Patents by Inventor Thomas VONDERACH

Thomas VONDERACH has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • ION SOURCE FOR INDUCTIVELY COUPLED PLASMA MASS SPECTROMETRY
    Publication number: 20220181135
    Abstract: An ICP source (100) for generating ions using an inductively coupled plasma is configured to be coupled to a mass spectrometer (200). The sample is introduced into the plasma along a downwards-pointing vertical direction (G) under the action of gravity. In this manner, the sample can reach the plasma regardless of its condition, e.g., regardless of droplet or particle size. Transport efficiencies of up to 100% can be achieved. The ICP source can be supplied with a continuous stream comprising the sample.
    Type: Application
    Filed: March 16, 2020
    Publication date: June 9, 2022
    Applicant: ETH Zurich
    Inventors: Bodo HATTENDORF, Detlef GÜNTHER, Thomas VONDERACH