Abstract: This invention relates to a method and a device for processing a surface of a substrate by means of a particle beam. The method comprises the irradiation of the surface of the substrate, wherein, in a first area of the surface of the substrate, the surface of the substrate is processed with the particle beam, which strikes the surface of the substrate in an unpulsed manner; and wherein, in a second area of the surface of the substrate, the surface of the substrate is processed with the particle beam, which strikes the surface of the substrate in a pulsed manner.

Abstract: A method for processing a surface, having an initial topology, using a particle beam can include processing of the surface using the particle beam at a first angle of the particle beam with respect to the surface in accordance with a target topology of the surface. The method can furthermore include subsequent processing of the surface using the particle beam at a second angle of the particle beam with respect to the surface in accordance with the target topology of the surface, wherein the second angle differs from the first angle.