Abstract: Beam current variation system for a cyclotron, arranged in the inner center of the cyclotron, downstream from the ion source generating the charged particle beam, the system comprising a deflector system powered by a voltage and a collimator. The beam is dumped in the collimator, if the deflector system (10; 20, 21) is not powered, and the beam is switched on by powering the deflector system with a voltage.

Abstract: Beam current variation system for a cyclotron, arranged in the inner centre of the cyclotron, downstream from the ion source generating the charged particle beam, the system comprising a deflector system powered by a voltage and a collimator. The beam is dumped in the collimator, if the deflector system (10; 20, 21) is not powered, and the beam is switched on by powering the deflector system with a voltage.

Abstract: Systems and methods are provided to perform efficient, automatic cyclotron initialization, calibration, and beam adjustment. A process is provided that allows the automation of the initialization of a cyclotron after overnight or maintenance imposed shutdown. In one embodiment, five independent cyclotron system states are defined and the transition between one state to another may be automated, e.g., by the control system of the cyclotron. According to these embodiments, it is thereby possible to achieve beam operation after shutdown with minimal manual input. By applying an automatic procedure, all active devices of the cyclotron (e.g., RF system, extraction deflectors, ion source) are respectively ramped to predefined parameters.

Abstract: Systems and methods are provided to perform efficient, automatic adjustment of cyclotron beam currents within a wide range for multiple treatment layers within the same patient and treatment session. In one embodiment, efficient adjustment is achieved by using beam current attenuation by an electrostatic vertical deflector installed in the inner center of the cyclotron. The beam current may, for example, be adjusted by the high voltage applied to the electrostatic vertical deflector. In front of each treatment the attenuation curve of the vertical deflector is recorded. Based on this attenuation curve, the vertical deflector voltage for the needed beam current of each irradiation layer is interpolated. With this procedure the beam current could be automatically adjusted in minimal time over a wide range while maintaining a high level of precision.

Abstract: Systems and methods are provided to perform efficient, automatic cyclotron initialization, calibration, and beam adjustment. A process is provided that allows the automation of the initialization of a cyclotron after overnight or maintenance imposed shutdown. In one embodiment, five independent cyclotron system states are defined and the transition between one state to another may be automated, e.g., by the control system of the cyclotron. According to these embodiments, it is thereby possible to achieve beam operation after shutdown with minimal manual input. By applying an automatic procedure, all active devices of the cyclotron (e.g., RF system, extraction deflectors, ion source) are respectively ramped to predefined parameters.

Abstract: Systems and methods are provided to perform efficient, automatic adjustment of cyclotron beam currents within a wide range for multiple treatment layers within the same patient and treatment session. In one embodiment, efficient adjustment is achieved by using beam current attenuation by an electrostatic vertical deflector installed in the inner center of the cyclotron. The beam current may, for example, be adjusted by the high voltage applied to the electrostatic vertical deflector. In front of each treatment the attenuation curve of the vertical deflector is recorded. Based on this attenuation curve, the vertical deflector voltage for the needed beam current of each irradiation layer is interpolated. With this procedure the beam current could be automatically adjusted in minimal time over a wide range while maintaining a high level of precision.

Abstract: Systems and methods are provided to perform efficient, automatic adjustment of cyclotron beam currents within a wide range for multiple treatment layers within the same patient and treatment session. In one embodiment, efficient adjustment is achieved by using beam current attenuation by an electrostatic vertical deflector installed in the inner center of the cyclotron. The beam current may, for example, be adjusted by the high voltage applied to the electrostatic vertical deflector. In front of each treatment the attenuation curve of the vertical deflector is recorded. Based on this attenuation curve, the vertical deflector voltage for the needed beam current of each irradiation layer is interpolated. With this procedure the beam current could be automatically adjusted in minimal time over a wide range while maintaining a high level of precision.

Abstract: Systems and methods are provided to perform efficient, automatic cyclotron initialization, calibration, and beam adjustment. A process is provided that allows the automation of the initialization of a cyclotron after overnight or maintenance imposed shutdown. In one embodiment, five independent cyclotron system states are defined and the transition between one state to another may be automated, e.g., by the control system of the cyclotron. According to these embodiments, it is thereby possible to achieve beam operation after shutdown with minimal manual input. By applying an automatic procedure, all active devices of the cyclotron (e.g., RF system, extraction deflectors, ion source) are respectively ramped to predefined parameters.

Abstract: Systems and methods are provided to perform efficient, automatic cyclotron initialization, calibration, and beam adjustment. A process is provided that allows the automation of the initialization of a cyclotron after overnight or maintenance imposed shutdown. In one embodiment, five independent cyclotron system states are defined and the transition between one state to another may be automated, e.g., by the control system of the cyclotron. According to these embodiments, it is thereby possible to achieve beam operation after shutdown with minimal manual input. By applying an automatic procedure, all active devices of the cyclotron (e.g., RF system, extraction deflectors, ion source) are respectively ramped to predefined parameters.

