Patents by Inventor Thomas Witke

Thomas Witke has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • PVD method and PVD apparatus
    Patent number: 7022209
    Abstract: A PVD method and a PVD apparatus use a rotating magnetic field in order to increase the yield. The magnetic field is provided such that it essentially vanishes, at least in a time average, outside a rotation axis of the magnetic field in sectors of the target region of the PVD apparatus. In this manner the PVD method and the PVD apparatus achieve a uniform coating.
    Type: Grant
    Filed: July 16, 2003
    Date of Patent: April 4, 2006
    Assignee: Infineon Technologies AG
    Inventors: Winfried Sabisch, Alfred Kersch, Georg Schulze-Icking, Thomas Witke, Ralf Zedlitz
  • PVD method and PVD apparatus
    Publication number: 20040011640
    Abstract: A PVD method and a PVD apparatus use a rotating magnetic field in order to increase the yield. The magnetic field is provided such that it essentially vanishes, at least in a time average, outside a rotation axis of the magnetic field in sectors of the target region of the PVD apparatus. In this manner the PVD method and the PVD apparatus achieve a uniform coating.
    Type: Application
    Filed: July 16, 2003
    Publication date: January 22, 2004
    Inventors: Winfried Sabisch, Alfred Kersch, Georg Schulze-Icking, Thomas Witke, Ralf Zedlitz
  • Vacuum arc evaporator
    Patent number: 6361663
    Abstract: The invention relates to a vacuum arc evaporator with which a wide variety of substrates can be provided with various coatings or to which various systems of layers can be applied. The invention is intended to achieve an improvement in the quality of the layer, with increased material utilization and higher coating rate. A vacuum arc evaporator with a cathode of electrically conducting material and an anode for generating a plasma arranged in an evacuable housing is used for this purpose. The plasma is generated by an evaporation of the cathode material by means of arc discharge. The anode is enclosed by an insulator and is otherwise surrounded by cathode material on all sides.
    Type: Grant
    Filed: May 19, 2000
    Date of Patent: March 26, 2002
    Assignee: Fraunhofer-Gesellschaft zur Forderung der Angewandten Forschung e.V.
    Inventors: Jan Berthold, Thomas Witke, Peter Siemroth