Patents by Inventor Thoralf Kautzsch

Thoralf Kautzsch has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9896329
    Abstract: The present disclosure relates to an integrated semiconductor device, comprising a semiconductor substrate; a cavity formed into the semiconductor substrate; a sensor portion of the semiconductor substrate deflectably suspended in the cavity at one side of the cavity via a suspension portion of the semiconductor substrate interconnecting the semiconductor substrate and the sensor portion thereof, wherein an extension of the suspension portion along the side of the cavity is smaller than an extension of said side of the cavity.
    Type: Grant
    Filed: July 13, 2016
    Date of Patent: February 20, 2018
    Assignee: Infineon Technologies Dresden GmbH
    Inventors: Thoralf Kautzsch, Heiko Froehlich, Alessia Scire, Maik Stegemann, Bernhard Winkler, Andre Roeth, Steffen Bieselt, Mirko Vogt
  • Patent number: 9887355
    Abstract: A method for manufacturing an emitter comprises providing a semiconductor substrate having a main surface, the semiconductor substrate comprising a cavity adjacent to the main surface. A portion of the semiconductor substrate arranged between the cavity and the main surface of the semiconductor substrate forms a support structure. The method comprises arranging an emitting element at the support structure, the emitting element being configured to emit a thermal radiation of the emitter, wherein the cavity provides a reduction of a thermal coupling between the emitting element and the semiconductor substrate.
    Type: Grant
    Filed: March 24, 2016
    Date of Patent: February 6, 2018
    Assignee: Infineon Technologies Desden GmbH
    Inventors: Steffen Bieselt, Heiko Froehlich, Thoralf Kautzsch, Maik Stegemann, Mirko Vogt
  • Patent number: 9885605
    Abstract: Embodiments relate to photoreceivers, such as photodiodes. In one embodiment, an integrated circuit device comprises a photodiode, and an electrode arranged over or on top of the photodiode. The electrode is substantially transparent or otherwise exhibits a lower absorption rate, such that light or other radiation can pass through the electrode to the photodiode. Varying a charge applied to the electrode enables the spectral sensitivity of the underlying photodiode to be altered, tuned or otherwise adjusted.
    Type: Grant
    Filed: May 19, 2014
    Date of Patent: February 6, 2018
    Assignee: Infineon Technologies AG
    Inventor: Thoralf Kautzsch
  • Publication number: 20180017456
    Abstract: A manufacturing method includes providing a semiconductor substrate having a pressure sensor structure; and forming, during a BEOL process (BEOL=back-end-of-line), a metal-insulator-stack arrangement on the semiconductor substrate, wherein the metal-insulator-stack arrangement is formed to comprise (1) a cavity adjacent to the pressure sensor structure and extending over the pressure sensor structure, and (2) a pressure port through the metal-insulator-stack arrangement for providing a fluidic connection between the cavity and an environmental atmosphere, wherein the pressure port has a cross-sectional area, which is smaller than 10% of a footprint area of the pressure sensor structure within the cavity.
    Type: Application
    Filed: July 12, 2017
    Publication date: January 18, 2018
    Inventors: Thoralf Kautzsch, Heiko Froehlich, Marco Haubold, Andre Roeth, Maik Stegemann, Mirko Vogt
  • Patent number: 9860518
    Abstract: An imaging circuit includes a first vertical trench gate and a neighboring second vertical trench gate. The imaging circuit includes a gate control circuit. The gate control circuit operates in a first operating mode to generate a first space charge region accelerating photogenerated charge carriers of a first charge-carrier type to a first collection contact in and in a second operating mode to generate a second space charge region accelerating photogenerated charge carriers of the first charge-carrier type to the first collection contact. The imaging circuit further includes an image processing circuit which determines distance information of an object based on photogenerated charge carriers of the first charge carrier type collected at the first collection contact in the first operating mode and color information of the object based on photogenerated charge carriers of the first charge carrier type collected at the first collection contact in the second operating mode.
    Type: Grant
    Filed: September 10, 2015
    Date of Patent: January 2, 2018
    Assignee: Infineon Technologies AG
    Inventor: Thoralf Kautzsch
  • Publication number: 20170356837
    Abstract: Various embodiments provide a particle sensor including: a first carrier, the first carrier including at least one heating structure and a light detecting structure, at least one spacer structure disposed over the first carrier, a second carrier disposed over the at least one spacer structure, the second carrier including a light emitting structure, wherein the first carrier, the second carrier and the at least one spacer structure are arranged to provide a channel for a fluid flow, wherein the light emitting structure is configured to emit light into the channel and wherein the light detecting structure is configured to detect light from the channel.
    Type: Application
    Filed: June 9, 2016
    Publication date: December 14, 2017
    Inventor: Thoralf KAUTZSCH
  • Publication number: 20170358697
    Abstract: Embodiments related to controlling of photo-generated charge carriers are described and depicted.
