Patents by Inventor Thomas Sarubbi

Thomas Sarubbi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Thermally cured undercoat for lithographic application
    Patent number: 7416821
    Abstract: Thermally curable undercoat composition comprising for producing a bilayer relief image comprising: a) a polymer of Structure I comprising repeating units of Structure II, III, and IV b) a phenolic crosslinker; c) a thermal acid generator (TAG); and d) a solvent.
    Type: Grant
    Filed: March 9, 2005
    Date of Patent: August 26, 2008
    Assignee: Fujifilm Electronic Materials, U.S.A., Inc.
    Inventors: Binod B De, Sanjay Malik, J. Thomas Kocab, Thomas Sarubbi
  • Thermally cured undercoat for lithographic application
    Publication number: 20050238997
    Abstract: Thermally curable undercoat composition comprising for producing a bilayer relief image comprising: a) a polymer of Structure I comprising repeating units of Structure II, III, and IV b) a phenolic crosslinker; c) a thermal acid generator (TAG); and d) a solvent.
    Type: Application
    Filed: March 9, 2005
    Publication date: October 27, 2005
    Inventors: Binod De, Sanjay Malik, J. Kocab, Thomas Sarubbi
  • Thermally stable phenolic resin compositions and their use in light-sensitive compositions
    Patent number: 5053479
    Abstract: A phenolic novolak resin comprising the product of a condensation reaction of an aldehyde comprising a haloacetaldehyde source or a mixture of a haloacetaldehyde source and a formaldehyde source with a phenolic monomer comprising at least one compound of the formula: ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 are individually selected from hydrogen or a one to four carbon alkyl group and wherein the ratio of total carbon atoms in the sum of R.sub.1, R.sub.2 and R.sub.3 to the total number of phenolic nuclei in said resin is from about 0.5:1 to about 1.5:1 in the presence of a solvent; said resin made by employing a molar ratio of total aldehyde to total phenolic monomers from about 0.33:1 to about 0.70:1. These phenolic resins are suitable for use in light-sensitive compositions (e.g. positive-working photoresists).
    Type: Grant
    Filed: June 18, 1990
    Date of Patent: October 1, 1991
    Assignee: OCG Microelectronic Materials, Inc.
    Inventors: Andrew J. Blakeney, Thomas Sarubbi, Joseph J. Sizensky
  • Process of forming resist image in positive photoresist with thermally stable phenolic resin
    Patent number: 5001040
    Abstract: A phenolic novolak resin comprising the product of a condensation reaction of an aldehyde comprising a haloacetaldehyde source or a mixture of a haloacetaldehyde source and a formaldehyde source with a phenolic monomer comprising at least one compound of the formula: ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 are individually selected from hydrogen or a one to four carbon alkyl group and wherein the ratio of total carbon atoms in the sum of R.sub.1, R.sub.2 and R.sub.3 to the total number of phenolic nuclei in said resin is from about 0.5:1 to about 1.5:1 in the presence of a solvent; said resin made by employing a molar ratio of total aldehyde to total phenolic monomers from about 0.33:1 to about 0.70:1. These phenolic resins are suitable for use in light-sensitive compositions (e.g. positive-working photoresists).
    Type: Grant
    Filed: June 18, 1990
    Date of Patent: March 19, 1991
    Assignee: Olin Hunt Specialty Products Inc.
    Inventors: Andrew J. Blakeney, Thomas Sarubbi, Joseph J. Sizensky
  • Light-sensitive o-quinone diazide composition and product with phenolic novolak prepared by condensation with haloacetoaldehyde
    Patent number: 4959292
    Abstract: A phenolic novolak resin comprising the product of a condensation reaction of an aldehyde comprising a haloacetaldehyde source or a mixture of a haloacetaldehyde source and a formaldehyde source with a phenolic monomer comprising at least one compound of the formula: ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 are individually selected from hydrogen or a one to four carbon alkyl group and wherein the ratio of total carbon atoms in the sum of R.sub.1, R.sub.2 and R.sub.3 to the total number of phenolic nuclei in said resin is from about 0.5:1 to about 1.5:1 in the presence of a solvent; said resin made by employing a molar ratio of total aldehyde to total phenolic monomers from about 0.33:1 to about 0.70:1. These phenolic resins are suitable for use in light-sensitive compositions (e.g. positive-working photoresists).
    Type: Grant
    Filed: July 11, 1988
    Date of Patent: September 25, 1990
    Assignee: Olin Hunt Specialty Products Inc.
    Inventors: Andrew J. Blakeney, Thomas Sarubbi, Joseph J. Sizensky