pattern on a workpiece that has a first layer pattern, using an SLM. It extends to producing a mask or reticle, and to producing a layer of a device using the mask or reticle. Particular aspects of the present invention are described in the claims, specification and drawings.
    Type: Grant
    Filed: August 4, 2004
    Date of Patent: August 12, 2008
    Assignee: Micronic Laser Systems AB
    Inventors: Thomas Ostrom, Raoul Zerne
  • Publication number: 20050053273
    Abstract: The present invention relates to alignment of a writing system and a workpiece. In particular, it relates to alignment to write a second layer pattern on a workpiece that has a first layer pattern, using an SLM. It extends to producing a mask or reticle, and to producing a layer of a device using the mask or reticle. Particular aspects of the present invention are described in the claims, specification and drawings.
    Type: Application
    Filed: August 4, 2004
    Publication date: March 10, 2005
    Applicant: Micronic Laser Systems AB
    Inventors: Thomas Ostrom, Raoul Zerne