Abstract: The present invention includes a method of performing a double-patterning (DP) processing sequence using a plurality of Site-Dependent (S-D) procedures, the method including receiving a first set of wafers by one or more subsystems in a processing system, creating one or more first patterned layers on a first set of patterned wafers, establishing first confidence data for the first set of patterned wafers, establishing a first set of high confidence wafers, creating one or more second patterned layers on a second set of patterned wafers, establishing second confidence data for the second set of patterned wafers and establishing a second set of high confidence wafers.

Abstract: A method for consumption-optimized operation of an internal combustion engine of a motor vehicle is described, an engine output of the internal combustion engine being set as a function of a position of a gas pedal according to a manipulated variable, the gas pedal being adjustable in a first mechanically defined adjustment range between an initial position and a specific gas pedal position, the internal combustion engine being controlled with a consumption-optimized engine output with regard to the instantaneous engine speed by adjusting the gas pedal to the specific gas pedal position, the consumption-optimized engine output causing a minimal fuel consumption at the instantaneous engine speed.

Abstract: The present invention includes a method of performing a dual damascene procedure using Site-Dependent (S-D) procedures, the method including receiving a plurality of wafers and associated data by a S-D transfer subsystem coupled to a lithography-related subsystem, determining S-D wafer data for each wafer, establishing a first Dual Damascene processing sequence, determining a first set of S-D processing wafers to be processed, establishing real-time operational states for a plurality of first S-D processing elements in the lithography-related subsystem, transferring a first number of the first set of S-D processing wafers to a first number of the first S-D processing elements in the lithography-related subsystem and delaying other S-D wafers in the first set of S-D processing wafers for a first amount of time.

Abstract: This invention provides quinazoline compounds of the formula: wherein: R1 is halo; R2 is H or halo; R3 is a) C1-C3 alkyl, optionally substituted by halo; or b) —(CH2)n-morpholino, —(CH2)n-piperidine, —(CH2)n-piperazine, —(CH2)n—-piperazine-N(C1-C3 alkyl), —(CH2)n-pyrrolidine, or —(CH2)n-imidazole; n is 1 to 4; R4 is —(CH2)m-Het; Het is morpholine, piperidine, piperazine, piperazine-N(C1-C3 alkyl), imidazole, pyrrolidine, azepane, 3,4-dihydro-2H-pyridine, or 3,6-dihydro-2H-pyridine, each optionally substituted by alkyl, halo, OH, NH2, NH(C1-C3 alkyl) or N (C1-C3 alkyl)2; m is 1-3; and X is O, S or NH; or a pharmaceutically acceptable salt thereof, as well as processes and intermediate compounds for making them, useful pharmaceutical compositions and methods of using the compounds in the treatment of proliferative diseases.

Abstract: This invention provides quinazoline compounds of the formula: wherein: R1 is halo; R2 is H or halo; R3 is a) C1-C3 alkyl, optionally substituted by halo; or b) —(CH2)n-morpholino, —(CH2)n-piperidine, —(CH2)n-piperazine, —(CH2)n-piperazine-N(C1-C3 alkyl), —(CH2)n-pyrrolidine, or —(CH2)n-imidazole; n is 1 to 4; R4 is —(CH2)m-Het; Het is morpholine, piperidine, piperazine, piperazine-N(C1-C3 alkyl), imidazole, pyrrolidine, azepane, 3,4-dihydro-2H-pyridine, or 3,6-dihydro-2H-pyridine, each optionally substituted by alkyl, halo, OH, NH2, NH(C1-C3 alkyl) or N(C1-C3 alkyl)2; m is 1-3; and X is O, S or NH; or a pharmaceutically acceptable salt thereof, as well as processes and intermediate compounds for making them, useful pharmaceutical compositions and methods of using the compounds in the treatment of proliferative diseases.

Abstract: An apparatus and method for dispensing a solution on a substrate is described in which the solution is dispensed through a solution nozzle assembly while the substrate is rotated. As the solution is dispensed, the solution on the substrate forms a wave front that radially spreads from the substrate center to the substrate edge. The dispensing of the solution is performed in such a way that the solution is dispensed at a radial location substantially equivalent to or less than the radial location of the wave front at any instant in time.

Abstract: The present invention includes a method of creating a Site-Dependent (S-D) evaluation library including receiving a plurality of S-D wafers by one or more S-D transfer subsystems in a processing system, establishing wafer state data for each S-D wafer, establishing a library-creation processing sequence for creating a library of S-D evaluation data, determining a first number of S-D process wafers to be processed, establishing first operational states for a plurality of S-D processing elements in one or more processing subsystems, determining a first number of available processing elements, establishing a first S-D transfer sequence, transferring the first number of S-D process wafers to the first number of available processing elements therein and applying a first corrective action.

Abstract: Method for operating a hybrid drive, in particular a parallel hybrid drive, of a vehicle. The parallel hybrid drive includes an internal combustion engine and at least one electric drive, at least one energy storage device, and a vehicle transmission. During deceleration phases in which a torque required on the transmission input side is present, the internal combustion engine is operated either in drag mode or at a minimum drive torque.

Abstract: An apparatus and method for dispensing a solution on a substrate is described in which the solution is dispensed through a solution nozzle assembly while the substrate is rotated. As the solution is dispensed, the solution on the substrate forms a wave front that radially spreads from the substrate center to the substrate edge. The dispensing of the solution is performed in such a way that the solution is dispensed at a radial location substantially equivalent to or less than the radial location of the wave front at any instant in time.

