Patents by Inventor Thomas R. Johnson

Thomas R. Johnson has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210017604
    Abstract: Disclosed herein are methods and reagents for determining the responsiveness of cancer to an epidermal growth factor receptor (EGFR) targeting treatment. The detection of these mutations will allow for the administration of gefitinib, erlotinib and other tyrosine kinase inhibitors to those patients most likely to respond to the drug.
    Type: Application
    Filed: April 21, 2020
    Publication date: January 21, 2021
    Applicants: The General Hospital Corporation, Dana-Farber Cancer Institute, Inc.
    Inventors: Daphne Winifred BELL, Daniel A. HABER, Pasi Antero JANNE, Bruce E. JOHNSON, Thomas J. LYNCH, Matthew MEYERSON, Juan Guillermo PAEZ, William R. SELLERS, Jeffrey E. SETTLEMAN, Raffaella SORDELLA
  • Publication number: 20200329930
    Abstract: A surface cleaning head includes dual rotating agitators (e.g., a leading roller and a brush roll) and a removable cover for covering a top of the agitators and allowing access to the agitators from a top of the surface cleaning head. The dual agitators may be used to facilitate capturing of debris in the air flow into a suction conduit on the underside of the surface cleaning head. The brush roll may be located in a brush roll chamber and at least partially in an opening to the suction conduit. The leading roller may be positioned adjacent to and in advance of the suction conduit opening such that the leading roller engages debris and moves the debris toward the brush roll and the opening. The leading roller may be removable from the housing and held in place by the removable cover. The cover may be coupled using isolated latching mechanisms.
    Type: Application
    Filed: July 6, 2020
    Publication date: October 22, 2020
    Inventors: Adam UDY, Andre David BROWN, John FREESE, Patrick CLEARY, Daniel MEYER, Daniel John INNES, Jason THORNE, Peter HUTCHINSON, Gordon HOWES, Wenxiu GAO, Daniel R. DER MARDEROSIAN, Thomas FORD, Owen R. JOHNSON
  • Publication number: 20200301288
    Abstract: Embodiments of the present disclosure generally provide improved photolithography systems and methods using a digital micromirror device (DMD). The DMD comprises columns and rows of micromirrors disposed opposite a substrate. Light beams reflect off the micromirrors onto the substrate, resulting in a patterned substrate. Certain subsets of the columns and rows of micromirrors may be positioned to the “off” position, such that they dump light, in order to correct for uniformity errors, i.e., features larger than desired, in the patterned substrate. Similarly, certain subsets of the columns and rows of micromirrors may be defaulted to the “off” position and selectively allowed to return to their programmed position in order to correct for uniformity errors, i.e., features smaller than desired, in the patterned substrate.
    Type: Application
    Filed: June 8, 2020
    Publication date: September 24, 2020
    Inventors: Joseph R. JOHNSON, Thomas L. LAIDIG, Christopher Dennis BENCHER
  • Patent number: 10779618
    Abstract: A sheet of loop material having utility as the landing zone in the manufacture of, e.g. disposable diapers and having excellent properties and an exceptionally low basis weight. Methods and apparatus for forming the sheet of loop material are also disclosed.
    Type: Grant
    Filed: August 7, 2017
    Date of Patent: September 22, 2020
    Assignee: 3M Innovative Properties Company
    Inventors: Michael R. Gorman, Thomas P. Besonen, Abbi G. Johnson, Shou-Lu G. Wang
  • Publication number: 20200278999
    Abstract: There is a need for solutions that increase efficiency and reliability of medical record processing systems. This need can be addressed, for example, by receiving a free-form primary provider input from a primary provider profile; detecting one or more information deficiencies in the primary provider input, wherein each information deficiency indicates a respective query; for each identified information deficiency of the one or more information deficiencies, identifying a supportive profile associated with the respective information deficiency, causing the supportive profile computing entity associated with the respective supportive provider profile to present an audiovisual interface that includes an indication of the respective query associated with the information deficiency, and receiving a supportive provider input from each supportive provider profile; and generating a collaborative record for the primary provider input based on the primary provider input and each received supportive provider input.
