Patents by Inventor Thomas Zydowsky

Thomas Zydowsky has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Pesticidal n-substituted azacyclic derivatives
    Publication number: 20060241098
    Abstract: Pesticidal compositions comprising a pesticidally effective amount of an N-substituted azacyclic derivative of the formula (I); wherein R, an N-substituted azacycle, and V, Q, X, T and U are defined, as well as their agriculturally acceptable salts, in admixture with at least one agriculturally acceptable extender or adjuvant are disclosed. In addition, methods of controlling pests such as insects and acarids comprising applying said compositions to a locus of crops where control is desired are disclosed.
    Type: Application
    Filed: July 1, 2004
    Publication date: October 26, 2006
    Inventors: Syed Ali, Stephen Donovan, Leo Dungan, David Roush, George Theodoridis, Thomas Zydowsky, Rao Bhandaru
  • Pesticidal substituted 1,2,5-thiadiazole derivatives
    Publication number: 20060241097
    Abstract: Insecticidal and acaricidal compositions comprising an insecticidally or acaricidally effective amount of a 1,2,5-thiadiazole of the formula (I); wherein R, Q and m are as defined in admixture with at least one agriculturally acceptable extender or adjuvant are disclosed. In addition, methods of controlling insects and acarids comprising applying said compositions to a locus of crops where control is desired are disclosed.
    Type: Application
    Filed: July 1, 2004
    Publication date: October 26, 2006
    Applicant: FMC CORPORATION
    Inventors: Leo Dungan, Elizabeth Rowley, John Dixson, Syed Ali, Scott Crawford, Saroj Sehgel, Matthew Whiteside, Thomas Zydowsky, Walter Yeager
  • Dyed photoresists and methods and articles of manufacture comprising same
    Publication number: 20060204892
    Abstract: The present invention provides new photoresist compositions that comprise a resin binder, a photoactive component, particularly an acid generator, and a dye material that contains one or more chromophores that can reduce undesired reflections of exposure radiation. Preferred dye compounds are polymeric materials that include one or more chromophores such as anthracene and other polycyclic moieties that effectively absorb deep UV exposure radiation.
    Type: Application
    Filed: May 3, 2006
    Publication date: September 14, 2006
    Applicant: Shipley
    Inventors: James Mori, James Thackeray, Roger Sinta, Rosemary Bell, Robin Miller-Fahey, Timothy Adams, Thomas Zydowsky, Edward Pavelchek, Manuel doCanto