Patents by Inventor Thomas Thurn-Albrecht

Thomas Thurn-Albrecht has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Nanocylinder arrays
    Patent number: 7572669
    Abstract: Pathways to rapid and reliable fabrication of nanocylinder arrays are provided. Simple methods are described for the production of well-ordered arrays of nanopores, nanowires, and other materials. This is accomplished by orienting copolymer films and removing a component from the film to produce nanopores, that in turn, can be filled with materials to produce the arrays. The resulting arrays can be used to produce nanoscale media, devices, and systems.
    Type: Grant
    Filed: February 21, 2007
    Date of Patent: August 11, 2009
    Assignee: University of Massachusetts
    Inventors: Mark Tuominen, Joerg Schotter, Thomas Thurn-Albrecht, Thomas P. Russell
  • Nanocylinder arrays
    Publication number: 20080032490
    Abstract: Pathways to rapid and reliable fabrication of nanocylinder arrays are provided. Simple methods are described for the production of well-ordered arrays of nanopores, nanowires, and other materials. This is accomplished by orienting copolymer films and removing a component from the film to produce nanopores, that in turn, can be filled with materials to produce the arrays. The resulting arrays can be used to produce nanoscale media, devices, and systems.
    Type: Application
    Filed: February 21, 2007
    Publication date: February 7, 2008
    Inventors: Mark Tuominen, Joerg Schotter, Thomas Thurn-Albrecht, Thomas Russell
  • Nanocylinder arrays
    Patent number: 7190049
    Abstract: Pathways to rapid and reliable fabrication of nanocylinder arrays are provided. Simple methods are described for the production of well-ordered arrays of nanopores, nanowires, and other materials. This is accomplished by orienting copolymer films and removing a component from the film to produce nanopores, that in turn, can be filled with materials to produce the arrays. The resulting arrays can be used to produce nanoscale media, devices, and systems.
    Type: Grant
    Filed: March 22, 2001
    Date of Patent: March 13, 2007
    Assignee: University of Massachusetts
    Inventors: Mark Tuominen, Joerg Schotter, Thomas Thurn-Albrecht, Thomas P. Russell
  • Methods and apparatus for forming submicron patterns on films
    Patent number: 7014786
    Abstract: A method for forming a patterned film on a substrate, the method including: providing a first flowable medium on the substrate and a second flowable medium on the first flowable medium, the first and second flowable media having different dielectric properties and defining an interface there between; applying an electric field to the interface for a time sufficient to produce a structure in the first flowable medium along the interface: and hardening the structure in the first flowable medium to form the patterned film.
    Type: Grant
    Filed: May 14, 2002
    Date of Patent: March 21, 2006
    Assignees: Universitat Konstanz, University of Massachusetts
    Inventors: Erik Schaffer, Jurgen Mlynek, Ullrich Steiner, Thomas Thurn-Albrecht, Thomas P. Russell
  • Methods and apparatus for forming submicron patterns on films
    Publication number: 20020170879
    Abstract: A method for forming a patterned film on a substrate, the method including: providing a first flowable medium on the substrate and a second flowable medium on the first flowable medium, the first and second flowable media having different dielectric properties and defining an interface there between; applying an electric field to the interface for a time sufficient to produce a structure in the first flowable medium along the interface: and hardening the structure in the first flowable medium to form the patterned film.
    Type: Application
    Filed: May 14, 2002
    Publication date: November 21, 2002
    Applicant: University of Massachusetts, a Massachusetts corporation
    Inventors: Erik Schaffer, Jurgen Mlynek, Ullrich Steiner, Thomas Thurn-Albrecht, Thomas P. Russell
  • Methods and apparatus for forming submicron patterns on films
    Patent number: 6391217
    Abstract: A method for forming a patterned film on a substrate, the method including: providing a first flowable medium on the substrate and a second flowable medium on the first flowable medium, the first and second flowable media having different dielectric properties and defining an interface there between; applying an electric field to the interface for a time sufficient to produce a structure in the first flowable medium along the interface; and hardening the structure in the first flowable medium to form the patterned film.
    Type: Grant
    Filed: December 22, 2000
    Date of Patent: May 21, 2002
    Assignees: University of Massachusetts, Universitat Konstanz
    Inventors: Erik Schäffer, Jurgen Mlynek, Ullrich Steiner, Thomas Thurn-Albrecht, Thomas P. Russell
  • Nanocylinder arrays
    Publication number: 20020055239
    Abstract: Pathways to rapid and reliable fabrication of nanocylinder arrays are provided. Simple methods are described for the production of well-ordered arrays of nanopores, nanowires, and other materials. This is accomplished by orienting copolymer films and removing a component from the film to produce nanopores, that in turn, can be filled with materials to produce the arrays. The resulting arrays can be used to produce nanoscale media, devices, and systems.
    Type: Application
    Filed: March 23, 2001
    Publication date: May 9, 2002
    Inventors: Mark Tuominen, Joerg Schotter, Thomas Thurn-Albrecht, Thomas P. Russell
  • Methods and apparatus for forming submicron patterns on films
    Publication number: 20020005391
    Abstract: A method for forming a patterned film on a substrate, the method including: providing a first flowable medium on the substrate and a second flowable medium on the first flowable medium the first and second flowable media having different dielectric properties and defining an interface there between; applying an electric field to the interface for a time sufficient to produce a structure in the first flowable medium along the interface; and hardening the structure in the first flowable medium to form the patterned film.
    Type: Application
    Filed: December 22, 2000
    Publication date: January 17, 2002
    Inventors: Erik Schaffer, Jurgen Mlynek, Ullrich Steiner, Thomas Thurn-Albrecht, Thomas P. Russell