Abstract: A control system and methods for controlling the position of one or more engine-mounting links of an engine-mounting linkage system are provided. In one aspect, an engine-mounting linkage system includes one or more engine-mounting links that each have an adjustable inclination angle. An inclination angle of a link may be adjusted by an actuator of the control system. One or more controllers of the control system can control the actuator and thus the inclination angle of the link by determining a control command based at least in part on an output received from one or more sensors of the control system. The controllers can then cause the actuator to change the inclination angle of the link based at least in part on the determined control command.

Abstract: Engine-mounting linkage systems may include a plurality of engine mounting links configured to couple an engine frame to an engine support structure of an aircraft. The plurality of engine-mounting links may include a forward link that is connectable to a forward frame portion of the engine frame and the engine support structure, and an aft link that is connectable to an aft frame portion of the engine frame and the engine support structure. The engine mounting linkage system may include an actuator that is connectable to the engine support structure and one of the plurality of engine-mounting links, or to the engine support structure and the engine frame. The actuator, when actuated, changes an inclination angle ? of at least one of the plurality of engine-mounting links.

Abstract: Method and apparatus for etching an optically transparent layer disposed on a substrate, such as a photolithographic reticle, are provided. In one aspect, a method is provided for etching a substrate comprising placing the reticle on a support member in a processing chamber, positioning the reticle on a support member in a processing chamber, wherein the reticle comprises a patterned metal photomask layer formed on an optically transparent material, and a patterned resist material deposited on the patterned metal photomask layer, introducing a processing gas comprising one or more fluorine containing hydrocarbons and one or more chlorine-containing gases into the processing chamber, delivering power to the processing chamber to generate a plasma by applying a source RF power to a coil and applying a bias power to the support member, and etching exposed portions of the optically transparent material.