    Type: Application
    Filed: August 28, 2017
    Publication date: December 14, 2017
    Inventors: Thomas BEVER, Henning Feick, Dirk Offenberg, Stefano Parascandola, Ines Uhlig, Thoralf Kautzsch, Dirk Meinhold, Hanno Melzner
  • Publication number: 20170297895
    Abstract: According to an embodiment, a method of forming a MEMS transducer includes forming a transducer frame in a layer of monocrystalline silicon, where forming the transducer frame includes forming a support portion adjacent a cavity and forming a first set of comb-fingers extending from the support portion. The method of forming a MEMS transducer further includes forming a spring support from an anchor to the support portion and forming a second set of comb-fingers in the layer of monocrystalline silicon. The second set of comb-fingers is interdigitated with the first set of comb-fingers.
    Type: Application
    Filed: April 13, 2016
    Publication date: October 19, 2017
    Inventors: Thoralf Kautzsch, Mohsin Nawaz, Alfons Dehe, Heiko Froehlich, Alessia Scire, Steffen Bieselt
  • Publication number: 20170290098
    Abstract: A light emitter device contains a heater structure configured to emit light if a predefined current flows through the heater structure. The heater structure is arranged at a heater carrier structure. The light emitter device contains an upper portion of a cavity located vertically between the heater carrier structure and a cover structure. The light emitter device contains a lower portion of the cavity located vertically between the heater carrier structure and at least a portion of a carrier substrate. The heater carrier structure contains a plurality of holes connecting the upper portion of the cavity and the lower portion of the cavity. A pressure within the cavity is less than 100 mbar.
    Type: Application
    Filed: March 17, 2017
    Publication date: October 5, 2017
    Inventors: Thoralf Kautzsch, Heiko Froehlich, Uwe Rudolph, Alessia Scire, Maik Stegemann, Mirko Vogt
  • Publication number: 20170287772
    Abstract: In accordance with an embodiment of the present invention, a method of forming a semiconductor device includes forming a first cavity within a substrate. The first cavity is disposed under a portion of the substrate. The method further includes forming a first pillar within the first cavity to support the portion of the substrate.
    Type: Application
    Filed: June 22, 2017
    Publication date: October 5, 2017
    Inventors: Thoralf Kautzsch, Alessia Scire, Steffen Bieselt
  • Patent number: 9752943
    Abstract: Embodiments relate to sensors and more particularly to structures for and methods of forming sensors that are easier to manufacture as integrated components and provide improved deflection of a sensor membrane, lamella or other movable element. In embodiments, a sensor comprises a support structure for a lamella, membrane or other movable element. The support structure comprises a plurality of support elements that hold or carry the movable element. The support elements can comprise individual cylindrical points or feet-like elements with straight or concave sidewalls, rather than a conventional interconnected frame, that enable improved motion of the movable element, easier removal of a sacrificial layer between the movable element and substrate during manufacture and a more favorable deflection ratio, among other benefits.
    Type: Grant
    Filed: September 26, 2014
    Date of Patent: September 5, 2017
    Assignee: Infineon Technologies Dresden GmbH
    Inventors: Thoralf Kautzsch, Heiko Froehlich, Mirko Vogt, Maik Stegemann, Andre Röth, Bernhard Winkler, Boris Binder
  • Patent number: 9711393
    Abstract: In accordance with an embodiment of the present invention, a method of forming a semiconductor device includes forming a first cavity within a substrate. The first cavity is disposed under a portion of the substrate. The method further includes forming a first pillar within the first cavity to support the portion of the substrate.
    Type: Grant
    Filed: August 6, 2015
    Date of Patent: July 18, 2017
    Assignee: INFINEON TECHNOLOGIES DRESDEN GMBH
    Inventors: Thoralf Kautzsch, Alessia Scire, Steffen Bieselt
  • Patent number: 9663355
    Abstract: Embodiments relate to structures, systems and methods for more efficiently and effectively etching sacrificial and other layers in substrates and other structures. In embodiments, a substrate in which a sacrificial layer is to be removed to, e.g., form a cavity comprises an etch dispersion system comprising a trench, channel or other structure in which etch gas or another suitable gas, fluid or substance can flow to penetrate the substrate and remove the sacrificial layer. The trench, channel or other structure can be implemented along with openings or other apertures formed in the substrate, such as proximate one or more edges of the substrate, to even more quickly disperse etch gas or some other substance within the substrate.
    Type: Grant
    Filed: August 25, 2015
    Date of Patent: May 30, 2017
    Assignee: Infineon Technologies Dresden GmbH
    Inventors: Thoralf Kautzsch, Heiko Froehlich, Mirko Vogt, Maik Stegemann
  • Patent number: 9660112
    Abstract: Embodiments relate to buried structures for silicon devices which can alter light paths and thereby form light traps. Embodiments of the lights traps can couple more light to a photosensitive surface of the device, rather than reflecting the light or absorbing it more deeply within the device, which can increase efficiency, improve device timing and provide other advantages appreciated by those skilled in the art.
