Patents by Inventor Thomas Rubio
Thomas Rubio has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11952663Abstract: Exemplary semiconductor processing chambers may include a substrate support including a top surface. A peripheral edge region of the top surface may be recessed relative to a medial region of the top surface. The chambers may include a pumping liner disposed about an exterior surface of the substrate support. The chambers may include a liner disposed between the substrate support and the pumping liner. The liner may be spaced apart from the exterior surface to define a purge lumen between the liner and the substrate support. The chambers may include an edge ring seated on the peripheral edge region. The edge ring may extend beyond a peripheral edge of the substrate support and above a portion of the liner. A gap may be formed between a bottom surface of the edge ring and a top surface of the liner. The gap and the purge lumen may be fluidly coupled.Type: GrantFiled: May 8, 2023Date of Patent: April 9, 2024Assignee: Applied Materials, Inc.Inventors: Nitin Pathak, Tuan A. Nguyen, Amit Bansal, Badri N. Ramamurthi, Thomas Rubio, Juan Carlos Rocha-Alvarez
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Publication number: 20230392259Abstract: Exemplary semiconductor processing chambers may include a substrate support including a top surface. A peripheral edge region of the top surface may be recessed relative to a medial region of the top surface. The chambers may include a pumping liner disposed about an exterior surface of the substrate support. The chambers may include a liner disposed between the substrate support and the pumping liner. The liner may be spaced apart from the exterior surface to define a purge lumen between the liner and the substrate support. The chambers may include an edge ring seated on the peripheral edge region. The edge ring may extend beyond a peripheral edge of the substrate support and above a portion of the liner. A gap may be formed between a bottom surface of the edge ring and a top surface of the liner. The gap and the purge lumen may be fluidly coupled.Type: ApplicationFiled: May 8, 2023Publication date: December 7, 2023Applicant: Applied Materials, Inc.Inventors: Nitin Pathak, Tuan A. Nguyen, Amit Bansal, Badri N. Ramamurthi, Thomas Rubio, Juan Carlos Rocha-Alvarez
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Patent number: 11827980Abstract: Aspects of the present disclosure relate generally to isolator devices, components thereof, and methods associated therewith for substrate processing chambers. In one implementation, a substrate processing chamber includes an isolator ring disposed between a pedestal and a pumping liner. The isolator ring includes a first surface that faces the pedestal, the first surface being disposed at a gap from an outer circumferential surface of the pedestal. The isolator ring also includes a second surface that faces the pumping liner and a protrusion that protrudes from the first surface of the isolator ring and towards the outer circumferential surface of the pedestal. The protrusion defines a necked portion of the gap between the pedestal and the isolator ring.Type: GrantFiled: October 26, 2022Date of Patent: November 28, 2023Assignee: Applied Materials, Inc.Inventors: Nitin Pathak, Amit Kumar Bansal, Tuan Anh Nguyen, Thomas Rubio, Badri N. Ramamurthi, Juan Carlos Rocha-Alvarez
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Patent number: 11643725Abstract: Exemplary semiconductor processing chambers may include a substrate support including a top surface. A peripheral edge region of the top surface may be recessed relative to a medial region of the top surface. The chambers may include a pumping liner disposed about an exterior surface of the substrate support. The chambers may include a liner disposed between the substrate support and the pumping liner. The liner may be spaced apart from the exterior surface to define a purge lumen between the liner and the substrate support. The chambers may include an edge ring seated on the peripheral edge region. The edge ring may extend beyond a peripheral edge of the substrate support and above a portion of the liner. A gap may be formed between a bottom surface of the edge ring and a top surface of the liner. The gap and the purge lumen may be fluidly coupled.Type: GrantFiled: March 26, 2021Date of Patent: May 9, 2023Assignee: Applied Materials, Inc.Inventors: Nitin Pathak, Tuan A. Nguyen, Amit Bansal, Badri N. Ramamurthi, Thomas Rubio, Juan Carlos Rocha-Alvarez
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Publication number: 20230047451Abstract: Aspects of the present disclosure relate generally to isolator devices, components thereof, and methods associated therewith for substrate processing chambers. In one implementation, a substrate processing chamber includes an isolator ring disposed between a pedestal and a pumping liner. The isolator ring includes a first surface that faces the pedestal, the first surface being disposed at a gap from an outer circumferential surface of the pedestal. The isolator ring also includes a second surface that faces the pumping liner and a protrusion that protrudes from the first surface of the isolator ring and towards the outer circumferential surface of the pedestal. The protrusion defines a necked portion of the gap between the pedestal and the isolator ring.Type: ApplicationFiled: October 26, 2022Publication date: February 16, 2023Inventors: Nitin PATHAK, Amit Kumar BANSAL, Tuan Anh NGUYEN, Thomas RUBIO, Badri N. RAMAMURTHI, Juan Carlos ROCHA-ALVAREZ
