Abstract: The invention relates to a method and an appliance for predicting the imaging result obtained with a mask when a lithography process is carried out, wherein the mask comprises mask structures to be imaged and the mask is destined to be illuminated in a lithography process in a projection exposure apparatus with a predetermined illumination setting for exposing a wafer comprising a photoresist.

Abstract: A method is provided for determining an OPC model comprising: recording an aerial image by use of a mask inspection microscope, wherein the aerial image comprises at least one segment of a mask; simulating a plurality of aerial images which comprise at least the segment, proceeding from a mask design and from predefined parameters of an optical model which is part of the OPC model, wherein the parameters differ for each of the simulated aerial images of the plurality of aerial images; determining differences between the measured aerial image and the simulated aerial images; determining those parameters for which the differences between simulated aerial image and measured aerial image are the least. In addition, a mask inspection microscope for carrying out the method is provided.

Abstract: The invention relates to a method and an appliance for predicting the imaging result obtained with a mask when a lithography process is carried out, wherein the mask comprises mask structures to be imaged and the mask is destined to be illuminated in a lithography process in a projection exposure apparatus with a predetermined illumination setting for exposing a wafer comprising a photoresist.

Abstract: A method is provided for determining an OPC model comprising: recording an aerial image by use of a mask inspection microscope, wherein the aerial image comprises at least one segment of a mask; simulating a plurality of aerial images which comprise at least the segment, proceeding from a mask design and from predefined parameters of an optical model which is part of the OPC model, wherein the parameters differ for each of the simulated aerial images of the plurality of aerial images; determining differences between the measured aerial image and the simulated aerial images; determining those parameters for which the differences between simulated aerial image and measured aerial image are the least. In addition, a mask inspection microscope for carrying out the method is provided.

Abstract: A method for examining a mask includes providing a position data set having error positions of the mask to be examined, providing a structure data set having the structure of the mask, and specifying structural features of the mask, the values of which are to be determined. At each error position, determining the values of the specified structural features of the structure by using a computing unit, determining a measuring task from specified decision criteria and from the determined values of the structural features of the structure by using the computing unit, and carrying out the determined measuring task in a manner controlled by the computing unit. In addition, a device, in particular a microscope, for carrying out the method is provided.

Abstract: A closed path infrared sensor includes an enclosure, a first energy source within the enclosure, at least a second energy source within the enclosure, at least one detector system within the enclosure and a mirror system external to the enclosure and spaced from the enclosure. The mirror system reflects energy from the first energy source to the at least one detector system via a first analytical path and reflects energy from the second energy source to the at least one detector system via a second analytical path. Each of the first analytical path and the second analytical path are less than two feet in length.

Abstract: A microscope includes an illumination unit for illuminating a mask at a predetermined non-axial illumination angle, an imaging unit for imaging an aerial image of the mask within a predetermined defocus region, and an imaging field stop, in which as a result of the lateral displacement of the aerial image depending on the position within the defocus region and on the non-axial illumination angle, the opening of the imaging field stop is dimensioned such that the aerial image is either completely encompassed or circumferentially cut within the defocus region. A method for characterizing a mask having a structure includes illuminating the mask at at least one illumination angle using monochromatic illumination radiation such that a diffraction image of the structure is created, recording the diffraction image, establishing the intensities of the maxima of the adjacent orders of diffraction, and establishing an intensity ratio of the intensities.

Abstract: A method for examining a mask includes providing a position data set having error positions of the mask to be examined, providing a structure data set having the structure of the mask, and specifying structural features of the mask, the values of which are to be determined. At each error position, determining the values of the specified structural features of the structure by using a computing unit, determining a measuring task from specified decision criteria and from the determined values of the structural features of the structure by using the computing unit, and carrying out the determined measuring task in a manner controlled by the computing unit. In addition, a device, in particular a microscope, for carrying out the method is provided.

Abstract: A closed path infrared sensor includes an enclosure, a first energy source within the enclosure, at least a second energy source within the enclosure, at least one detector system within the enclosure and a mirror system external to the enclosure and spaced from the enclosure. The mirror system reflects energy from the first energy source to the at least one detector system via a first analytical path and reflects energy from the second energy source to the at least one detector system via a second analytical path. Each of the first analytical path and the second analytical path are less than two feet in length.

