Patents by Inventor Thomas Peter FACKE

Thomas Peter FACKE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10921751
    Abstract: The invention relates to a method for producing a holographic optical element by providing a recording stack comprising at least one recording element laminated on at least one supporting element, irradiating at least a part of the recording stack with at least one recording beam in an irradiating step, wherein during the irradiating step, the recording stack bends, providing a bending deviation threshold for the recording stack, and adjusting at least one first process parameter such that an expected maximum bending deviation of the recording stack does not exceed the bending deviation threshold, wherein the at least one first process parameter influences the bending behaviour of the recording stack during the irradiating step.
    Type: Grant
    Filed: August 8, 2018
    Date of Patent: February 16, 2021
    Assignees: LG Display Co., Ltd., Covestro Deutschland AG
    Inventors: Hyungseok Bang, Heejin Im, Guensik Lee, Friedrich-Karl Bruder, Thomas Peter Facke, Marc-Stephan Weiser, Rainer Hagen, Thomas Rolle, Horst Berneth, Dennis Honel, Günther Walze
  • Publication number: 20180348704
    Abstract: The invention relates to a method for producing a holographic optical element by providing a recording stack comprising at least one recording element laminated on at least one supporting element, irradiating at least a part of the recording stack with at least one recording beam in an irradiating step, wherein during the irradiating step, the recording stack bends, providing a bending deviation threshold for the recording stack, and adjusting at least one first process parameter such that an expected maximum bending deviation of the recording stack does not exceed the bending deviation threshold, wherein the at least one first process parameter influences the bending behaviour of the recording stack during the irradiating step.
    Type: Application
    Filed: August 8, 2018
    Publication date: December 6, 2018
    Inventors: Hyungseok BANG, Heejin IM, Guensik LEE, Friedrich-Karl BRUDER, Thomas Peter FACKE, Marc-Stephan WEISER, Rainer HAGEN, Thomas ROLLE, Horst BERNETH, Dennis HONEL, Günther WALZE
  • Patent number: 10073416
    Abstract: The invention relates to a method for producing a holographic optical element by providing a recording stack comprising at least one recording element laminated on at least one supporting element, irradiating at least a part of the recording stack with at least one recording beam in an irradiating step, wherein during the irradiating step, the recording stack bends, providing a bending deviation threshold for the recording stack, and adjusting at least one first process parameter such that an expected maximum bending deviation of the recording stack does not exceed the bending deviation threshold, wherein the at least one first process parameter influences the bending behavior of the recording stack during the irradiating step.
    Type: Grant
    Filed: April 24, 2015
    Date of Patent: September 11, 2018
    Assignees: LG Display Co., Ltd., Bayer MaterialScience AG
    Inventors: Hyungseok Bang, Heejin Im, Guensik Lee, Friedrich-Karl Bruder, Thomas Peter Facke, Marc-Stephan Weiser, Rainer Hagen, Thomas Rolle, Horst Berneth, Dennis Honel, Günther Walze
  • Publication number: 20160313696
    Abstract: The invention relates to a method for producing a holographic optical element by providing a recording stack comprising at least one recording element laminated on at least one supporting element, irradiating at least a part of the recording stack with at least one recording beam in an irradiating step, wherein during the irradiating step, the recording stack bends, providing a bending deviation threshold for the recording stack, and adjusting at least one first process parameter such that an expected maximum bending deviation of the recording stack does not exceed the bending deviation threshold, wherein the at least one first process parameter influences the bending behaviour of the recording stack during the irradiating step.
    Type: Application
    Filed: April 24, 2015
    Publication date: October 27, 2016
    Inventors: Hyungseok BANG, Heejin IM, Guensik LEE, Friedrich-Karl BRUDER, Thomas Peter FACKE, Marc-Stephan WEISER, Rainer HAGEN, Thomas ROLLE, Horst BERNETH, Dennis HONEL, Günther WALZE