Abstract: A head restraint for a vehicle child seat includes an elastic head band, at least two head support straps, a first attachment strap and a second attachment strap. An inner perimeter of the elastic head band is sized to firmly fit around a child's head. One end of each head support strap is attached to one side of the elastic head band and the other end is attached to an opposing side of the elastic head band. One end of the first attachment strap is attached to one side of the elastic head band and one end of the second attachment strap is attached to an opposing side of the elastic head band. First and second releasable attachment devices are formed on the first and second attachment straps. First and second mating releasable attachment devices are preferably attached to opposing sides of a vehicle child seat.

Abstract: A frost protective device for citrus trees having a pad of thick, dark colored, water repellent urethane foam which may be wrapped in a cylinder around the budunion or branch of a citrus tree and secured in position using Velcro.RTM. or a similar fastener. Each protective device has a plurality of insulated pockets which receive individual exothermic heat sources such as dry-chemical warmers capable of producing high temperatures for a period of 1-3 days.To protect young trees from high initial temperatures and prolong the effective duration of the heat sources, other measures are utilized in combination with the protective device. One measure is controlling the exposure of the dry chemical packet to oxygen by varying the air flow properties of the insulating pocket or the air-tight wrapper initially enclosing the heat source, thereby regulating the resulting oxidation.

Abstract: A system for the detection of features in a semiconductor wafer for registration. An E-beam scans across an insulator covered with a metallic layer. The high energy electrons penetrate and cause the generation of electron/holes pairs. The drift or migration can be sensed as a current, the intensity of which is a function of the applied field strength. The field strength is in turn varied by the topology of the feature or the presence of a junction in the device. Since the E-beam position is known, registration occurs by correlation with the underlying feature as it is mapped out by sensing variations in current. The feature may be an alignment mark or a device under construction on the wafer.