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Patent number: 11492705Abstract: Aspects of the present disclosure relate generally to isolator devices, components thereof, and methods associated therewith for substrate processing chambers. In one implementation, a substrate processing chamber includes an isolator ring disposed between a pedestal and a pumping liner. The isolator ring includes a first surface that faces the pedestal, the first surface being disposed at a gap from an outer circumferential surface of the pedestal. The isolator ring also includes a second surface that faces the pumping liner and a protrusion that protrudes from the first surface of the isolator ring and towards the outer circumferential surface of the pedestal. The protrusion defines a necked portion of the gap between the pedestal and the isolator ring.Type: GrantFiled: June 9, 2020Date of Patent: November 8, 2022Assignee: Applied Materials, Inc.Inventors: Nitin Pathak, Amit Kumar Bansal, Tuan Anh Nguyen, Thomas Rubio, Badri N. Ramamurthi, Juan Carlos Rocha-Alvarez
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Publication number: 20220307135Abstract: Exemplary semiconductor processing chambers may include a substrate support including a top surface. A peripheral edge region of the top surface may be recessed relative to a medial region of the top surface. The chambers may include a pumping liner disposed about an exterior surface of the substrate support. The chambers may include a liner disposed between the substrate support and the pumping liner. The liner may be spaced apart from the exterior surface to define a purge lumen between the liner and the substrate support. The chambers may include an edge ring seated on the peripheral edge region. The edge ring may extend beyond a peripheral edge of the substrate support and above a portion of the liner. A gap may be formed between a bottom surface of the edge ring and a top surface of the liner. The gap and the purge lumen may be fluidly coupled.Type: ApplicationFiled: March 26, 2021Publication date: September 29, 2022Applicant: Applied Materials, Inc.Inventors: Nitin Pathak, Tuan A. Nguyen, Amit Bansal, Badri N. Ramamurthi, Thomas Rubio, Juan Carlos Rocha-Alvarez
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Publication number: 20220307129Abstract: The present disclosure relates to a cleaning assemblies, components thereof, and methods associated therewith for substrate processing chambers. In one example, a cleaning assembly for a substrate processing chamber includes a distribution ring. The distribution ring comprises a body with an inlet and an outlet. The outlet is fluidly coupled to an internal volume of the substrate processing chamber via a sidewall of the substrate processing chamber. The cleaning assembly includes a cleaning conduit configured to fluidly couple a gas manifold to the distribution ring for diverting a first portion of cleaning fluid from the gas manifold to the distribution ring.Type: ApplicationFiled: March 23, 2021Publication date: September 29, 2022Inventors: Yuxing Zhang, Tuan Anh Nguyen, Amit Kumar Bansal, Nitin Pathak, Saket Rathi, Thomas Rubio, Udit S. Kotagi, Badri N. Ramamurthi, Dharma Ratnam Srichurnam
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Publication number: 20210002763Abstract: Aspects of the present disclosure relate generally to isolator devices, components thereof, and methods associated therewith for substrate processing chambers. In one implementation, a substrate processing chamber includes an isolator ring disposed between a pedestal and a pumping liner. The isolator ring includes a first surface that faces the pedestal, the first surface being disposed at a gap from an outer circumferential surface of the pedestal. The isolator ring also includes a second surface that faces the pumping liner and a protrusion that protrudes from the first surface of the isolator ring and towards the outer circumferential surface of the pedestal. The protrusion defines a necked portion of the gap between the pedestal and the isolator ring.Type: ApplicationFiled: June 9, 2020Publication date: January 7, 2021Inventors: Nitin PATHAK, Amit Kumar BANSAL, Tuan Anh NGUYEN, Thomas RUBIO, Badri N. RAMAMURTHI, Juan Carlos ROCHA-ALVAREZ
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Patent number: 8341059Abstract: A system, method and apparatus for creating and executing inter-exchange spread instruments, comprising a buy and a sell leg (or other variation of buys and/or sells) of two distinct global exchange traded instruments. A spread instrument price is set using an implied base price of a first leg based upon a current bid and offer of the first leg on a global exchange, an implied base price of a second leg based upon a current bid and offer of the second leg on a global exchange, a first leg weighting factor, a second leg weighting factor, and a volatility risk factor. When the spread instrument is traded, each underlying leg is automatically filled and confirmed pursuant to the customs and practices of the corresponding exchange and clearinghouse or clearing firm for the product associated with the leg.Type: GrantFiled: November 3, 2009Date of Patent: December 25, 2012Assignee: Breakwater Trading, LLCInventor: Thomas Rubio