Abstract: A closed path infrared sensor includes an enclosure, a first energy source within the enclosure, at least a second energy source within the enclosure, at least one detector system within the enclosure and a mirror system external to the enclosure and spaced from the enclosure. The mirror system reflects energy from the first energy source to the at least one detector system via a first analytical path and reflects energy from the second energy source to the at least one detector system via a second analytical path. Each of the first analytical path and the second analytical path are less than two feet in length.

Abstract: A navigational deployment and initialization system, including: at least one personal inertial navigation module associated with at least one user and comprising a plurality of sensors and at least one controller configured to generate navigation data derived at least in part upon output of the plurality of sensors and at least one navigation routine; at least one deployment recognition device configured to directly or indirectly receive at least one of the following: user data, time data, event data, navigation data, or any combination thereof; and at least one central controller in direct or indirect communication with the at least one deployment recognition device and configured to receive at least a portion of at least one of the following: the user data, the time data, the event data, the navigation data, or any combination thereof.

Abstract: An initialization system for a personal navigation system associated with a user, including: a first reference point arrangement configured for communication with the personal navigation system of the user and to facilitate the generation of a first user data set including horizontal position and azimuth angle (x1, y1, ?1); a second reference point arrangement configured for communication with the personal navigation system of the user and to facilitate the generation of a second user data set including horizontal position and azimuth angle (x2, y2, ?2); and at least one control device configured to determine a common coordinate system based at least in part upon the first user data set and the second user data set. An initialization process and arrangement are also disclosed.

Abstract: A microscope includes an illumination unit for illuminating a mask at a predetermined non-axial illumination angle, an imaging unit for imaging an aerial image of the mask within a predetermined defocus region, and an imaging field stop, in which as a result of the lateral displacement of the aerial image depending on the position within the defocus region and on the non-axial illumination angle, the opening of the imaging field stop is dimensioned such that the aerial image is either completely encompassed or circumferentially cut within the defocus region. A method for characterizing a mask having a structure includes illuminating the mask at at least one illumination angle using monochromatic illumination radiation such that a diffraction image of the structure is created, recording the diffraction image, establishing the intensities of the maxima of the adjacent orders of diffraction, and establishing an intensity ratio of the intensities.

Abstract: Systems and methods for monitoring time-varying classification performance are disclosed.

Abstract: A closed path infrared sensor includes an enclosure, a first energy source within the enclosure, at least a second energy source within the enclosure, at least one detector system within the enclosure and a mirror system external to the enclosure and spaced from the enclosure. The mirror system reflects energy from the first energy source to the at least one detector system via a first analytical path and reflects energy from the second energy source to the at least one detector system via a second analytical path. Each of the first analytical path and the second analytical path are less than two feet in length.

Abstract: A navigational deployment and initialization system, including: at least one personal inertial navigation module associated with at least one user and comprising a plurality of sensors and at least one controller configured to generate navigation data derived at least in part upon output of the plurality of sensors and at least one navigation routine; at least one deployment recognition device configured to directly or indirectly receive at least one of the following: user data, time data, event data, navigation data, or any combination thereof; and at least one central controller in direct or indirect communication with the at least one deployment recognition device and configured to receive at least a portion of at least one of the following: the user data, the time data, the event data, the navigation data, or any combination thereof.

Abstract: An inertial navigation system, including at least one personal inertial navigation module (including accelerometers, gyroscopes, and magnetometers) and at least one controller, which: obtains rotation origin data and reference magnetic field data; generates inertial navigation data using a navigation routine; generates azimuth correction data using a separate azimuth correction routine; and generates output data. Common azimuth reference determination methods are also disclosed.

Abstract: Systems and methods for monitoring time-varying classification performance are disclosed.

Abstract: An initialization system for a personal navigation system associated with a user, including: a first reference point arrangement configured for communication with the personal navigation system of the user and to facilitate the generation of a first user data set including horizontal position and azimuth angle (x1, y1, ?1); a second reference point arrangement configured for communication with the personal navigation system of the user and to facilitate the generation of a second user data set including horizontal position and azimuth angle (x2, y2, ?2); and at least one control device configured to determine a common coordinate system based at least in part upon the first user data set and the second user data set. An initialization process and arrangement are also disclosed.