Patents by Inventor Thomas W. Henze

Thomas W. Henze has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4628002
    Abstract: This invention is directed to a surface treatment for SiC monofilament developed for the purpose of increasing the transverse strain-to-failure of composites, particularly aluminum composites. The surface treatment includes a fine grain SiC region adjacent to the bulk or stoichiometric SiC region and a transition region which interacts with the matrix material.
    Type: Grant
    Filed: May 28, 1985
    Date of Patent: December 9, 1986
    Assignee: Avco Corporation
    Inventors: Raymond J. Suplinskas, Thomas W. Henze, James V. Marzik
  • Patent number: 4415609
    Abstract: The invention relates to a surface treatment for stoichiometric silicon carbide. A carbon-rich silicon carbide layer is applied over the silicon carbide. In the case of the silicon carbide surface, the ratio of silicon to carbon in the carbon-rich layer varies from one at the silicon carbide interface to near zero in the interior of the carbon-rich layer to greater than zero and preferably 0.3 to 0.5 on the surface of the carbon-rich layer remote from the interface. A preferred method of making the silicon carbide layer is also presented.
    Type: Grant
    Filed: May 5, 1982
    Date of Patent: November 15, 1983
    Assignee: Avco Corporation
    Inventors: Harold E. Debolt, Raymond J. Suplinskas, James A. Cornie, Thomas W. Henze, Albert W. Hauze
  • Patent number: 4340636
    Abstract: The invention relates to a surface treatment for stoichiometric silicon carbide. A carbon-rich silicon carbide layer is applied over the silicon carbide. In the case of the silicon carbide surface, the ratio of silicon to carbon in the carbon-rich layer varies from one at the silicon carbide interface to near zero in the interior of the carbon-rich layer to greater than zero and preferably 0.3 to 0.5 on the surface of the carbon-rich layer remote from the interface. A preferred method of making the silicon carbide layer is also presented.
    Type: Grant
    Filed: July 30, 1980
    Date of Patent: July 20, 1982
    Assignee: Avco Corporation
    Inventors: Harold E. DeBolt, Raymond J. Suplinskas, James A. Cornie, Thomas W. Henze, Albert W. Hauze
  • Patent number: 4315968
    Abstract: Silicon carbide filament is produced by overcoating a carbon monofilament core using continuous process vapor deposition. The deposition takes place by passing the carbon monofilament through a reactor into which gaseous sources of silicon and carbon are injected. At a deposition temperature of about 1300 C., a deposit of fine grained beta crystals of silicon carbide are formed. Application of a thin coating of silicon-rich silicon carbide on the surface of the filament both adds strength and provides a surface which is readily bonded to metals, glass and resin matrix materials during the forming of composite structures.
    Type: Grant
    Filed: February 6, 1980
    Date of Patent: February 16, 1982
    Assignee: Avco Corporation
    Inventors: Raymond J. Suplinskas, Thomas W. Henze
  • Patent number: 4127659
    Abstract: A refractory substrate, which generally is graphite or carbon is overcoated with silicon carbide by chemical vapor deposition from gaseous sources of silicon and carbon. The deposition generally takes place in combination with hydrogen and the coating on the substrate generally has a thickness at least equal to the diameter of the substrate itself. A silicon carbide filament containing an inner and outer surface layer of carbon rich silicon carbide, together with a method of making the same, is described.
    Type: Grant
    Filed: January 26, 1977
    Date of Patent: November 28, 1978
    Assignee: Avco Corporation
    Inventors: Harold E. DeBolt, Thomas W. Henze
  • Patent number: 4068037
    Abstract: A refractory substrate, which generally is graphite or carbon is overcoated with silicon carbide by chemical vapor deposition from gaseous sources of silicon and carbon. The deposition generally takes place in combination with hydrogen and the coating on the substrate generally has a thickness at least equal to the diameter of the substrate itself. A silicon carbide filament containing an inner and outer surface layer of carbon rich silicon carbide, together with a method of making the same, is described.
    Type: Grant
    Filed: January 2, 1976
    Date of Patent: January 10, 1978
    Assignee: Avco Corporation
    Inventors: Harold E. Debolt, Thomas W. Henze