    Type: Grant
    Filed: August 3, 2016
    Date of Patent: May 23, 2017
    Assignee: Infineon Technologies Dresden GmbH
    Inventor: Thoralf Kautzsch
  • Patent number: 9641153
    Abstract: A method of forming a resonator by providing a first layer; forming a sacrificial layer on the first layer; forming a capping layer on the sacrificial layer; forming at least one etching aperture in the capping layer; forming at least one additional aperture having a different size than the at least one etching aperture; forming a cavity and releasing a resonator structure within the cavity by removing the sacrificial layer by etching via the at least one etching aperture; sealing the at least one etching aperture; and forming a lining in the at least one additional aperture.
    Type: Grant
    Filed: November 4, 2015
    Date of Patent: May 2, 2017
    Assignee: Infineon Technologies Dresden GmbH
    Inventors: Thoralf Kautzsch, Heiko Froehlich, Mirko Vogt, Maik Stegemann, Thomas Santa, Markus Burian
  • Publication number: 20170115452
    Abstract: Embodiments relate to buried structures for silicon devices which can alter light paths and thereby form light traps. Embodiments of the lights traps can couple more light to a photosensitive surface of the device, rather than reflecting the light or absorbing it more deeply within the device, which can increase efficiency, improve device timing and provide other advantages appreciated by those skilled in the art.
    Type: Application
    Filed: December 23, 2016
    Publication date: April 27, 2017
    Inventor: Thoralf Kautzsch
  • Publication number: 20170092659
    Abstract: According to various embodiments, an electronic device may include a carrier including at least a first region and a second region being laterally adjacent to each other; an electrically insulating structure arranged in the first region of the carrier, wherein the second region of the carrier is free of the electrically insulating structure; a first electronic component arranged in the first region of the carrier over the electrically insulating structure; a second electronic component arranged in the second region of the carrier; wherein the electrically insulating structure includes one or more hollow chambers, wherein the sidewalls of the one or more hollow chambers are covered with an electrically insulating material.
    Type: Application
    Filed: December 12, 2016
    Publication date: March 30, 2017
    Inventors: Thoralf Kautzsch, Alessia Scire, Steffen Bieselt, Franz Hirler, Anton Mauder, Wolfgang Scholz, Hans-Joachim Schulze, Francisco Javier Santos Rodriguez
  • Publication number: 20170089790
    Abstract: Embodiments relate to sensors and more particularly to structures for and methods of forming sensors that are easier to manufacture as integrated components and provide improved deflection of a sensor membrane, lamella or other movable element. In embodiments, a sensor comprises a support structure for a lamella, membrane or other movable element. The support structure comprises a plurality of support elements that hold or carry the movable element. The support elements can comprise individual points or feet-like elements, rather than a conventional interconnected frame, that enable improved motion of the movable element, easier removal of a sacrificial layer between the movable element and substrate during manufacture and a more favorable deflection ratio, among other benefits.
    Type: Application
    Filed: December 8, 2016
    Publication date: March 30, 2017
    Inventors: Thoralf Kautzsch, Heiko Froehlich, Mirko Vogt, Maik Stegemann, Andre Roeth, Bernhard Winkler, Boris Binder
  • Patent number: 9560765
    Abstract: According to various embodiments, an electronic device may include a carrier including at least a first region and a second region being laterally adjacent to each other; an electrically insulating structure arranged in the first region of the carrier, wherein the second region of the carrier is free of the electrically insulating structure; a first electronic component arranged in the first region of the carrier over the electrically insulating structure; a second electronic component arranged in the second region of the carrier; wherein the electrically insulating structure includes one or more hollow chambers, wherein the sidewalls of the one or more hollow chambers are covered with an electrically insulating material.
    Type: Grant
    Filed: December 6, 2013
    Date of Patent: January 31, 2017
    Assignee: Infineon Technologies Dresden GmbH
    Inventors: Thoralf Kautzsch, Alessia Scire, Steffen Bieselt, Franz Hirler, Anton Mauder, Wolfgang Scholz, Hans-Joachim Schulze, Francisco Javier Santos Rodriguez
  • Patent number: 9559238
    Abstract: The present disclosure relates to an optical receiver. The optical receiver has a first photosensor and a second photosensor disposed within a substrate. The first photosensor has a first angled surface located on a first side of a depression within the substrate, and the second photosensor has a second angled surface located on a second side of the depression, opposite the first side of the depression. A plurality of blocking structures are disposed over the substrate. The plurality of blocking structures block radiation that is not incident on the first and second angled surfaces. By receiving incident radiation on the first and second angled surfaces, the first and second photosensors are able to generate directional-dependent photocurrents that vary depending upon an angle of incident radiation. Based upon the directional-dependent photocurrents, an angle of incident radiation can be determined.
    Type: Grant
    Filed: May 8, 2014
    Date of Patent: January 31, 2017
    Assignee: Infineon Technologies Dresden GmbH
    Inventor: Thoralf Kautzsch