Patents by Inventor Thomas Weller

Thomas Weller has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11961970
    Abstract: A lithium sulfur battery with a low solvating electrolyte at an amount of less than 2 ?l per mg sulfur. The electrolyte comprises dioxolane and hexylmethylether, as well as a Li salt, for example LiTSFi. The electrolyte is free from lithium nitrate, LiNO3.
    Type: Grant
    Filed: January 14, 2020
    Date of Patent: April 16, 2024
    Assignee: SCEYE SA
    Inventors: Mikkel Vestergaard Frandsen, David Kim, Holger Althues, Paul Hartel, Thomas Abendroth, Susanne Dörfler, Benjamin Schumm, Stefan Kaskel, Christine Weller
  • Publication number: 20210138964
    Abstract: A storage system includes at least one storage unit that is configured to store at least one working material and at least one sensor unit configured to sense at least one state characteristic of the working material stored in the storage unit. The storage system also includes an allocation unit that is configured at least to allocate the at least one detected state characteristic to at least one target state characteristic.
    Type: Application
    Filed: February 28, 2018
    Publication date: May 13, 2021
    Inventors: Thomas Weller, Joern Stock, Felix Lange, Florian Esenwein, Anna Heszler, Christopher Michael Barker
  • Patent number: 10966312
    Abstract: An apparatus includes a substrate and an electronic circuit comprising a plurality of conductive tracts forming a printed litz line on the substrate for distributing a signal therebetween in order to increase effective conductance relative to a single conductive line not divided into tracts. The plurality of conductive tracts may be formed by printing a pattern on the substrate and removing portions of the pattern to leave the plurality of conductive tracts. The removing portions of the pattern may be performed by a removal process such as laser cutting, milling, etching, or masking. For example, the removal may be performed by applying ultrashort laser pulses. The printing may be performed by a jetting process, a spray process, an extrusion process, a dispensing process, and/or other types of processes for applying materials.
    Type: Grant
    Filed: April 3, 2019
    Date of Patent: March 30, 2021
    Assignees: Sciperio, Inc, University of South Florida
    Inventors: Thomas Weller, Kenneth H. Church, Ramiro A Ramirez, Paul I. Deffenbaugh, Casey W. Perkowski
  • Publication number: 20190371199
    Abstract: A system includes at least one first machine tool having at least one first receiving device for at least one insert tool, at least one storage device, and at least one external unit. The at least one insert tool is configured to be arranged on the at least one machine tool. The at least one storage device includes at least one second receiving device for the at least one insert tool. The at least one external unit has at least one external input interface. At least one application-specific parameter of at least one output is generated from an input, which is transmitted to the at least one machine tool, to the at least one storage device, and/or to other external units.
    Type: Application
    Filed: August 23, 2017
    Publication date: December 5, 2019
    Inventors: Florian Bantle, Thomas Duerr, Thomas Weller, Jasamin Abied, Istvan Szell
  • Patent number: 10029354
    Abstract: A hand-held power tool comprises a tool receiver, a drive spindle, and at least one active drive unit configured to drive the tool receiver via the drive spindle. The tool receiver and the drive spindle are moveable with respect to each other and connected in the circumferential direction via a form-fit connection.
    Type: Grant
    Filed: October 8, 2013
    Date of Patent: July 24, 2018
    Assignee: Robert Bosch GmbH
    Inventor: Thomas Weller
  • Patent number: 9780434
    Abstract: A flexible microwave antenna having a “fish-scale” ground plane is provided. The approach represents a significant advance in the combined thickness and flexibility that can be achieved, especially when using relatively thick substrates which are important for optimum antenna performance. An increase in gain was observed when bent in a positive radius of curvature and further reduction of back radiation.
