Patents by Inventor Thomas Richard Gaffney

Thomas Richard Gaffney has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20050276733
    Abstract: This invention relates to an improvement in a low-pressure storage and delivery system for gases having Lewis basicity, particularly hazardous specialty gases such as phosphine and arsine, which are utilized in the electronics industry. The improvement resides in storing the gases in a liquid incorporating a reactive compound having Lewis acidity capable of effecting a reversible reaction between a gas having Lewis basicity. The reactive compound comprises a reactive species that is dissolved, suspended, dispersed, or otherwise mixed with a nonvolatile liquid.
    Type: Application
    Filed: June 14, 2004
    Publication date: December 15, 2005
    Inventors: Daniel Joseph Tempel, Philip Henderson, Jeffrey Brzozowski, Ronald Martin Pearlstein, Thomas Richard Gaffney
  • Patent number: 6858697
    Abstract: The present invention is; (a) a process for stabilizing a cyclotetrasiloxane, such as 1,3,5,7-tetramethylcyclotetrasiloxane, against polymerization used in a chemical vapor deposition process for silicon oxides in electronic material fabrication comprising providing an effective amount of a neutral to weakly acidic polymerization inhibitor to such cyclotetrasiloxane; and (b) a composition of a cyclotetrasiloxane, such as 1,3,5,7-tetramethylcyclotetrasiloxane, stabilized against polymerization used in a chemical vapor deposition process as a precursor for silicon oxides in electronic material fabrication, comprising; such cyclotetrasiloxane and a neutral to weakly acidic polymerization inhibitor. A free radical scavenger can also be included in the process and composition.
    Type: Grant
    Filed: December 21, 2001
    Date of Patent: February 22, 2005
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Steven Gerard Mayorga, Manchao Xiao, Thomas Richard Gaffney
  • Publication number: 20040054114
    Abstract: The present invention is; (a) a process for stabilizing a cyclotetrasiloxane, such as 1,3,5,7-tetramethylcyclotetrasiloxane, against polymerization used in a chemical vapor deposition process for silicon oxides in electronic material fabrication comprising providing an effective amount of a free radical scavenger polymerization inhibitor to such cyclotetrasiloxane; and (b) a composition of a cyclotetrasiloxane, such as 1,3,5,7-tetramethylcyclotetrasiloxane, stabilized against polymerization used in a chemical vapor deposition process as a precursor for silicon oxides in electronic material fabrication, comprising; such cyclotetrasiloxane and a free radical scavenger polymerization inhibitor.
    Type: Application
    Filed: June 23, 2003
    Publication date: March 18, 2004
    Inventors: Steven Gerard Mayorga, Manchao Xiao, Thomas Richard Gaffney, Robert George Syvret
  • Publication number: 20030149213
    Abstract: The present invention is; (a) a process for stabilizing a cyclotetrasiloxane, such as 1,3,5,7-tetramethylcyclotetrasiloxane, against polymerization used in a chemical vapor deposition process for silicon oxides in electronic material fabrication comprising providing an effective amount of a neutral to weakly acidic polymerization inhibitor to such cyclotetrasiloxane; and (b) a composition of a cyclotetrasiloxane, such as 1,3,5,7-tetramethylcyclotetrasiloxane, stabilized against polymerization used in a chemical vapor deposition process as a precursor for silicon oxides in electronic material fabrication, comprising; such cyclotetrasiloxane and a neutral to weakly acidic polymerization inhibitor. A free radical scavenger can also be included in the process and composition.
    Type: Application
    Filed: December 21, 2001
    Publication date: August 7, 2003
    Inventors: Steven Gerard Mayorga, Manchao Xiao, Thomas Richard Gaffney
  • Patent number: 6315973
    Abstract: A cyclic process for operating an equilibrium controlled reaction in a plurality of reactors containing an admixture of an adsorbent and a reaction catalyst suitable for performing the desired reaction which is operated in a predetermined timed sequence wherein the heating and cooling requirements in a moving reaction mass transfer zone within each reactor are provided by indirect heat exchange with a fluid capable of phase change at temperatures maintained in each reactor during sorpreaction, depressurization, purging and pressurization steps during each process cycle.
    Type: Grant
    Filed: April 8, 1996
    Date of Patent: November 13, 2001
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Shankar Nataraj, Brian Thomas Carvill, Jeffrey Raymond Hufton, Steven Gerard Mayorga, Thomas Richard Gaffney, Jeffrey Richard Brzozowski
  • Patent number: 6280503
    Abstract: Adsorption of carbon dioxide from gas streams at temperatures in the range of 300 to 500° C. is carried out with a solid adsorbent containing magnesium oxide, preferably promoted with an alkali metal carbonate or bicarbonate so that the atomic ratio of alkali metal to magnesium is in the range of 0.006 to 2.60. Preferred adsorbents are made from the precipitate formed on addition of alkali metal and carbonate ions to an aqueous solution of a magnesium salt. Atomic ratios of alkali metal to magnesium can be adjusted by washing the precipitate with water. Low surface area adsorbents can be made by dehydration and CO2 removal of magnesium hydroxycarbonate, with or without alkali metal promotion. The process is especially valuable in pressure swing adsorption operations.
    Type: Grant
    Filed: August 6, 1999
    Date of Patent: August 28, 2001
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Steven Gerard Mayorga, Scott Jeffrey Weigel, Thomas Richard Gaffney, Jeffrey Richard Brzozowski
  • Patent number: 5917136
    Abstract: A pressure swing adsorption process for absorbing CO.sub.2 from a gaseous mixture containing CO.sub.2 comprising introducing the gaseous mixture at a first pressure into a reactor containing a modified alumina adsorbent maintained at a temperature ranging from 100.degree. C. and 500.degree. C. to adsorb CO.sub.2 to provide a CO.sub.2 laden alumina adsorbent and a CO.sub.2 depleted gaseous mixture and contacting the CO.sub.2 laden adsorbent with a weakly adsorbing purge fluid at a second pressure which is lower than the first pressure to desorb CO.sub.2 from the CO.sub.2 laden alumina adsorbent. The modified alumina adsorbent which is formed by depositing a solution having a pH of 3.0 or more onto alumina and heating the alumina to a temperature ranging from 100.degree. C. and 600.degree. C., is not degraded by high concentrations of water under process operating conditions.
    Type: Grant
    Filed: October 3, 1996
    Date of Patent: June 29, 1999
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Thomas Richard Gaffney, Timothy Christopher Golden, Steven Gerard Mayorga, Jeffrey Richard Brzozowski, Fred William Taylor
  • Patent number: 5882625
    Abstract: A faujasite aluminosilicate with a Si/Al ratio in the range of 1.05 to 1.26 having an non-uniform aluminum distribution, synthesized by crystallizing the zeolite from a mixture of alkali metal aluminate and alkali metal silicate wherein the mixture has an alkali metal oxide to silica ratio of at least 1.6 and a water to alkali metal oxide ratio of at least 37. The X-zeolite has utility as a gas separation adsorbent such as separating oxygen from nitrogen in air.
    Type: Grant
    Filed: August 8, 1997
    Date of Patent: March 16, 1999
    Assignee: Air Products and Chemicals, Inc.
    Inventors: James Edward Mac Dougall, Thomas Albert Braymer, Charles Gardner Coe, Thomas Richard Gaffney, Brian Keith Peterson