Patents by Inventor Thomas Schaepers

Thomas Schaepers has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for the in situ production of Majorana material superconductor hybrid networks and to a hybrid structure which is produced using the method
    Patent number: 11678590
    Abstract: A method for producing a hybrid structure, the hybrid structure including at least one structured Majorana material and at least one structured superconductive material arranged thereon includes producing, on a substrate, a first mask for structured application of the Majorana material and a further mask for structured growth of the at least one superconductive material, which are aligned relatively to one another, and applying the at least one structured superconductive material to the structured Majorana material with the aid of the further mask. The structured application of the Majorana material and of the at least one superconductive material takes place without interruption in an inert atmosphere.
    Type: Grant
    Filed: June 23, 2021
    Date of Patent: June 13, 2023
    Assignee: FORSCHUNGSZENTRUM JUELICH GMBH
    Inventors: Peter Schueffelgen, Daniel Rosenbach, Detlev Gruetzmacher, Thomas Schaepers
  • METHOD FOR THE IN SITU PRODUCTION OF MAJORANA MATERIAL SUPERCONDUCTOR HYBRID NETWORKS AND TO A HYBRID STRUCTURE WHICH IS PRODUCED USING THE METHOD
    Publication number: 20210399200
    Abstract: A method for producing a hybrid structure, the hybrid structure including at least one structured Majorana material and at least one structured superconductive material arranged thereon includes producing, on a substrate, a first mask for structured application of the Majorana material and a further mask for structured growth of the at least one superconductive material, which are aligned relatively to one another, and applying the at least one structured superconductive material to the structured Majorana material with the aid of the further mask. The structured application of the Majorana material and of the at least one superconductive material takes place without interruption in an inert atmosphere.
    Type: Application
    Filed: June 23, 2021
    Publication date: December 23, 2021
    Inventors: Peter SCHUEFFELGEN, Daniel ROSENBACH, Detlev GRUETZMACHER, Thomas SCHAEPERS
  • Method for the in situ production of Majorana material superconductor hybrid networks and to a hybrid structure which is produced using the method
    Patent number: 11088312
    Abstract: A method for producing a hybrid structure, the hybrid structure including at least one structured Majorana material and at least one structured superconductive material arranged thereon includes producing, on a substrate, a first mask for structured application of the Majorana material and a further mask for structured growth of the at least one superconductive material, which are aligned relatively to one another, and applying the at least one structured superconductive material to the structured Majorana material with the aid of the further mask. The structured application of the Majorana material and of the at least one superconductive material takes place without interruption in an inert atmosphere.
    Type: Grant
    Filed: March 1, 2018
    Date of Patent: August 10, 2021
    Assignee: FORSCHUNGSZENTRUM JUELICH GMBH
    Inventors: Peter Schueffelgen, Daniel Rosenbach, Detlev Gruetzmacher, Thomas Schaepers
  • Method for producing a flat free contacting surface for semiconductor nanostructures
    Patent number: 10714568
    Abstract: A method for producing a planar free surface comprising embedded, contactable nanostructures includes arranging at least one nanostructure on a surface of an initial substrate; applying a first layer to the surface of the initial substrate, wherein the first layer embeds the at least one nanostructure; applying a target substrate to the first layer; and separating the initial substrate from the first layer such that the at least one nanostructure embedded in the first layer has a planar free surface. An additional layer is applied to the surface of the initial substrate before the at least one nanostructure is applied to the initial substrate, and in that the initial substrate is removed from the first layer using a solvent.
    Type: Grant
    Filed: October 22, 2016
    Date of Patent: July 14, 2020
    Assignee: FORSCHUNGZENTRUM JUELICH GMBH
    Inventors: Sebastian Heedt, Julian Gerharz, Thomas Schaepers, Detlev Gruetzmacher
  • METHOD FOR THE IN SITU PRODUCTION OF MAJORANA MATERIAL SUPERCONDUCTOR HYBRID NETWORKS AND TO A HYBRID STRUCTURE WHICH IS PRODUCED USING THE METHOD
    Publication number: 20200044137
    Abstract: A method for producing a hybrid structure, the hybrid structure including at least one structured Majorana material and at least one structured superconductive material arranged thereon includes producing, on a substrate, a first mask for structured application of the Majorana material and a further mask for structured growth of the at least one superconductive material, which are aligned relatively to one another, and applying the at least one structured superconductive material to the structured Majorana material with the aid of the further mask. The structured application of the Majorana material and of the at least one superconductive material takes place without interruption in an inert atmosphere.
    Type: Application
    Filed: March 1, 2018
    Publication date: February 6, 2020
    Inventors: Peter SCHUEFFELGEN, Daniel ROSENBACH, Detlev GRUETZMACHER, Thomas SCHAEPERS
  • METHOD FOR PRODUCING A FLAT FREE CONTACTING SURFACE FOR SEMICONDUCTOR NANOSTRUCTURES
    Publication number: 20180366543
    Abstract: A method for producing a planar free surface comprising embedded, contactable nanostructures includes arranging at least one nanostructure on a surface of an initial substrate; applying a first layer to the surface of the initial substrate, wherein the first layer embeds the at least one nanostructure; applying a target substrate to the first layer; and separating the initial substrate from the first layer such that the at least one nanostructure embedded in the first layer has a planar free surface. An additional layer is applied to the surface of the initial substrate before the at least one nanostructure is applied to the initial substrate, and in that the initial substrate is removed from the first layer using a solvent.
    Type: Application
    Filed: October 22, 2016
    Publication date: December 20, 2018
    Inventors: Sebastian Heedt, Julian Gerharz, Thomas Schaepers, Detlev Gruetzmacher