    Type: Grant
    Filed: December 23, 2016
    Date of Patent: October 3, 2017
    Assignees: University of South Florida, Raytheon Company, The United States of America Administrator of NASA
    Inventors: Thomas Weller, David Cure, Paul A. Herzig, Felix Miranda
  • Publication number: 20170263355
    Abstract: In accordance with the present invention, novel superparamagnetic magneto-dielectric polymer nanocomposites are synthesized using a novel process. The tunability of the dielectric/magnetic properties demonstrated by this novel highly-viscous solvent-free polymer nanocomposite that is amenable to building 3D electromagnetic structures/devices by using processes such as 3D printing, compression molding or injection molding, when an external DC magnetic field is applied, exceeds what has been previously reported for magneto-dielectric polymer nanocomposite materials.
    Type: Application
    Filed: May 24, 2017
    Publication date: September 14, 2017
    Applicant: University of South Florida
    Inventors: Thomas Weller, Jing Wang, Hariharan Srikanth, Cesar A. Morales-Silva, Kristen L.S. Repa, Susmita Pal
  • Patent number: 9666342
    Abstract: In accordance with the present invention, novel superparamagnetic magneto-dielectric polymer nanocomposites are synthesized using a novel process. The tunability of the dielectric/magnetic properties demonstrated by this novel highly-viscous solvent-free polymer nanocomposite that is amenable to building 3D electromagnetic structures/devices by using processes such as 3D printing, compression molding or injection molding, when an external DC magnetic field is applied, exceeds what has been previously reported for magneto-dielectric polymer nanocomposite materials.
    Type: Grant
    Filed: May 20, 2016
    Date of Patent: May 30, 2017
    Assignee: University of South Florida
    Inventors: Thomas Weller, Jing Wang, Hariharan Srikanth, Cesar A. Morales-Silva, Kristen L. S. Repa, Susmita Pal
  • Patent number: 9531077
    Abstract: A flexible microwave antenna having a “fish-scale” ground plane is provided. The approach represents a significant advance in the combined thickness and flexibility that can be achieved, especially when using relatively thick substrates which are important for optimum antenna performance. An increase in gain was observed when bent in a positive radius of curvature and further reduction of back radiation.
    Type: Grant
    Filed: April 20, 2015
    Date of Patent: December 27, 2016
    Assignees: University of South Florida, Raytheon Company, The United States of America, as represented by the Administrator of the National Aeronautics and Space Administration
    Inventors: Thomas Weller, David Cure, Paul A. Herzig, Felix Miranda
  • Publication number: 20160268027
    Abstract: In accordance with the present invention, novel superparamagnetic magneto-dielectric polymer nanocomposites are synthesized using a novel process. The tunability of the dielectric/magnetic properties demonstrated by this novel highly-viscous solvent-free polymer nanocomposite that is amenable to building 3D electromagnetic structures/devices by using processes such as 3D printing, compression molding or injection molding, when an external DC magnetic field is applied, exceeds what has been previously reported for magneto-dielectric polymer nanocomposite materials.
    Type: Application
    Filed: May 20, 2016
    Publication date: September 15, 2016
    Applicant: University of South Florida
    Inventors: Thomas Weller, Jing Wang, Hariharan Srikanth, Cesar A. Morales-Silva, Kristen L.S. Repa, Susmita Pal
  • Patent number: 9418889
    Abstract: A dielectric diffusion barrier is deposited on a substrate that has a via and an overlying trench etched into an exposed layer of inter-layer dielectric, wherein there is exposed metal from the underlying interconnect at the bottom of the via. In order to provide a conductive path from the underlying metallization layer to the metallization layer that is being formed over it, the dielectric diffusion barrier is formed selectively on the inter-layer dielectric and not on the exposed metal at the bottom of the via. In one example a dielectric SiNC diffusion barrier layer is selectively deposited on the inter-layer dielectric using a remote plasma deposition and a precursor that contains both silicon and nitrogen atoms. Generally, a variety of dielectric diffusion barrier materials with dielectric constants of between about 3.0-20.0 can be selectively formed on inter-layer dielectric.