    Type: Application
    Filed: March 1, 2019
    Publication date: September 3, 2020
    Inventors: Raja Mukherji, Dominik Dahlem, Scott D. Johnson, Michael B. Wentzien, Joshua L. Taylor, Thomas R. Gilbertson, Bruno Ohana, Mallory B. Van Horn, David A. Chennisi, Yangcheng Huang
  • Publication number: 20200264517
    Abstract: Embodiments described herein provide a system, a software application, and a method of a lithography process, to write full tone portions and grey tone portions in a single pass. One embodiment includes a controller configured to provide mask pattern data to a lithography system. The controller is configured to divide a plurality of spatial light modulator pixels spatially by at least a grey tone group and a full tone group of spatial light modulator pixels. When divided by the controller, the grey tone group of spatial light modulator pixels is operable to project a first number of the multiplicity of shots to the plurality of full tone exposure polygons and the plurality of grey tone exposure polygons, and the full tone group of spatial light modulator pixels is operable to project a second number of the multiplicity of shots to the plurality of full tone exposure polygons.
    Type: Application
    Filed: October 24, 2019
    Publication date: August 20, 2020
    Inventors: Christopher Dennis BENCHER, Joseph R. JOHNSON, Thomas L. LAIDIG
  • Patent number: 10702108
    Abstract: A surface cleaning head includes dual rotating agitators (e.g., a leading roller and a brush roll) and a removable cover for covering a top of the agitators and allowing access to the agitators from a top of the surface cleaning head. The dual agitators may be used to facilitate capturing of debris in the air flow into a suction conduit on the underside of the surface cleaning head. The brush roll may be located in a brush roll chamber and at least partially in an opening to the suction conduit. The leading roller may be positioned adjacent to and in advance of the suction conduit opening such that the leading roller engages debris and moves the debris toward the brush roll and the opening. The leading roller may be removable from the housing and held in place by the removable cover. The cover may be coupled using isolated latching mechanisms.
    Type: Grant
    Filed: August 24, 2017
    Date of Patent: July 7, 2020
    Assignee: SharkNinja Operating LLC
    Inventors: Adam Udy, Andre David Brown, John Freese, Patrick Cleary, Daniel Meyer, Daniel John Innes, Jason Thorne, Peter Hutchinson, Gordon Howes, Wenxiu Gao, Daniel R. Der Marderosian, Thomas Ford, Owen R. Johnson
  • Patent number: 10705433
    Abstract: Embodiments of the present disclosure generally provide improved photolithography systems and methods using a digital micromirror device (DMD). The DMD comprises columns and rows of micromirrors disposed opposite a substrate. Light beams reflect off the micromirrors onto the substrate, resulting in a patterned substrate. Certain subsets of the columns and rows of micromirrors may be positioned to the “off” position, such that they dump light, in order to correct for uniformity errors, i.e., features larger than desired, in the patterned substrate. Similarly, certain subsets of the columns and rows of micromirrors may be defaulted to the “off” position and selectively allowed to return to their programmed position in order to correct for uniformity errors, i.e., features smaller than desired, in the patterned substrate.
    Type: Grant
    Filed: October 9, 2019
    Date of Patent: July 7, 2020
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Joseph R. Johnson, Thomas L. Laidig, Christopher Dennis Bencher
  • Patent number: 10669589
    Abstract: Disclosed herein are methods and reagents for determining the responsiveness of cancer to an epidermal growth factor receptor (EGFR) targeting treatment. The detection of these mutations will allow for the administration of gefitinib, erlotinib and other tyrosine kinase inhibitors to those patients most likely to respond to the drug.
    Type: Grant
    Filed: May 16, 2018
    Date of Patent: June 2, 2020
    Assignees: The General Hospital Corporation, Dana-Farber Cancer Institute, Inc.
    Inventors: Daphne Winifred Bell, Daniel A. Haber, Pasi Antero Janne, Bruce E. Johnson, Thomas J. Lynch, Matthew Meyerson, Juan Guillermo Paez, William R. Sellers, Jeffrey E. Settleman, Raffaella Sordella
  • Publication number: 20200097623
    Abstract: A computing device is configured to form a data structure modeling a production system. The data structure includes a plurality of process node data elements corresponding to production tasks of a manufacturing process described by the production system. Responsive to input, the computing device stores linking data to link process node data elements to objects that describe characteristics associated with process specifications, manufacturing devices, and other process characteristics. The computing device is also configured to update a set of production system estimates associated with the manufacturing process based on objects, and to compare the set of production system estimates to an acceptance criterion for the production system. The computer device also generates a notification indicating whether the manufacturing process described by the production system is expected to satisfy requirements indicated by the acceptance criterion.