Abstract: Systems and methods are provided to perform efficient, automatic adjustment of cyclotron beam currents within a wide range for multiple treatment layers within the same patient and treatment session. In one embodiment, efficient adjustment is achieved by using beam current attenuation by an electrostatic vertical deflector installed in the inner center of the cyclotron. The beam current may, for example, be adjusted by the high voltage applied to the electrostatic vertical deflector. In front of each treatment the attenuation curve of the vertical deflector is recorded. Based on this attenuation curve, the vertical deflector voltage for the needed beam current of each irradiation layer is interpolated. With this procedure the beam current could be automatically adjusted in minimal time over a wide range while maintaining a high level of precision.

Abstract: A printing device and method for printing. The printing device includes photoconductor for receiving a charge, a plurality of organic vertical cavity surface emitting lasers for producing a charged image pattern on said photoconductor; a toner application mechanism for applying a toner onto said photoconductor for creating a toner image pattern in accordance with said charged image pattern; and a transfer mechanism for transferring said toner image pattern onto a media.

Abstract: A liquid drop ejector is provided. The ejector includes a liquid chamber and a liquid supply. Portions of the liquid chamber define a nozzle bore. A liquid supply passageway is positioned between the liquid chamber and the liquid supply. The liquid supply passageway is in fluid communication with the liquid chamber and the liquid supply. A plurality of pillars is suspended in the liquid supply passageway. A wall of the liquid chamber can extend to the liquid supply passageway. A center pillar can also be included with a portion of the center pillar being positioned in the liquid chamber and another portion of the center pillar being positioned in the liquid supply passageway.

Abstract: A liquid drop emitter, a method of mixing a liquid, and a method of printing are provided. The liquid emitter includes a structure defining a chamber adapted to provide a liquid having an orifice through which a drop of the liquid can be emitted. A drop forming mechanism is operatively associated with the chamber. A mixing mechanism is associated with the chamber and is operable to create a surface tension gradient on the liquid provided by the chamber such that the liquid flows without being emitted from the chamber.

Abstract: A method of reducing or eliminating dye build-up on tension rollers in a thermal printing system is presented. The thermal printing system comprises a station capable of depositing black dye on a media. The method comprises the steps of depositing the black dye on the media and processing the black dye prior to the black dye reaching the tension roller. Processing the black dye includes techniques, such as cooling the black dye, re-routing the black dye, and drying the black dye before the black dye comes in contact with the tension rollers.

Abstract: A heater is provided. The heater includes a first material having a circular form and a first sheet resistivity. The first material has a first radius of curvature. The heater also includes a second material having a circular form and a second sheet resistivity. The second material is positioned adjacent to the first material and has a second radius of curvature. The first radius of curvature is greater than the second radius of curvature and the first sheet resistivity is less than the second sheet resistivity.

Abstract: A method for creating an inkjet chamber. The method comprises the steps of firstly providing a substrate having a nozzle opening and secondly etching the substrate through the nozzle opening by alternating between anisotropic and isotropic etching processes for forming a chamber having a shape approximating a cylinder by using multiple hemispheric etches.

Abstract: An apparatus and method for controlling temperature profiles in ejection mechanisms is provided. A heater includes a first resistor segment having an electrical resistivity, a second resistor segment; and a coupling segment positioned between the first resistor segment and the second resistor segment. The coupling segment has an electrical resistivity, wherein the ratio of the resistivity of the coupling segment to the resistivity of the first resistor segment is substantially zero. Alternatively, the first resistor segment has an electrical conductivity and the coupling segment has an electrical conductivity, wherein the electrical conductivity of the coupling segment is greater than the electrical conductivity of the first resistor segment.

Abstract: A system for displaying images includes: (a) a base; (b) a movable, arcuate-shaped receptacle that rotates into and from the base; and (c) a display attached to the receptacle so that the display is visible when the receptacle is rotated from the base and the display is partially or entirely not visible when the receptacle is rotated into the base.

Abstract: A method for creating one or more ink jet chambers, the method includes the steps of providing a substrate having a thermal element covered with substantially one type of uncured photo-imageable material; providing a first mask spanning the thermal element which creates both masked and unmasked uncured photo-imageable regions; exposing the unmasked photo-imageable region; providing a second mask covering at least a portion of the thermal element; exposing a portion of the remaining unexposed photo-imageable region for forming an output nozzle; curing the exposed portions of the photo-imageable material; and removing all the remaining uncured photo-imageable material for creating the ink jet chamber.

Abstract: A system for displaying images includes: (a) a base; (b) a movable, arcuate-shaped receptacle that rotates into and from the base; and (c) a display attached to the receptacle so that the display is visible when the receptacle is rotated from the base and the display is partially or entirely not visible when the receptacle is rotated into the base.