    Type: Grant
    Filed: June 17, 2015
    Date of Patent: August 16, 2016
    Assignee: Lam Research Corporation
    Inventors: Thomas Weller Mountsier, Hui-Jung Wu, Bhadri N. Varadarajan, Nagraj Shankar, William T. Lee
  • Patent number: 9384877
    Abstract: In accordance with the present invention, novel superparamagnetic magneto-dielectric polymer nanocomposites are synthesized using a novel process. The tunability of the dielectric/magnetic properties demonstrated by this novel highly-viscous solvent-free polymer nanocomposite that is amenable to building 3D electromagnetic structures/devices by using processes such as 3D printing, compression molding or injection molding, when an external DC magnetic field is applied, exceeds what has been previously reported for magneto-dielectric polymer nanocomposite materials.
    Type: Grant
    Filed: April 13, 2015
    Date of Patent: July 5, 2016
    Assignee: University of South Florida
    Inventors: Thomas Weller, Jing Wang, Hariharan Srikanth, Cesar A. Morales-Silva, Kristen L. S. Repa, Susmita Pal
  • Patent number: 9379210
    Abstract: Various embodiments herein relate to formation of contact etch stop layers in the context of forming gates and contacts. In certain embodiments, a novel process flow is used, which may involve the deposition and removal of a sacrificial pre-metal dielectric material before a particular contact etch stop layer is formed. An auxiliary contact etch stop layer may be used in addition to a primary etch stop layer that is deposited previously. In certain cases the contact etch stop layer is a metal-containing material such as a nitride or an oxide. The contact etch stop layer may be deposited through a cyclic vapor deposition in some embodiments. The process flows disclosed herein provide improved protection against over-etching gate stacks, thereby minimizing gate-to-contact leakage. Further, the disclosed process flows result in wider flexibility in terms of materials and deposition conditions used for forming various dielectric materials, thereby minimizing parasitic capacitance.
    Type: Grant
    Filed: October 14, 2015
    Date of Patent: June 28, 2016
    Assignee: Lam Research Corporation
    Inventors: Thomas Weller Mountsier, Bart J. van Schravendijk, Ananda K. Banerji, Nagraj Shankar
  • Publication number: 20160071953
    Abstract: Various embodiments herein relate to formation of contact etch stop layers in the context of forming gates and contacts. In certain embodiments, a novel process flow is used, which may involve the deposition and removal of a sacrificial pre-metal dielectric material before a particular contact etch stop layer is formed. An auxiliary contact etch stop layer may be used in addition to a primary etch stop layer that is deposited previously. In certain cases the contact etch stop layer is a metal-containing material such as a nitride or an oxide. The contact etch stop layer may be deposited through a cyclic vapor deposition in some embodiments. The process flows disclosed herein provide improved protection against over-etching gate stacks, thereby minimizing gate-to-contact leakage. Further, the disclosed process flows result in wider flexibility in terms of materials and deposition conditions used for forming various dielectric materials, thereby minimizing parasitic capacitance.
    Type: Application
    Filed: October 14, 2015
    Publication date: March 10, 2016
    Inventors: Thomas Weller Mountsier, Bart J. van Schravendijk, Ananda K. Banerji, Nagraj Shankar
  • Publication number: 20150380302
    Abstract: A dielectric diffusion barrier is deposited on a substrate that has a via and an overlying trench etched into an exposed layer of inter-layer dielectric, wherein there is exposed metal from the underlying interconnect at the bottom of the via. In order to provide a conductive path from the underlying metallization layer to the metallization layer that is being formed over it, the dielectric diffusion barrier is formed selectively on the inter-layer dielectric and not on the exposed metal at the bottom of the via. In one example a dielectric SiNC diffusion barrier layer is selectively deposited on the inter-layer dielectric using a remote plasma deposition and a precursor that contains both silicon and nitrogen atoms. Generally, a variety of dielectric diffusion barrier materials with dielectric constants of between about 3.0-20.0 can be selectively formed on inter-layer dielectric.