Abstract: The present invention includes a method of verifying a Site-Dependent (S-D) processing procedure, the method including receiving a plurality of wafers by a S-D transfer system, determining S-D wafer state data for each wafer; establishing a first set of verification wafers, determining a number of required verification sites for each verification wafer, determining a number of visited verification sites, determining a number of remaining verification sites for each verification wafer, establishing a first procedure-verification sequence, determining a first S-D verification procedure, transferring the first verification wafer to a first S-D processing element and delaying the first verification wafer for a first period of time.

Abstract: Embodiments of the invention provide edge-bead removal systems and methods for removing edge-bead material from one or more surfaces of semiconductor wafers. Embodiments of the invention may be applied to process wafers at different points in a manufacturing cycle, and the wafers can include one or more metal layers.

Abstract: Embodiments of the invention provide post-etch cleaning systems and methods for removing post-etch residue material from one or more surfaces of semiconductor wafers. Embodiments of the invention may be applied to process wafers at different points in a manufacturing cycle, and the wafers can include one or more metal layers.

Abstract: Embodiments of the invention provide edge-bead removal systems and methods for removing edge-bead material from one or more surfaces of semiconductor wafers. Embodiments of the invention may be applied to process wafers at different points in a manufacturing cycle, and the wafers can include one or more metal layers.

Abstract: The invention can provide a method of processing a wafer using Site-Dependent (S-D) processing sequences that can include S-D creation procedures, S-D evaluation procedures, and S-D transfer sequences. The S-D creation procedures can be performed using S-D processing elements, the S-D evaluation procedures can be performed using S-D evaluation elements, and S-D transfer sequences can be performed using site-dependent transfer subsystems. Site-dependent data can be stored in site-dependent libraries and/or databases.

Abstract: A method for consumption-optimized operation of an internal combustion engine of a motor vehicle is described, an engine output of the internal combustion engine being set as a function of a position of a gas pedal according to a manipulated variable, the gas pedal being adjustable in a first mechanically defined adjustment range between an initial position and a specific gas pedal position, the internal combustion engine being controlled with a consumption-optimized engine output with regard to the instantaneous engine speed by adjusting the gas pedal to the specific gas pedal position, the consumption-optimized engine output causing a minimal fuel consumption at the instantaneous engine speed.

Abstract: The present invention includes a method of performing a double-patterning (DP) processing sequence using a plurality of Site-Dependent (S-D) procedures, the method including receiving a first set of wafers by one or more subsystems in a processing system, creating one or more first patterned layers on a first set of patterned wafers, establishing first confidence data for the first set of patterned wafers, establishing a first set of high confidence wafers, creating one or more second patterned layers on a second set of patterned wafers, establishing second confidence data for the second set of patterned wafers and establishing a second set of high confidence wafers.

Abstract: The present invention includes a method of verifying a Site-Dependent (S-D) processing procedure, the method including receiving a plurality of wafers by a S-D transfer system, determining S-D wafer state data for each wafer; establishing a first set of verification wafers, determining a number of required verification sites for each verification wafer, determining a number of visited verification sites, determining a number of remaining verification sites for each verification wafer, establishing a first procedure-verification sequence, determining a first S-D verification procedure, transferring the first verification wafer to a first S-D processing element and delaying the first verification wafer for a first period of time.

Abstract: The present invention includes a method of verifying a Site-Dependent (S-D) wafer that includes receiving a first set of S-D wafers by one or more S-D processing elements in one or more processing subsystems, creating a first set of unverified S-D wafers by performing a first S-D creation procedure, establishing S-D wafer state data for each unverified S-D wafer, establishing a first set of evaluation wafers comprising a first number of the unverified S-D wafers, establishing first operational states for a plurality of S-D evaluation elements, determining a first number of available evaluation elements, establishing a first S-D transfer sequence, transferring the first set of S-D evaluation wafers to the first number of available evaluation elements in one or more evaluation subsystems and applying a first corrective action when the number of S-D evaluation wafers is greater than the first number of available evaluation elements.

Abstract: The present invention includes a method of creating a Site-Dependent (S-D) evaluation library including receiving a plurality of S-D wafers by one or more S-D transfer subsystems in a processing system, establishing wafer state data for each S-D wafer, establishing a library-creation processing sequence for creating a library of S-D evaluation data, determining a first number of S-D process wafers to be processed, establishing first operational states for a plurality of S-D processing elements in one or more processing subsystems, determining a first number of available processing elements, establishing a first S-D transfer sequence, transferring the first number of S-D process wafers to the first number of available processing elements therein and applying a first corrective action.

Abstract: The present invention includes a method of performing a dual damascene procedure using Site-Dependent (S-D) procedures, the method including receiving a plurality of wafers and associated data by a S-D transfer subsystem coupled to a lithography-related subsystem, determining S-D wafer data for each wafer, establishing a first Dual Damascene processing sequence, determining a first set of S-D processing wafers to be processed, establishing real-time operational states for a plurality of first S-D processing elements in the lithography-related subsystem, transferring a first number of the first set of S-D processing wafers to a first number of the first S-D processing elements in the lithography-related subsystem and delaying other S-D wafers in the first set of S-D processing wafers for a first amount of time.