    Type: Application
    Filed: September 26, 2018
    Publication date: March 26, 2020
    Inventors: John R. Palmer, William M. Harper, Hung L. Nguyen, Navin B. Johnson, Joseph R. Twardoski, Thomas P. Harper, Joseph R. Cabotaje, Anna Fe J. Garcia
  • Patent number: 10591815
    Abstract: Embodiments described herein provide a method shifting mask pattern data during a digital lithography process to reduce line waviness of an exposed pattern. The method includes providing a mask pattern data having a plurality of exposure polygons to a processing unit of a digital lithography system. The processing unit has a plurality of image projection systems that receive the mask pattern data. Each image projection system corresponds to a portion of a plurality of portions of a substrate and receives an exposure polygon corresponding to the portion. The substrate is scanned under the plurality of image projection systems and pluralities of shots are projected to the plurality of portions while shifting the mask pattern data. Each shot of the pluralities of shots is inside the exposure polygon corresponding to the portion.
    Type: Grant
    Filed: June 28, 2018
    Date of Patent: March 17, 2020
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Joseph R. Johnson, Christopher Dennis Bencher, Thomas L. Laidig
  • Publication number: 20200073253
    Abstract: Embodiments of the present disclosure generally provide improved photolithography systems and methods using a digital micromirror device (DMD). The DMD comprises columns and rows of micromirrors disposed opposite a substrate. Light beams reflect off the micromirrors onto the substrate, resulting in a patterned substrate. Certain subsets of the columns and rows of micromirrors may be positioned to the “off” position, such that they dump light, in order to correct for uniformity errors, i.e., features larger than desired, in the patterned substrate. Similarly, certain subsets of the columns and rows of micromirrors may be defaulted to the “off” position and selectively allowed to return to their programmed position in order to correct for uniformity errors, i.e., features smaller than desired, in the patterned substrate.
    Type: Application
    Filed: October 9, 2019
    Publication date: March 5, 2020
    Inventors: Joseph R. JOHNSON, Thomas L. LAIDIG, Christopher Dennis BENCHER
  • Patent number: 10571809
    Abstract: Embodiments described herein provide a system, a software application, and a method of a lithography process, to write full tone portions and grey tone portions in a single pass. One embodiment of the system includes a controller configured to provide mask pattern data to a lithography system. The controller is configured to divide a plurality of spatial light modulator pixels temporally by grey tone shots and full tone shots of a multiplicity of shots, and the controller is configured to vary a second intensity of a light beam generated by a light source and vary a first intensity of the light beam generated by the light source of each image projection system at the full tone shots.
    Type: Grant
    Filed: February 19, 2019
    Date of Patent: February 25, 2020
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Christopher Dennis Bencher, Joseph R. Johnson, Thomas L. Laidig
  • Publication number: 20200004132
    Abstract: Embodiments described herein provide a method shifting mask pattern data during a digital lithography process to reduce line waviness of an exposed pattern. The method includes providing a mask pattern data having a plurality of exposure polygons to a processing unit of a digital lithography system. The processing unit has a plurality of image projection systems that receive the mask pattern data. Each image projection system corresponds to a portion of a plurality of portions of a substrate and receives an exposure polygon corresponding to the portion. The substrate is scanned under the plurality of image projection systems and pluralities of shots are projected to the plurality of portions while shifting the mask pattern data. Each shot of the pluralities of shots is inside the exposure polygon corresponding to the portion.
    Type: Application
    Filed: June 28, 2018
    Publication date: January 2, 2020
    Inventors: Joseph R. JOHNSON, Christopher Dennis BENCHER, Thomas L. LAIDIG
  • Patent number: 10503076
    Abstract: Embodiments of the present disclosure generally provide improved photolithography systems and methods using a digital micromirror device (DMD). The DMD comprises columns and rows of micromirrors disposed opposite a substrate. Light beams reflect off the micromirrors onto the substrate, resulting in a patterned substrate. Certain subsets of the columns and rows of micromirrors may be positioned to the “off” position, such that they dump light, in order to correct for uniformity errors, i.e., features larger than desired, in the patterned substrate. Similarly, certain subsets of the columns and rows of micromirrors may be defaulted to the “off” position and selectively allowed to return to their programmed position in order to correct for uniformity errors, i.e., features smaller than desired, in the patterned substrate.