    Type: Application
    Filed: June 17, 2015
    Publication date: December 31, 2015
    Inventors: Thomas Weller Mountsier, Hui-Jung Wu, Bhadri N. Varadarajan, Nagraj Shankar, William T. Lee
  • Patent number: 9190489
    Abstract: Various embodiments herein relate to formation of contact etch stop layers in the context of forming gates and contacts. In certain embodiments, a novel process flow is used, which may involve the deposition and removal of a sacrificial pre-metal dielectric material before a particular contact etch stop layer is formed. An auxiliary contact etch stop layer may be used in addition to a primary etch stop layer that is deposited previously. In certain cases the contact etch stop layer is a metal-containing material such as a nitride or an oxide. The contact etch stop layer may be deposited through a cyclic vapor deposition in some embodiments. The process flows disclosed herein provide improved protection against over-etching gate stacks, thereby minimizing gate-to-contact leakage. Further, the disclosed process flows result in wider flexibility in terms of materials and deposition conditions used for forming various dielectric materials, thereby minimizing parasitic capacitance.
    Type: Grant
    Filed: September 8, 2014
    Date of Patent: November 17, 2015
    Assignee: Lam Research Corporation
    Inventors: Thomas Weller Mountsier, Bart J. van Schravendijk, Ananda K. Banerji, Nagraj Shankar
  • Publication number: 20150266170
    Abstract: A hand-held power tool comprises a tool receiver, a drive spindle, and at least one active drive unit configured to drive the tool receiver via the drive spindle. The tool receiver and the drive spindle are moveable with respect to each other and connected in the circumferential direction via a form-fit connection.
    Type: Application
    Filed: October 8, 2013
    Publication date: September 24, 2015
    Inventor: Thomas Weller
  • Publication number: 20150255196
    Abstract: In accordance with the present invention, novel superparamagnetic magneto-dielectric polymer nanocomposites are synthesized using a novel process. The tunability of the dielectric/magnetic properties demonstrated by this novel highly-viscous solvent-free polymer nanocomposite that is amenable to building 3D electromagnetic structures/devices by using processes such as 3D printing, compression molding or injection molding, when an external DC magnetic field is applied, exceeds what has been previously reported for magneto-dielectric polymer nanocomposite materials.
    Type: Application
    Filed: April 13, 2015
    Publication date: September 10, 2015
    Applicant: UNIVERSITY OF SOUTH FLORIDA
    Inventors: Thomas Weller, Jing Wang, Hariharan Srikanth, Cesar A. Morales-Silva, Kristen L.S. Repa, Susmita Pal
  • Patent number: 8922452
    Abstract: In one embodiment, a periodic spiral antenna includes first and second arms that form interleaved spirals parallel to an x-y plane, wherein the arms have a height dimension that extends along a z direction that is perpendicular to the x-y plane, and wherein the interleaved spirals form multiple turns of the antenna, the turns being equally spaced from each other throughout the antenna.
    Type: Grant
    Filed: March 21, 2014
    Date of Patent: December 30, 2014
    Assignees: University of South Florida, The Charles Stark Draper Laboratory
    Inventors: Jonathan Michael O'Brien, Thomas Weller, Gokhan Mumcu, John E. Grandfield
  • Publication number: 20140103247
    Abstract: In accordance with the present invention, novel superparamagnetic magneto-dielectric polymer nanocomposites are synthesized using a novel process. The tunability of the dielectric/magnetic properties demonstrated by this novel polymer nanocomposite, when an external DC magnetic field is applied, exceeds what has been previously reported for magneto-dielectric polymer nanocomposite materials.
    Type: Application
    Filed: December 16, 2013
    Publication date: April 17, 2014
    Applicant: UNIVERSITY OF SOUTH FLORIDA
    Inventors: Thomas Weller, Jing Wang, Hariharan Srikanth, Cesar A. Morales-Silva, Kristen Stojak, Susmita Pal