Patents by Inventor Thomas Struck

Thomas Struck has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6662661
    Abstract: The method enables optical measurements of an oscillatory, and particularly structured, membrane in an environment which is subjected to gas flows and/or acoustic excitations. A device for measuring the membrane is focused on the same. An optically transparent film is provided, and the film and the membrane are arranged in such a manner that the gas flows and/or the acoustic excitations reach the membrane only by passing through the film. The film enables a diminishing of the external air movements and thus oscillations of the membrane so that the membrane can be precisely measured.
    Type: Grant
    Filed: March 18, 2002
    Date of Patent: December 16, 2003
    Assignee: Leica Microsystems Semiconductor GmbH
    Inventors: Gerd Stach, Thomas Struck
  • Publication number: 20020167666
    Abstract: The method enables optical measurements of an oscillatory, and particularly structured, membrane in an environment which is subjected to gas flows and/or acoustic excitations. A device for measuring the membrane is focused on the same. An optically transparent film is provided, and the film and the membrane are arranged in such a manner that the gas flows and/or the acoustic excitations reach the membrane only by passing through the film. The film enables a diminishing of the external air movements and thus oscillations of the membrane so that the membrane can be precisely measured.
    Type: Application
    Filed: March 18, 2002
    Publication date: November 14, 2002
    Inventors: Gerd Stach, Thomas Struck
  • Publication number: 20020001764
    Abstract: A method and a device for analyzing structures of a photomask are described. In a first method step, at least one trench is created in the photomask, so that at least one lateral limitation of the trench forms a section through the structures to be analyzed. Then, the structures to be analyzed are scanned by scanning beams, which are guided through the trench on its lateral limitation.
    Type: Application
    Filed: June 25, 2001
    Publication date: January 3, 2002
    Inventors: Guenther Ruhl, Martin Verbeek, Thomas Struck