Patents by Inventor Thomas Paul Grandi

Thomas Paul Grandi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Germanium silicon oxynitride high index films for planar waveguides
    Patent number: 6449420
    Abstract: A composition represented by the formula Si1−xGexO2(1−y)N1.33y, wherein x is from about 0.05 to about 0.6 and y is from about 0.14 to about 0.74 exhibits properties highly suited for use in fabricating waveguides for liquid crystal based optical devices. In particular, the compositions have an index of refraction of from about 1.6 to about 1.8 for light at a wavelength of 1550 nm, and/or a coefficient of thermal expansion of from about 2.5×10−6°C−1 to about 5.0×10−6° C.−1. The compositions also have inherently low hydrogen content, and a high hydrogen permeability which allows better hydrogen removal by thermal annealing to provide a material which exhibits low optical losses and better etching properties than alternative materials.
    Type: Grant
    Filed: February 7, 2002
    Date of Patent: September 10, 2002
    Assignee: Corning Incorporated
    Inventors: Ikerionwu Asiegbu Akwani, Robert Alan Bellman, Thomas Paul Grandi, Paul Arthur Sachenik
  • Germanium silicon oxynitride high index films for planar waveguides
    Publication number: 20020106174
    Abstract: A composition represented by the formula Si1−xGexO2(1−y)N1.33y, wherein x is from about 0.05 to about 0.6 and y is from about 0.14 to about 0.74 exhibits properties highly suited for use in fabricating waveguides for liquid crystal based optical devices. In particular, the compositions have an index of refraction of from about 1.6 to about 1.8 for light at a wavelength of 1550 nm, and/or a coefficient of thermal expansion of from about 2.5×10−6° C.−1 to about 5.0×10−6° C. −1. The compositions also have inherently low hydrogen content, and a high hydrogen permeability which allows better hydrogen removal by thermal annealing to provide a material which exhibits low optical losses and better etching properties than alternative materials.
    Type: Application
    Filed: February 7, 2002
    Publication date: August 8, 2002
    Inventors: Ikerionwu Asiegbu Akwani, Robert Alan Bellman, Thomas Paul Grandi, Paul Arthur Sachenik
  • Germanium silicon oxynitride high index films for planar waveguides
    Patent number: 6408125
    Abstract: A composition represented by the formula Si1−xGexO2(1−y)N1.33y, wherein x is from about 0.05 to about 0.6 and y is from about 0.14 to about 0.74 exhibits properties highly suited for use in fabricating waveguides for liquid crystal based optical devices. In particular, the compositions have an index of refraction of from about 1.6 to about 1.8 for light at a wavelength of 1550 nm, and/or a coefficient of thermal expansion of from about 2.5×10−6° C.−1 to about 5.0×10−6° C.−1. The compositions also have inherently low hydrogen content, and a high hydrogen permeability which allows better hydrogen removal by thermal annealing to provide a material which exhibits low optical losses and better etching properties than alternative materials.
    Type: Grant
    Filed: November 10, 1999
    Date of Patent: June 18, 2002
    Assignee: Corning Incorporated
    Inventors: Ikerionwu Asiegbu Akwani, Robert Alan Bellman, Thomas Paul Grandi, Paul Arthur Sachenik