    Type: Grant
    Filed: August 29, 2018
    Date of Patent: December 10, 2019
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Joseph R. Johnson, Thomas L. Laidig, Christopher Dennis Bencher
  • Patent number: 10495975
    Abstract: An image correction application relating to the ability to apply maskless lithography patterns to a substrate in a manufacturing process is disclosed. The embodiments described herein relate to a software application platform, which corrects non-uniform image patterns on a substrate. The application platform method includes in a digital micromirror device (DMD) installed in an image projection system, the DMD having a plurality of columns, each column having a plurality of mirrors, disabling at least one entire column of the plurality of columns, exposing a first portion of the substrate to a first shot of electromagnetic radiation, exposing a second portion of the substrate to a second shot of electromagnetic radiation, and iteratively translating the substrate a step size and exposing another portion of the substrate to another shot of electromagnetic radiation until the substrate has been completely exposed to shots of electromagnetic radiation.
    Type: Grant
    Filed: April 19, 2019
    Date of Patent: December 3, 2019
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Thomas L. Laidig, Joseph R. Johnson, Christopher Dennis Bencher
  • Patent number: 10495979
    Abstract: Embodiments described herein provide a system, a software application, and a method of a lithography process, to write full tone portions and grey tone portions in a single pass. One embodiment includes a controller configured to provide mask pattern data to a lithography system. The controller is configured to divide a plurality of spatial light modulator pixels spatially by at least a grey tone group and a full tone group of spatial light modulator pixels. When divided by the controller, the grey tone group of spatial light modulator pixels is operable to project a first number of the multiplicity of shots to the plurality of full tone exposure polygons and the plurality of grey tone exposure polygons, and the full tone group of spatial light modulator pixels is operable to project a second number of the multiplicity of shots to the plurality of full tone exposure polygons.
    Type: Grant
    Filed: February 19, 2019
    Date of Patent: December 3, 2019
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Christopher Dennis Bencher, Joseph R. Johnson, Thomas L. Laidig
  • Publication number: 20190364227
    Abstract: A camera producing visible light images with thermal data. The camera may include visible light lens and sensor, an infrared light lens and sensor, and a display. The display displays some of the visible light image and thermal data from the respective sensors. The visible light image is divided into an array of zones where each zone may provide thermal data associated with the corresponding portion of the target shown in the zone. The camera may sense infrared images also provide audible alarms where the alarm is emitted with a tone of variable output to indicate the relative level of the alarm.
    Type: Application
    Filed: June 10, 2019
    Publication date: November 28, 2019
    Inventors: Thomas J. McManus, Kirk R. Johnson, Thomas Heinke, Mathew N. Rekow
  • Patent number: 10488508
    Abstract: For measuring an area of interest based on a sensor task, a method generates a sensor task comprising a sensor type and an area of interest. The method further routes the sensor task to a sensor of the sensor type and with a sensor motion track that includes the area of interest. The method measures the area of interest with the sensor based on the sensor task.
    Type: Grant
    Filed: July 19, 2018
    Date of Patent: November 26, 2019
    Inventors: Scott Allen Anderson, Troy R. Johnson, Jonathan R. Haws, Brad D. Petersen, Thomas J. Walls
  • Patent number: 10488762
    Abstract: Embodiments of the present disclosure provide improved photolithography systems and methods using a solid state emitter array. The solid state emitter array comprises solid state emitter devices arranged in rows and columns, wherein each solid state emitter device comprises two or more subpixels. Each solid state emitter device comprises one program gate which may transmit a voltage to a state storage node. The state storage node is in electrical communication with a drive gate. The drive gate is in communication with two or more solid state emitter subpixels. The arrangement of a plurality of subpixels in communication with a single drive gate allows more than one pulse to be delivered to the drive gate, resulting in illumination of more than one subpixel at each drive gate. The redundancy results in improved data efficiency.
    Type: Grant
    Filed: June 29, 2018
    Date of Patent: November 26, 2019
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Joseph R. Johnson, Thomas L. Laidig, Christopher Dennis Bencher