Patents by Inventor Thomas Tharigen

Thomas Tharigen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for increasing the accuracy of the positioning of a first object relative to a second object
    Patent number: 8094925
    Abstract: A method is provided for increasing the accuracy of the positioning of a first object relative to a second object. The method overcomes the disadvantageous influence of thermal drift between a first and a second object during a positioning of a first object on a second object. The method finds applications in manufacturing, for example, in the manufacturing of semiconductor components. The method utilizes recognition of structures on the second object which have a minimum structure width. At a first instant, using one recognition procedure, the first object is positioned on the second object in a desired position. The relative displacement of the two objects is determined at the first instant and on at least one subsequent instant. A second recognition procedure may be used for this purpose. The second recognition procedure may have a resolution accuracy which is different than the resolution accuracy of the first resolution procedure. The second recognition procedure may be a pattern recognition method.
    Type: Grant
    Filed: November 16, 2009
    Date of Patent: January 10, 2012
    Assignee: Cascade Microtech, Inc.
    Inventors: Stefan Schneidewind, Claus Dietrich, Jorg Kiesewetter, Michael Teich, Thomas Tharigen
  • METHOD FOR INCREASING THE ACCURACY OF THE POSITIONING OF A FIRST OBJECT RELATIVE TO A SECOND OBJECT
    Publication number: 20100111403
    Abstract: A method is provided for increasing the accuracy of the positioning of a first object relative to a second object. The method overcomes the disadvantageous influence of thermal drift between a first and a second object during a positioning of a first object on a second object. The method finds applications in manufacturing, for example, in the manufacturing of semiconductor components. The method utilizes recognition of structures on the second object which have a minimum structure width. At a first instant, using one recognition procedure, the first object is positioned on the second object in a desired position. The relative displacement of the two objects is determined at the first instant and on at least one subsequent instant. A second recognition procedure may be used for this purpose. The second recognition procedure may have a resolution accuracy which is different than the resolution accuracy of the first resolution procedure. The second recognition procedure may be a pattern recognition method.
    Type: Application
    Filed: November 16, 2009
    Publication date: May 6, 2010
    Inventors: Stefan Schineidewind, Claus Dietrich, Jorg Kiesewetter, Michael Teich, Thomas Tharigen
  • Method For Increasing The Accuracy Of The Positioning Of A First Object Relative To A Second Object
    Publication number: 20080298671
    Abstract: A method is provided for increasing the accuracy of the positioning of a first object relative to a second object. The method overcomes the disadvantageous influence of thermal drift between a first and a second object during a positioning of a first object on a second object. The method finds applications in manufacturing, for example, in the manufacturing of semiconductor components. The method utilizes recognition of structures on the second object which have a minimum structure width. At a first instant, using one recognition procedure, the first object is positioned on the second object in a desired position. The relative displacement of the two objects is determined at the first instant and on at least one subsequent instant. A second recognition procedure may be used for this purpose. The second recognition procedure may have a resolution accuracy which is different than the resolution accuracy of the first resolution procedure. The second recognition procedure may be a pattern recognition method.
    Type: Application
    Filed: July 10, 2008
    Publication date: December 4, 2008
    Inventors: Stefan Schneidewind, Claus Dietrich, Jorg Kiesswetter, Michael Teich, Thomas Tharigen
  • Method for increasing the accuracy of the positioning of a first object relative to a second object
    Publication number: 20040208355
    Abstract: A method is provided for increasing the accuracy of the positioning of a first object relative to a second object. The method overcomes the disadvantageous influence of thermal drift between a first and a second object during a positioning of a first object on a second object. The method finds applications in manufacturing, for example, in the manufacturing of semiconductor components. The method utilizes recognition of structures on the second object which have a minimum structure width. At a first instant, using one recognition procedure, the first object is positioned on the second object in a desired position. The relative displacement of the two objects is determined at the first instant and on at least one subsequent instant. A second recognition procedure may be used for this purpose. The second recognition procedure may have a resolution accuracy which is different than the resolution accuracy of the first resolution procedure. The second recognition procedure may be a pattern recognition method.
    Type: Application
    Filed: April 15, 2004
    Publication date: October 21, 2004
    Inventors: Stefan Schneidewind, Claus Dietrich, Jorg Kiesewetter, Michael Teich, Thomas Tharigen