Patents by Inventor Thomas Schoelzel

Thomas Schoelzel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Precision laser machining apparatus
    Patent number: 7742212
    Abstract: A focused laser beam having an optical axis passes sequentially through a simple, positive lens, a pair of plane, parallel windows, and a second, simple, negative lens. Each of the plane, parallel windows are mounted to a galvanometer motor and positioned orthogonally to one another. The focused laser beam is therefore displaced in a controlled manner from the optical axis to enable laser machining of very precise geometric features over a large processing window. A field size of one thousand microns is achieved.
    Type: Grant
    Filed: December 19, 2008
    Date of Patent: June 22, 2010
    Inventors: Michael J. Scaggs, Thomas Schoelzel
  • Precision laser machining apparatus
    Patent number: 7529010
    Abstract: A focused laser beam having an optical axis passes through a first lens mounted to a first galvanometer and a second lens mounted to a second galvanometer. The first galvanometer is adapted to tilt the first lens about a X axis and the second galvanometer is adapted to tilt the second lens about a Y axis. This displaces the focused laser beam in a controlled manner from the optical axis to enable laser machining of very precise geometric features over a large processing window. In a preferred embodiment, the first and second lenses are a pair of inverted positive meniscus lenses, of high index of refraction material.
    Type: Grant
    Filed: August 12, 2008
    Date of Patent: May 5, 2009
    Inventors: Michael J. Scaggs, Thomas Schoelzel, Sergei V. Govorkov
  • PRECISION LASER MACHINING APPARATUS
    Publication number: 20090095721
    Abstract: A focused laser beam having an optical axis passes sequentially through a simple, positive lens, a pair of plane, parallel windows, and a second, simple, negative lens. Each of the plane, parallel windows are mounted to a galvanometer motor and positioned orthogonally to one another. The focused laser beam is therefore displaced in a controlled manner from the optical axis to enable laser machining of very precise geometric features over a large processing window. A field size of one thousand microns is achieved.
    Type: Application
    Filed: December 19, 2008
    Publication date: April 16, 2009
    Inventors: Michael J. Scaggs, Thomas Schoelzel
  • Precision laser machining apparatus
    Patent number: 7489429
    Abstract: A focused laser beam having an optical axis passes through a first lens mounted to a first galvanometer and a second lens mounted to a second galvanometer. The first galvanometer is adapted to tilt the first lens about a X axis and the second galvanometer is adapted to tilt the second lens about a Y axis. This displaces the focused laser beam in a controlled manner from the optical axis to enable laser machining of very precise geometric features over a large processing window. In a preferred embodiment, the first and second lenses are a pair of inverted positive meniscus lenses, of high index of refraction material.
    Type: Grant
    Filed: February 14, 2007
    Date of Patent: February 10, 2009
    Inventors: Michael J. Scaggs, Thomas Schoelzel, Sergei V. Govorkov
  • Precision Laser Machining Apparatus
    Publication number: 20080192322
    Abstract: A focused laser beam having an optical axis passes through a first lens mounted to a first galvanometer and a second lens mounted to a second galvanometer. The first galvanometer is adapted to tilt the first lens about a X axis and the second galvanometer is adapted to tilt the second lens about a Y axis. This displaces the focused laser beam in a controlled manner from the optical axis to enable laser machining of very precise geometric features over a large processing window. In a preferred embodiment, the first and second lenses are a pair of inverted positive meniscus lenses, of high index of refraction material.
    Type: Application
    Filed: February 14, 2007
    Publication date: August 14, 2008
    Inventors: Michael J. Scaggs, Thomas Schoelzel