Abstract: Computer-implemented techniques for pixel source optics calculations using spatial coherence are disclosed. Pixelated sources are used for source-mask co-optimization to enhance semiconductor lithography. Calculation of a partially coherent imaging system is used for optical-lithography simulation. The spatial coherence property of neighboring source points is used to reduce imaging calculation complexity. Two or more neighboring points are treated as one pseudo-spatially coherent area element.

Abstract: Computer-implemented techniques for pixel source optics calculations using spatial coherence are disclosed. Pixelated sources are used for source-mask co-optimization to enhance semiconductor lithography. Calculation of a partially coherent imaging system is used for optical-lithography simulation. The spatial coherence property of neighboring source points is used to reduce imaging calculation complexity. Two or more neighboring points are treated as one pseudo-spatially coherent area element.

Abstract: The invention relates to a mask inspection method that can be used for the design and production of masks, in order to detect relevant weak points early on and to correct the same. According to said method for mask inspection, an aerial image simulation, preferably an all-over aerial image simulation, is carried out on the basis of the mask design converted into a mask layout, in order to determine a list of hot spots. The mask/test mask is analysed by means of an AIMS tool, whereby real aerial images are produced and compared with the simulated aerial images. The determined differences between the aerial images are used to improve the mask design. The inventive arrangement enables a method to be carried out for mask inspection for mask design and mask production. The use of the AIMS tool directly in the mask production process essentially accelerates the mask production, while reducing the error rate and cost.

Abstract: The invention relates to a mask inspection method that can be used for the design and production of masks, in order to detect relevant weak points early on and to correct the same. According to said method for mask inspection, an aerial image simulation, preferably an all-over aerial image simulation, is carried out on the basis of the mask design converted into a mask layout, in order to determine a list of hot spots. The mask/test mask is analysed by means of an AIMS tool, whereby real aerial images are produced and compared with the simulated aerial images. The determined differences between the aerial images are used to improve the mask design. The inventive arrangement enables a method to be carried out for mask inspection for mask design and mask production. The use of the AIMS tool directly in the mask production process essentially accelerates the mask production, while reducing the error rate and cost.