Patent number: 6610844
Abstract: Multiple novel reaction schemes, novel process steps and novel intermediates are provided for the synthesis of epoxymexrenone and other compounds of Formula I
wherein
—A—A— represents the group —CHR4—CHR5— or —CR4═CR5—;
R3, R4 and R5 are independently selected from the group consisting of hydrogen, halo, hydroxy, lower alkyl, lower alkoxy, hydroxyalkyl, alkoxyalkyl, hydroxycarbonyl, cyano and aryloxy;
R1 represents an alpha-oriented lower alkoxycarbonyl or hydroxyalkyl radical;
—B—B— represents the group —CHR6—CHR7— or an alpha- or beta-oriented group:
where R6 and R7 are independently selected from the group consisting of hydrogen, halo, lower alkoxy, acyl, hydroxyalkyl, alkoxyalkyl, hydroxycarbonyl, alkyl, alkoxycarbonyl, acyloxyalkyl, cyano and aryloxy; and
R8 and R9 are independently selected from the group consisting of hydrogen, hydroxy, halo, lower alkoxy, acyl, hydroxyalkyl
Type:
Grant
Filed:
March 29, 2002
Date of Patent:
August 26, 2003
Assignee:
G.D. Searle & Company
Inventors:
John S. Ng, Chin Liu, Dennis K. Anderson, Jon P. Lawson, Joseph Wieczorek, Sastry A. Kunda, Leo J. Letendre, Mark J. Pozzo, Yuen-Lung L. Sing, Ping T. Wang, Edward E. Yonan, Richard M. Weier, Thomas R. Kowar, Julio A. Baez, Bernhard Erb
